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저가 다결정 EFG 리본 웨이퍼의 표면 반사도 특성 최적화
김병국,이용구,저호,오병진,박재환,이진석,장보윤,안영수,임동건,Kim, Byeong-Guk,Lee, Yong-Koo,Chu, Hao,Oh, Byoung-Jin,Park, Jae-Hwan,Lee, Jin-Seok,Jang, Bo-Yun,An, Young-Soo,Lim, Dong-Gun 한국전기전자재료학회 2011 전기전자재료학회논문지 Vol.24 No.2
Ribbon silicon solar cells have been investigated because they can be produced with a lower material cost. However, it is very difficult to get good texturing with a conventional acid solution. To achieve high efficiency should be minimized for the reflectance properties. In this paper, acid vapor texturing and anti-reflection coating of $SiN_x$ was applied for EFG Ribbon Si Wafer. P-type ribbon silicon wafer had a thickness of 200 ${\mu}m$ and a resistivity of 3 $\Omega-cm$. Ribbon silicon wafers were exposed in an acid vapor. Acid vapor texturing was made by reaction between the silicon and the mixed solution of HF : $HNO_3$. After acid vapor texturing process, nanostructure of less than size of 1 ${\mu}m$ was formed and surface reflectance of 6.44% was achieved. Reflectance was decreased to 2.37% with anti-reflection coating of $SiN_x$.
산소플라즈마 전처리된 Polyethylene Naphthalate 기판 위에 증착된 ZnO:Ga 투명전도막의 특성
김병국,김정연,오병진,임동건,박재환,우덕현,권순용,Kim, Byeong-Guk,Kim, Jeong-Yeon,Oh, Byoung-Jin,Lim, Dong-Gun,Park, Jae-Hwan,Woo, Duck-Hyun,Kweon, Soon-Yong 한국재료학회 2010 한국재료학회지 Vol.20 No.4
Transparent conducting oxide (TCO) films are widely used for optoelectronic applications. Among TCO materials, zinc oxide (ZnO) has been studied extensively for its high optical transmission and electrical conduction. In this study, the effects of $O_2$ plasma pretreatment on the properties of Ga-doped ZnO films (GZO) on polyethylene naphthalate (PEN) substrate were studied. The $O_2$ plasma pretreatment process was used instead of conventional oxide buffer layers. The $O_2$ plasma treatment process has several merits compared with the oxide buffer layer treatment, especially on a mass production scale. In this process, an additional sputtering system for oxide composition is not needed and the plasma treatment process is easily adopted as an in-line process. GZO films were fabricated by RF magnetron sputtering process. To improve surface energy and adhesion between the PEN substrate and the GZO film, the $O_2$ plasma pre-treatment process was used prior to GZO sputtering. As the RF power and the treatment time increased, the contact angle decreased and the RMS surface roughness increased significantly. It is believed that the surface energy and adhesive force of the polymer surfaces increased with the $O_2$ plasma treatment and that the crystallinity and grain size of the GZO films increased. When the RF power was 100W and the treatment time was 120 sec in the $O_2$ plasma pretreatment process, the resistivity of the GZO films on the PEN substrate was $1.05\;{\times}\;10^{-3}{\Omega}-cm$, which is an appropriate range for most optoelectronic applications.
SOD방법을 이용한 저가 EFG 리본 실리콘 태양전지의 효율 향상에 관한 연구
김병국,임종엽,저호,오병진,박재환,이진석,장보윤,안영수,임동건,Kim, Byeong-Guk,Lim, Jong-Youb,Chu, Hao,Oh, Byoung-Jin,Park, Jae-Hwan,Lee, Jin-Seok,Jang, Bo-Yun,An, Young-Soo,Lim, Dong-Gun 한국전기전자재료학회 2011 전기전자재료학회논문지 Vol.24 No.3
The high cost of crystalline silicon solar cells has been considered as one of the major obstacles to their terrestrial applications. Spin on doping (SOD) is presented as a useful process for the manufacturing of low cost solar cells. Phosphorus (P509) was used as an n-type emitters of solar cells. N-type emitters were formed on p-type EFG ribbon Si wafers by using a SOD at different spin speed (1,000~4,000 rpm), diffusion temperatures ($800^{\circ}C{\sim}950^{\circ}C$), and diffusion time (5~30 min) in $N_2+O_2$ atmosphere. With optimum condition, we were able to achieve cell efficiency of 14.1%.
김신윤(Kim, Shin-Yoon),김병국(Kim, Byoung-Guk),유경무(Yoo, Kyoung-Mu),김형진(Kim, Hyeong-Jin),박재식(Park, Jae-Sik),황수관(Hwang, Soo-Kwan) 대한생리학회 1981 대한생리학회지 Vol.15 No.1
In the present study, an effort was directed to elucidate the effect of osmolality on the absorption of ethanol in rabbits. A single dose of 13.67 ml(2. 16 gm ethanol/kg BW) of hypo-, iso-hyphen and hypertonic ethanol per kg BW was administered into the stomach to albino rabbits and the experiment was performed at 30 th, 60 th and 120 th minute. The blood ethanol level was determined by the method of Williams et al, and hematocrit(Hct) was determined by the conventional Hct centrifuge and reader. The results are summarized as follow. The blood ethanol level showed the highest value at 60 min after the ethanol ingestion in the hypo- and isotonic groups, 171.3±13.3 mg% and 204.5±23.0 mg% , respectively, but in the hypertonic group, the highest value was observed at 120min after the ingestion. The absorption rate of ethanol between 0 to 30 min after the ingestion of hypo- and isotonic ethanol was 88.54±12.04 and 94.73±8.33 mg/min , respectively, but a decreased value of 44.72±6.69 mg/min was noted after hypertonic ethanol ingestion comparing with hypo- and isotonic groups, The Hct value after hypo- and isotonic ethanol ingestion was decreased at 30 min but returned to the control level at 120 min. In contrast with hypo- and isotonic ethanol ingestion, hypertonic ethanol ingestion produced an increase of the Hct value at 30 min and returned to the control level at 120 min. The heart rate was increased but the respiratory rate was decreased after ethanol ingestion regardless of the osmolality.