Comparison of Paraquat Actions on Oxygen Radical Generation and Lipid Peroxidation between Submitochondrial Particle and Microsome of Mouse Liver

최중환,김용식,박종완,정명희,윤종구,Choi, Jung-Hwan,Kim, Yong-Sik,Park, Jong-Hwan,Chung, Myung-Hee,Yunn, Chong-Ku The Korean Society of Pharmacology 1991 대한약리학잡지 Vol.27 No.2

Paraquat 독성작용에 있어서 mitochondria의 잠재적인 역할을 평가하기 위하여, 이 약물의 산소 radical 생성과 지질과산화 반응에 미치는 영향을 mouse간의 submitochondrial particle 과 microsome에서 비교하여 보았다. Submitochondrial particle 사용시 NADH를, microsome 사용시 NADPH를 전자공여체로 이용한 경우 paraquat는 두 분획에서 superoxide anion과 hydrogen peroxide의 생성을 증가시켰다. 동일한 조건하에서 paraquat는 hydroxyl radical의 생성을 시사하는 methional로 부터 ethylene의 생성을 증가시켰다. 그러나, paraquat에 의한 이들 각각의 효과는 microsome에서 보다 submitochondrial particle에서 약간 낮았다. 한편, 두 분획 모두에서 paraquat는 지질과산화 반응을 촉진시켰다. Submitochondrial particle과 microsome에서의 Paraquat에 의한 지질과산화반응은 i) 두 분회에서 지질과산화는 SOD에 의해서 부분적으로 억제됨을 보였고, DETAPAC(iron chelator)에 의해서는 완전히 억제되었고, catalase와 hydroxyl radical scavenger에 의해서는 억제되지 아니하였으며, ii) 반응내 $ADP-Fe^{3+}$ 첨가로 paraquat에 의한 지질과산화는 더욱 증가되었지만 methional로 부터 ethylene 생성은 감소하여 hydroxyl radical 생성과 지질과산화 사이에는 상관성이 없음으로 보아 같은 기전을 통해 촉진됨을 알 수 있었고 이러한 촉진작용은 perferryl ion을 통하여 일어나리라 추측되었다. Submitochondrial particle에서 paraquat에 의해 촉진된 산소라디칼 생성과 지질과산화 반응은 p-hydroxymercuribenzoate(NADH dehydrogenase 억제제)에 의하여 억제되었으나 다른 respiratory chain 차단제들에 의해서는 거의 영향을 받지 않음으로 보아 mitochondria에서의 paraquat의 redox-cycling은 CoQ 보다는 NADH dehyrogenase와 관련이 있음을 시사하였다. 이상의 결과로 보아 산소 radical의 생성과 지질과산화를 유도하는 paraquat의 redox-cycling은 microsome에서와 마찬가지로 mitochondria에서도 일어나며, 이결과 생체내에서의 paraquat의 독작용에 관여함을 짐작할 수 있다. In order to evaluate a potential role of mitochondria in the mediation of toxicity of paraquat (PQ), submitochondrial particle and microsome of mouse liver were compared by oxygen radical generation and lipid peroxidation. With NADH in submitochondrial particle and NADPH in microsome as electron donors, PQ stimulated production of superoxide anion and $H_2O_2$ in both fractions. Under the same conditions, PQ enhanced the generation of ethylene from methional suggestiong stimulation of OH production by PQ. But these effects by PQ were somewhat lower in submitochondrial particle than in microsome. In addition, lipid peroxidation(measured as MDA production) was stimulated by PQ in both fractions. The stimulation of lipid peroxidation in both fractions seemed to occur by the same mechanism probably through perferryl ion. This was supported by the following findings: i) The lipid peroxidation in both fractions was partially inhibited by SOD and completely inhibited by DETAPAC(an iron chelator) but not by catalase or OH scavenger. ii) Addition of $ADP-Fe^{3+}$ further increased PQ-induced lipid peroxidation but decreased ethylene production from methional suggesting no correlation between OH production and lipid peroxidation. The redox-cycling of PQ in mitochondria appeared to be linked to NADH dehydrogenase, not to CoQ since all of the observed stimulations by PQ in submitochondrial particle were inhibited by p-hydroxymercuribenzoate(a NADH dehydrogenase inhibitor) but not affected by other respiratory chain blockers. The above results demonstrate that redox-cycling properties of PQ leading to oxygen radical generation and lipid peroxidation can also occur in mitochondria in the same manner as in microsome. Therefore, the observed actions of PQ in mitochondria suggest that mitochondria may also contribute to toxicity of this drug in vivo.

교류형 PDP 보호막용 MgO-CaO 박막의 광학적 특성과 전기적 특성

조진희,김락환,박종완,Jo, Jin-Hui,Kim, Rak-Hwan,Park, Jong-Wan 한국재료학회 1999 한국재료학회지 Vol.9 No.6

Optical and electrical properties of MgO-CaO films as a protective layer for AC plasma display panel were studied. When the [(CaO/(MgO+CaO)] ratio of evaporation starting materials was optimum composition, 0.1, firing voltage and memory margin of the film were 176V and 0.5, respectively. When [CaO/(CaO+MgO)] was 0, 0.1 and 0.2, memory margin was 0.39, 0.5 and 0.41, respectively, and surface roughness of films was $27.7\AA$, $21.1\AA$ and $40.3\AA$, respectively. It was thought that memory margin had a reverse-relation with surface roughness. The density of film was calculated by measuring the refractive index of film. The density of MgO film was 3.21g/㎤ and the density of film, when [CaO/(CaO+MgO)] was 0.1, was 3.632g/㎤. The mixture of MgO-CaO films showed a good transmittance property in the visual range.

Paraquat에 의한 산소 Radical 생성 및 지질과산화 작용의 Mouse 간 Submitochondria Particle과 Microsome에서의 비교

최중환(Jung-Hwan Choi),김용식(Yong-Sik Kim),박종완(Jong-Hwan Park),정명희(Myung-Hee Chung),윤종구(Chong-Ku Yunn) 대한약리학회 1991 대한약리학잡지 Vol.27 No.2

Paraquat 독성작용에 있어서 mitochondria의 잠재적인 역할을 평가하기 위하여, 이 약물의 산소 radical 생성과 지질과산화 반응에 미치는 영향을 mouse간의 submitochondrial particle 과 microsome에서 비교하여 보았다. Submitochondrial particle 사용시 NADH를, microsome 사용시 NADPH를 전자공여체로 이용한 경우 paraquat는 두 분획에서 superoxide anion과 hydrogen peroxide의 생성을 증가시켰다. 동일한 조건하에서 paraquat는 hydroxyl radical의 생성을 시사하는 methional로 부터 ethylene의 생성을 증가시켰다. 그러나, paraquat에 의한 이들 각각의 효과는 microsome에서 보다 submitochondrial particle에서 약간 낮았다. 한편, 두 분획 모두에서 paraquat는 지질과산화 반응을 촉진시켰다. Submitochondrial particle과 microsome에서의 Paraquat에 의한 지질과산화반응은 i) 두 분회에서 지질과산화는 SOD에 의해서 부분적으로 억제됨을 보였고, DETAPAC(iron chelator)에 의해서는 완전히 억제되었고, catalase와 hydroxyl radical scavenger에 의해서는 억제되지 아니하였으며, ii) 반응내ADP-Fe³⁺ 첨가로 paraquat에 의한 지질과산화는 더욱 증가되었지만 methional로 부터 ethylene 생성은 감소하여 hydroxyl radical 생성과 지질과산화 사이에는 상관성이 없음으로 보아 같은 기전을 통해 촉진됨을 알 수 있었고 이러한 촉진작용은 perferryl ion을 통하여 일어나리라 추측되었다. Submitochondrial particle에서 paraquat에 의해 촉진된 산소라디칼 생성과 지질과산화 반응은 p-hydroxymercuribenzoate(NADH dehydrogenase 억제제)에 의하여 억제되었으나 다른 respiratory chain 차단제들에 의해서는 거의 영향을 받지 않음으로 보아 mitochondria에서의 paraquat의 redox-cycling은 CoQ 보다는 NADH dehyrogenase와 관련이 있음을 시사하였다. 이상의 결과로 보아 산소 radical의 생성과 지질과산화를 유도하는 paraquat의 redox-cycling은 microsome에서와 마찬가지로 mitochondria에서도 일어나며, 이결과 생체내에서의 paraquat의 독작용에 관여함을 짐작할 수 있다. In order to evaluate a potential role of mitochondria in the mediation of toxicity of paraquat (PQ), submitochondrial particle and microsome of mouse liver were compared by oxygen radical generation and lipid peroxidation. With NADH in submitochondrial particle and NADPH in microsome as electron donors, PQ stimulated production of superoxide anion and H₂O₂ in both fractions. Under the same conditions, PQ enhanced the generation of ethylene from methional suggestiong stimulation of OH production by PQ. But these effects by PQ were somewhat lower in submitochondrial particle than in microsome. In addition, lipid peroxidation(measured as MDA production) was stimulated by PQ in both fractions. The stimulation of lipid peroxidation in both fractions seemed to occur by the same mechanism probably through perferryl ion. This was supported by the following findings: i) The lipid peroxidation in both fractions was partially inhibited by SOD and completely inhibited by DETAPAC(an iron chelator) but not by catalase or OH scavenger. ii) Addition of ADP-Fe³⁺ further increased PQ-induced lipid peroxidation but decreased ethylene production from methional suggesting no correlation between OH production and lipid peroxidation. The redox-cycling of PQ in mitochondria appeared to be linked to NADH dehydrogenase, not to CoQ since all of the observed stimulations by PQ in submitochondrial particle were inhibited by p-hydroxymercuribenzoate(a NADH dehydrogenase inhibitor) but not affected by other respiratory chain blockers. The above results demonstrate that redox-cycling properties of PQ leading to oxygen radical generation and lipid peroxidation can also occur in mitochondria in the same manner as in microsome. Therefore, the observed actions of PQ in mitochondria suggest that mitochondria may also contribute to toxicity of this drug in vivo.

열산화법 및 PECVD 법에 의한 T$a_2O_5$ 유전 박막

문환성,이재석,한성욱,박상균,양승기,이재학,박형호,박종완,Mun, Hwan-Seong,Lee, Jae-Seok,Lee, Jae-Seok,Lee, Jae-Seok,Yang, Seung-Gi,Lee, Jae-hak,Park, Hyung-ho,Park, Jong-wan 한국재료학회 1992 한국재료학회지 Vol.2 No.5

열산화법과 PECVD법으로 p-type (100) Si 기판위에 T$a_2O_5$ 박막을 형성시킨 후 A1/T$a_2O_5$/p-Si capacitor를 제작하였다. 제작된 시편의 제반 물성은 XRD, AES, high frequency C-V analyzer, I-V meter, TEM 등을 사용하여 분석하였다. XRD 분석을 통해 T$a_2O_5$ 박막은 비정질임이 확인되었으며 65$0^{\circ}C$ 열처리의 경우에는 hexagonal $\delta$-T$a_2O_5$ 상으로 결정화가 일어남을 확인할 수 있었다. AES spectrum의 분석을 통해 T$a_2O_5$ 박막의 조성이 2:5의 stoichiometry에 근접해 있음이 관찰되었다. 열산화법에 의해 제작된 T$a_2O_5$는 산화온도 60$0^{\circ}C$의 조건에서 누설전류 5${ imes}10^{-6}$A/c$m^2와 유전상수 31.5로 가장 좋은 성질을 나타냈으며, PECVD로 제작한 T$a_2O_5$는 RF Power가 0.47W/c$m^2일 때 2.5${ imes}10^{-5}$A c$m^2and 24.0으로 가장 좋은 특성을 나타내었다. TEM 분석을 통해 제조된 박막과 계면을 관찰하였다. Thermal oxidation and plasma enhanced chemical vapor deposition of tantalum oxide thin films on p-type (100) Si substrates were studied to examine the dielectric nature of T$a_2O_5$ as a Al/T$a_2O_5$/p-Si capacitor. Microstructure and dielectric properties of the capacitors were investigated by XRD, AES, high frequency C-V analyzer, I-V meter and TEM. XRD analysis showed that the structure of T$a_2O_5$ films were amorphous, but the films were crystallized to hexagonal $\delta$-T$a_2O_5$ by 65$0^{\circ}C$ thermal oxidation treatment. It was found that the stoichiometry of the films was more or less close to 2 : 5. Leakage current density and relative dielectric constant of thermal oxidation T$a_2O_5$ film at 60$0^{\circ}C$ was 5.0${ imes}10^{-6}$/A/c$m^2 and 31.5, respectively. In the case of PECVD T$a_2O_5$film deposited at 0.47W/c$m^2 they were 2.5${ imes}10^{-5}$/A/$ extrm{cm}^2$ and 24.0, respectively. The morphology of the films and interfaces were investigated by TEM.

무전해Ni도금에 의한 선택적 CONTACT HOLE 충전

우찬희(Chan-Hee Woo),권용환(Yong-Hwan Kwon),김영기(Young-Gi Kim),박종완(jong-Wan Park),이원해(Won-Hae Lee) 한국표면공학회 1991 한국표면공학회지 Vol.25 No.4

열산화 T${a_2}{O_5}$박막에 미치는 RTA후처리의 영향

문환성,이재석,한성욱,박상균,양승지,이재천,박종완,Mun, Hwan-Seong,Lee, Jae-Seok,Han, Seong-Uk,Park, Sang-Gyun,Yang, Seung-Ji,Lee, Jae-Cheon,Park, Jong-Wan 한국재료학회 1993 한국재료학회지 Vol.3 No.3

P-type(100)Si Wafer 위에 400$\AA$의 Ta를 증착하여 열산화법으로 ${Ta_2}{O_5}$박막을 형성시킴 후 RTA후처리를 통하여 절연파괴전장 특성 개선을 이루고자 하였다. 유전상수에 미치는 RTA후처리의 영향은 미약하지만 절연파괴전장을 나타내었으나 결정화 온도 이하의 RTA온도에서는 절연파괴전장이 5.4MV/cm로 RTA효과가 크게 나타났다. 이러한 RTA효과는 RTA온도 $575^{\circ}C$에서 flat band voltage shift가 RTA 시간에 따라 변화가 없는 것으로 미루어 보아 RTA효과는 계면 변화에 의한 것이 아님을 알 수 있었으며, RBS 분석을 통하여 ${Ta_2}{O_5}$1박막의 치밀화에 의한 것임을 확인할 수 있었다. The effects of RT A treatment on the breakdown strengths were studied for tantalum pentoxide(${Ta_2}{O_5}$) films prepared by thermal oxidation of dc-sputtered Ta(400$\AA$) on p-type (100) Si wafer. While the relative dielectric constants of the RT A -treated specimens were not remarkably affected, the breakdown strengths of the RTA-treated specimens were greatly changed by RTA temperature and time. After the RTA treatment, the breakdown strengths of the specimens RTA-treated at the temperature below the crystallization temperature were increased to 5.4MV /cm, while those of the specimens RTA -treated at the temperature above it were decreased to 0.5MV /cm. RTA time-independence of the flat-bant voltage shift refleted that the RT A post-annealing effects on the breakdown strengths were not due to the interface reaction between the ${Ta_2}{O_5}$ layer and the Si substrate but, through the RBS analysis, to densification of the ${Ta_2}{O_5}$ films.

Effect of Alkaline Earth Metal Oxides addition on the Low-voltage Characteristics of MgO Films as a Protective layer for AC PDPs

조진희,김락환,김정열,이유기,김희재,박종완,Jo, Jin-Hui,Kim, Rak-Hwan,Kim, Jeong-Yeol,Lee, Yu-Gi,Kim, Hui-Jae,Park, Jong-Wan Materials Research Society of Korea 1999 한국재료학회지 Vol.9 No.5

Alkaline earth metal oxides were added to the conventional MgO films as a protective layer for dielectric materials to have lower firing voltage(Vf) of the plasma display panel(PDP). Panels with various protective layers of MgO-alkaline earth metal oxides were prepared on glass by using e-beam evaporation and its effect on firing voltage characteristics were investigated. (Ba-Mg)O films had poor voltage characteristics because of higher activation energy of BaO. But, (Sr-Mg)O, (Ca-Mg)O and (Ca-Sr-Mg) O had better voltage characteristics than the conventional MgO. A mixture film of (Mg-Ca-Sr)O show the lowest firing voltage which is less than that of MgO by 20V. The chemical composition to have lowest firing voltage is MgO:SrO:CaO ratio of 6:2:2. The mixture of MgO-Alkaline earth metal oxides films showed good transmittance properties within the visual range.

MPECVD 다이아몬드 박막의 표면 형상에 미치는 증착조건의 영향

최지환,이세현,이유기,박정일,이은아,박광자,박종완,Choe, Ji-Hwan,Lee, Se-Hyeon,Lee, Yu-Gi,Park, Jeong-Il,Lee, Eun-A,Park, Gwang-Ja,Park, Jong-Wan 한국재료학회 1997 한국재료학회지 Vol.7 No.5

다이아몬드 형성에 미치는 MPECVD 증착조건에 관하여 연구하였다. 증착 실험 기판은 Si p-type (100)wafer를 사용하였으며 다이아몬드 박막은 다음과 같은 조건하에서 증착되었다. 메탄 농도:0.75%(3scm)-3%(12scm),산소 농도:0%-0.5%(2scm), 반응 압력:20torr-80torr, 반응 온도:$600^{\circ}C$-90$0^{\circ}C$. 낮은 증착온도($600^{\circ}C$)에서는 (100)의 우선성장면을 보였고 온도가 증가함에 따라 (100)과 (111)이 혼재된 cubo-octahedron이 형성되었고 90$0^{\circ}C$에서는 (111)의 우선성장면을 가징 octahedron이 형성되었다. 산소가 첨가됨에 따라 높은 메탄농도에서도 양질의 다이아몬드가 형성되었다. 낮은 압력하(200torr)에서는 비정질탄소가, 높은 압력하(80torr)에서는 양질의 다이아몬드가 형성되었다.

RF Magnetron Sputtering 법에 의해 형성된 AC-PCP 용 MgO 보호막의 플라즈마 부식특성에 미치는 결정성의 영향

박종완,김희재,손충용,조진희,김낙환 대한금속재료학회(대한금속학회) 1999 대한금속·재료학회지 Vol.37 No.5

MgO thin films have been widely used as a surface protective layer in AC type plasma display panels (PDPs) due to its very low sputtering yield and large secondary electron emission capability. In this work, MgO thin films were prepared on soda lime glass substrates by rf magnetron sputtering method using a MgO target in order to analyze the effect of deposition parameters on their preferred orientation, microstructure and plasma damage properties. The preferred orientation of MgO films was changed from (200) to (111) as the distance from the target to the substrate decreased from 70 ㎜ to 20 ㎜. The MgO film deposited at a high gas pressure and at a long target-to-substrate distance has (200) preferred orientation and very high surface roughness as well as a tendency of columnar growth. However, by increasing the RF power and decreasing the target-to-substrate distance and the gas pressure, films were found to have (111) and (222) preferred orientation. Plasma erosion rate was minimized for the case of (111) preferred orientaion.