RISS 학술연구정보서비스

검색
다국어 입력

http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.

변환된 중국어를 복사하여 사용하시면 됩니다.

예시)
  • 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
  • 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
닫기
    인기검색어 순위 펼치기

    RISS 인기검색어

      검색결과 좁혀 보기

      선택해제
      • 좁혀본 항목 보기순서

        • 원문유무
        • 원문제공처
          펼치기
        • 등재정보
          펼치기
        • 학술지명
          펼치기
        • 주제분류
          펼치기
        • 발행연도
          펼치기
        • 작성언어
        • 저자
          펼치기

      오늘 본 자료

      • 오늘 본 자료가 없습니다.
      더보기
      • 무료
      • 기관 내 무료
      • 유료
      • Incidental Left Ventricular Thrombus Visualized by Cardiac Magnetic Resonance Imaging with a Normal Left Ventricular Systolic Function

        Sang Mi Ro1,Sung Ho Her,Sol Mi Huo,Kuhn Park,Jong Bum Kwon,Dong Jae Lee,Hyun Jin Noh 조선대학교 의학연구원 2015 The Medical Journal of Chosun University Vol.40 No.3

        Left ventricular (LV) thrombi may be caused by various conditions, particularly myocardial infarction. In most cases, LV thrombus occurs in patients with a significantly reduced ejection fraction. A LV thrombus is extremely rare in patients with normal LV function. We report a case of LV thrombus initially detected on transthoracic echocardiography and confirmed using cardiac magnetic resonance imaging in a patient with normal LV wall motion. We highlight the rarity of this condition and the usefulness of cardiac magnetic resonance imaging in the diagnosis of LV thrombus.

      • 핵생성 계면 제어에 의한 LPCVD 비정질 실리콘 박막의 고상 결정화를 이용한 조대한 다결정 실리콘 박막의 제조

        盧在相 弘益大學校 科學技術硏究所 1997 科學技術硏究論文集 Vol.8 No.-

        We report the critical role of the initial state of as-deposited amorphous silicon (a-Si) films near, or, at the a-Si/SiO₂ interface on the crystallization kinetics upon annealing. Grain size enhancement has been achieved by artificially modifying nucleation interface during deposition of LPCVD (low pressure chemical vapor deposition) a-Si films followed by solid phase crystallization (SPC). Since the deposition conditions change the incubation time, i,e. nucleation rate,and since nucleation occurs dominantly at a-Si/SiO₂ interface, we devised the following deposition techniques for the first time in order to obtain the larger grain size. A very thin a-Si layer (∼50Å) with the deposition conditions having long incubation time is grown first and then the reference films (∼950Å) are grown successively. Upon annealing the crystallization kinetics of composite films was observed to be determined only by the deposition conditions of a thin a-Si layer at the a-Si/SiO₂interface. Nucleation interface was also observed to be modified by interrupted gas supply resulting in the enhancement of the grain size.

      • 초에너지 이온주입에 의한 초저접합 형성시 발생하는 Deactivation 현상에 관한 연구

        盧在相,柳漢權 弘益大學校 科學基術硏究所 1999 科學技術硏究論文集 Vol.10 No.2

        Semiconductor proces sing technologies have progressed toward ULSI(Ultra Large Scale Integration) regime to enhance packing density and operating speed and reduce power consumption. For these reasons, not only horizontal dimensions but also vertical dimensions will continue to be decreased to minimize short-channel effect such as punchthrough. Since an As ion has a rather high mass and low diffusivity during annealing, the formation of n??/p shallow junction is relatively easy. However, the formation of p??/n junction is difficult because a B ion is light and shows significant diffusion during annealing. Ultra shallow p??/n junction is formed by ULE(ultra low energy) implanter and RTA(Rapid Thermal Annealing). In this study deactivation phenomena was investigated according to various post-annealing condition after the formation of ultra shallow p??/n junction.

      • MeV이온주입을 사용하여 Buried Layer를 포함한 CMOS Retrograde Well 제조시 발생하는 격자 결함에 관한 연구

        盧在相,柳承翰,柳漢權 弘益大學校 科學技術硏究所 1998 科學技術硏究論文集 Vol.9 No.2

        MeV ion implantation has been recently employed in the field of CMOS (complementary metal oxide semiconductor) retrograde well engineering. An issue on MeV ion induced damage is critical especially in forming a buried layer below the well. MeV B implanted buried layers were observed to show greatly improved characteristics of latchup suppression. Junction leakage current, however, showed a critical behavior as a function of ion does. The rod like defects were observed to be responsible for the leakage current. Rod-like defects were generated near the ??(projected range) and grown upward to the surface during annealing. According to cross sectional examination of each pit density, they were generated and propagated between 700。C and 800。C. They shrink or change into long, elongated dislocation loops at higher temperatures above 900。C. Results of SIMS (secondary ion mass spectroscopy) analyses and two-step-annealing (700。C/3∼6hrs.→900。C/1hr.) indicate that interstitial oxygens impede shrinkage of existing-g rod-like defects at higher temperatures above 900。C.

      • MeV 이온주입에 의한 Gettering 연구

        盧在相 弘益大學校 科學技術硏究所 1996 科學技術硏究論文集 Vol.7 No.1

        MeV ion implantation has been recently employed in the field of CMOS retrograde well engineering. An issue on MeV ion induced damage is critical especially in forming a buried layer below the well. Defect formation by high energy ion implantation has a significant characteristics in that the lattice damage is concentrated near Rp and isolated from the surface. In a TEM image as-implanted damaged layer appears as a dark band, where secondary defects are formed upon annealing. Si self-implantations were done to reveal the intrinsic behavior of secondary defect formations. Experimental results of B and P implantations were compared to those of Si case. TEM observations showed that interstitial type secondary defects are exclusively formed at around Rp. DCXRD rocking curve analyses indicated that an isolated layer of (+) strain is built up at around Rp after strain relaxation by annealing. SIMS anlayses showed that background impurities are gettered exactly at which secondary defects are formed. Gettering effieciency was found to be much related to the amount of stain field according to DCXRD analyses. A model experiment for the interaction between defects revealed that recombination of point defects with the opposite sign is responsible for defect annihilation instead of mass flow.

      • 쇄골 중간부 골절후 불유합 및 지연 유합의 원인

        윤정로,심재익,김택선,이성종,김영배,김학준,안국환,장재영,홍명표 대한골절학회 2002 대한골절학회지 Vol.15 No.4

        쇄골 중간 1/3 부위의 골절은 치료 결과가 양호하여 보존적 치료가 원칙적으로 받아 들어지고 잇으며 불유합에 대한 빈도도 낮은 것으로 되어 있다. 그러나 최근 전위 및 단축의 정도가 심할 경우 높은 불유합의 결과와 불량한 임상 결과를 보고하고 있어 이런 예에 대해선 수술적 치료를 권장하고 있다. 저자들은 단축 및 전위의 정도와 불유합의 연관성을 알아보고자 하였다. 연구 대상 및 방법 : 1993년 2월부터 2002년 1월까지 본원에 내원 했던 성인 중간부 쇄골 골절 환자 194명 중 완전 전위를 보인 78례를 조사하여 이중 63례를 대상으로 분석하여 후 향적 연구를 시행하였다. 4개월 추시 후에도 방사성 사진상 유합 소견이 관찰되지 않으면 불유합의 유의성을 알아보고자 하였다. 결 과 : 63례 중 불유합 및 지연 유합을 소견을 보인 환자는 15(23%)례였다. 골유합을 보인 48례의 단축은 평균 8.6㎜(2㎜-17㎜)였고, 전위는 평균 9.7㎜(2-22㎜)였다 .불유합 및 지연 유합을 보였던 15례에서 단축은 평균 14.5㎜(3㎜-37㎜), 전위는 평균 17.3㎜(4-25㎜)였다. 18㎜이상 단축이 있었던 경우 불유합의 발생과는 통계학적으로 유의성을 나타내었고(Fisher's exact test, p<0.01), Chi-square test상 16㎜ 이상의 전위를 보였던 경우 불유합 발생과 통계학적으로 의미가 있었다(p<0.01). 결 론 : 쇄골 골절 특히 중간 1/3의 골절은 비교적 보존적 치료에 결과가 좋은 것으로 되어 있으나, 전위 및 단축이 심한 경우 불유합에 대한 가능성이 높이 때문에 보다 경과 관찰시 유합의 진행이 없으면 적극적인 치료를 고려해야한다. Purpose : Because the prognosis of the mid 1.3 clavicle fracture is good, the conservative treatment with a figure of 8 bandage is the gold standard and the nonunions are rare. However, recently surgical treatment is recommended when the shortening and displacement is severe because of the high nonunion rate and the poor clinical result. This study was undertaken to evaluate that the shortening and displacement at fracture site are associated with the development of nonunion. Materials and Methods : We analysed the 194 fractures of mid 1/3 clavicle in adults which had been treated conservatively from February 1993 to January 2002 and did the retrospective study. Of these, 78 cases were originally in the middle third of the clavicle and had been completely displaced. We reviewed 63 of these cases. The shortening and displacement at the fracture site was measured on the initial roentgenogram. And the analysis of the patients' chart was done for another predisposing nonunion factors. Nonunion and delayed union are considered to be present when there has been little or no progression of clinical or radiographic healing at a minimum of 4 months after injury. Results : 15 of the 63 cases had developed nonunion.. The average 8.6㎜(2㎜-17㎜) shortening and average 9.7㎜(2-22㎜) in the union patients. The average 14.5㎜(3㎜-37㎜) shortening and average 17.3㎜(4-25㎜) in the nonunion patients. We found that initial shortening ≥18㎜(Fisher's exact test, p<0.01) and initial displacement ≥ 16㎜(Chi-square test. p<0.01)at the fracture site were significantly associated with the development of nonunion. Conclusion : The conservative treatment with figure-80-bandage is the gold standard in the clavicle middle one third fracture. However, the nonunion is commonly occurs in the cases of more of severely shortened and displaced fractures. If there are no signs of callus formation and the patient complains of pain after several week, osteosynthesis should be considered.

      • KCI등재후보

        농부가 아닌 환자에서 발생한 긴털가루진드기(Tyrophagus Putrescentiae)에 의한 기관지천식 1례

        최대로,김형수,고창옥,김희선,윤호성,박용범,김상훈,이재영 대한천식 및 알레르기학회 2004 천식 및 알레르기 Vol.24 No.1

        Storage mites are believed one of the most important allergens in farmers and rural regions. Tyrophagus putrescenitiae, belonging to storage mites, is found not only within storehouses but also in the house dust, and the third most common mites following Dematophagoides farinae and Dermatophagoides pteronyssnus in house dust in Korea. The sensitization rate to Trophagus putrescentiae was reported as high as that of house dust mite in patients visiting the allergy clinic in large cities in Korea. We experienced a 69-year-old man who had suffered from dyspnea, wheezing, and coughing for 10 years. He retired from the teaching profession, and had lived in a large city. Deajeon. The skin prick test showed a positive reaction to Tyrophagus putrescentiae and negative reactions to house dust mites. The bronchial challenge test with Tyrophagus putrescentiae showed late asthmatic reaction. We confirmed a Tyrophagus putrescentiae induced asthma in non occupational setting. (J Asthma Allergy Clin Immunol 24 : 141-5, 2004)

      • 문자 교육에 대한 유치원과 초등학교 교사의 인식 조사

        신동로,고재희,홍성근 全北大學校 敎育大學院 1997 敎育論叢 Vol.17 No.-

        The purpose of the study was to investigate the perceptions of teachers in preschools and primary schools, in order to research the sequence of literacy curriculum. The results of study were as follows : ⑴ there was a lot of gap of teachers' perceptions between private and public preschools, as well as primary schools. ⑵ most of primary teachers recognized young children's literacy lower than preschool teachers, and ⑶ most of primary teachers, as well as preschool teachers, wanted to adapt formal instruction of literacy in preschools, although they responsed the negative effect of that method. The conclusions of study were as follows : ⑴ literacy curriculum in preschool is reviewed to prescripe the level explicitly, ⑵ preschool education is taken the resposibility on Nation Insitute, in order to reduce the gap of level between private and public preschools, and ⑶ in order to reduce the gap of the perception of teachers between preschool's and primary school's curriculum, it is reformed that the teacher's qualification of the first grade in primary school intergrates that of preschool and inservice education need to be taken together.

      연관 검색어 추천

      이 검색어로 많이 본 자료

      활용도 높은 자료

      해외이동버튼