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유기용제 취급근로자들의 요중대사물질과 말초임파구 자매염색분체교환 발현빈도에 관한 조사연구
김돈균,황인경,류철인,이수일,정갑열,이용환,이충렬,현원일,김석봉,전용덕 大韓産業醫學會 1990 대한직업환경의학회지 Vol.2 No.1
저자들은 유기용제 취급여성근로자 90명을 대상으로 1988년 7월부터 1989년 8월까지 말초혈액임파구에서의 자매염색분체교환의 발현빈도를 조사하고 이들의 업종, 근속연수, 요중마뇨산 농도등이 자매염색분체교환의 발현빈도에 미치는 영향을 조사하였으며 그 결과를 요약하면 다음과 같다. 1. 유기용제 취급근로자들의 말초혈액임파구에서의 자매염색분체교환의 발현빈도는 대조군에 비하여 유의하게 증가되었다. 2. 말초혈액임파구에서의 자매염색분체교환의 발현빈도가 가장 높은 업종은 프라스틱제품 제조업이었다. 3. 근속연수가 말초혈액임파구에서의 자매염색분체교환의 발현빈도에 미치는 영향은 현저하지 않았다. 4. 요중마뇨산농도와 말초혈액임파구에서의 자매염색분체교환의 발현빈도간에는 유의한 상관관계가 있었다. In order to know the possibility of utilizing the sister chromatid exchanges as an index which could evaluate the effect of organic solvents on the health in industrial workers, the authors studied the effects of the inductivity of sister chromatid exchanges in peripheral lymphocytes from 90 female workers expoxed to organic solvents and 20 non-exposed female workers. The results obtained were as follows : 1. The frequency of sister chromatid exchanges in peripheral lymphocytes from 90 female workers exposed to organic solvents was significantly increased in comparison with 20 control subject. 2. The frequency of sister chromatid exchanges was significantly increased in the workers who were employed in the manufacture of plastic materials than the other manufactures. 3. There were no significant differences in the frequency of sister chromatid exchanges by carriers of the exposed workers.
한국 정신장애의 역학 조사 연구[I] : 각 정신장애의 유병률
조맹제,함봉진,김장규,박강규,정은기,서동우,김선욱,조성진,이준영,홍진표,최용성,박종익,이동우,이기철,배재남,신정호,정인원,박종한,배안,이충경 大韓神經精神醫學會 2004 신경정신의학 Vol.43 No.4
Objectives : This study aims to estimate the prevalence of the DSM-IV psychiatric disorders in Korean population using the Korean version of Composite International Diagnostic Interview (K-CIDI). Methods : Subjects were selected by taking multi-stage, cluster samples of 7,867 adult household residents, 18 to 64 years of age, in ten catchment areas. Total 78 trained interviewers administered the K-CIDI to the selected respondents, from June 1 to November30,2001. Results : Total 6,275 respondents completed the interview. Some 33.5% of respondents reported at least one lifetime disorder, 20.6% reported at least one-year disorder, and 16.7% reported at least one-month disorder. The most common lifetime disorders were alcohol abuse/dependence (17.24%), nicotine dependence/withdrawal (11.19%), specific phobia (5.16%), and major de-pressive disorder (4.25%). The lifetime prevalence of substance abuse/dependence (0.25%) and schizophrenia (0.16%) was very low. Nicotine and alcohol use disorder showed very high male/female ratio. Mood disorder and anxiety disorder were more prevalent among female than male. Conclusion : The prevalence of psychiatric disorders was high. In comparison with other studies, remarkable differences in distributions of psychiatric disorders across the areas and times were observed.
이재철,이충훈,오용호 圓光大學校 基礎自然科學硏究所 1997 基礎科學硏究誌 Vol.15 No.2
0.8㎛ CMOS 공정 기술을 사용하여 셀 라이브러리를 개발하고 성능을 평가하였다. 셀 라이브러리는 150여 개의 기본 리프 셀(leaf cell)과 이들의 상호 연결만 기록한 마크로 기능(macro function) 블럭으로 구성하였다. 셀 라이브러리의 성능을 측정하고 논리 시뮬레이션 모델을 개발하기 위하여 평가 칩을 설계하여 제작하였다. 셀 배치 및 배선 프로그램으로 설계한 마크로 기능(82C37)칩을 실제 제작하여 시뮬레이션 모델의 정확성을 측정하고 라이브러리의 신뢰도를 평가하였다. We developed a standard cell library using 0.8㎛ CMOS process technology and evaluated the performance of the library. The library is consisted of 150 basic leaf cells and the macro functions which have the connection information of leaf cells. Also, we designed and produced a performance chip to evaluate the cell library and to develop a logic simulation model. Finally, we designed and macro function chip with a cell placement and routing program to measure the accuracy of the simulation model and the reliability of the library.
지베렐린 관련 유전자 증폭을 위한 최적 PCR 반응 조건
이용현,김충일,이미영 순천향대학교 기초과학연구소 2001 순천향자연과학연구 논문집 Vol.7 No.1
Optimum conditions of PCR amplification for gibberellin-related genes such as GOX2 and GAI were determined by altering annealing temperature and primer concentration in order to minimize mispriming PCR products. Selective amplifications of GOX2 and GAI genes were performed with 40 ng template DNA, 0.5 μM M13 forward/reverse primer and annealing temperature of 62 ℃. 30 cycles of PCR reaction profiles were denaturation for 60 sec at 94 ℃, annealing of primers for 60 sec at 62 ℃, extension of primers for 60 sec for 72 ℃, final extension for 5 min at 72 ℃ and cooling at 4 ℃.
Giga Bit DRAM 을 위한 MOS DEVICE 축소 한계
이충훈,이재철,오용호 圓光大學校 基礎自然科學硏究所 1995 基礎科學硏究誌 Vol.14 No.1
실리콘 반도체 집적 소자와 공정의 현재 발전 상황과 전망을 살펴 보았다. 현재 반도체 생산 현장에서는 16M DRAM을 대량 생산중이고, 64M DRAM이 대량 생산을 준비 중에 있다. 연구소 수준의 256M DRAM이 개발되었으며, 1G DRAM의 연구가 진행 중에 있다. 0.06∼0.1㎛ 크기의 단위 소자를 위한 연구도 연구소에서 진행되고 있으며, 이 크기는 20여년 전 B.Hoeneinsen과 C.Mead에 의해 예측된 실리콘 소자의 한계인 ∼0.2㎛를 이미 초월해 있다. 본 논문에서는 반도체 소자 및 공정 상의 여러 제약과 문제점을 소개하고 해결책을 제시한다. 이러한 문제점은 Sub-quarter micron소자의 문제, 0.1㎛ 근처의 소자 축소 문제, 0.1㎛근처의 소자를 위한 Lithography 및 Etching 관련된 기술적인 발전, 고집적 DRAM위한 고 유전을 물질의 개발, 고속 소자 및 유전체 평탄화 등이다. 결론으로써, 소자 가공의 현재의 연구 방향 및 미래의 전망을 표로써 정리한다. In the following pages, we will review the current status and the prospects for silicon semiconductor devices and process technologies. At present, the 16M DRAM is under mass production, and 64M DRAM is being prepared mass production. In addition, a fully operational 256M DRAM has been developed at research level. Furthermore, new silicon devices with a minimum feature size in the 0.06∼0.1㎛ are under development. This minimum feature size is less then half the physical limit of ∼0.2㎛ predicted by B.Hoeneinsen and C.Mead 20 years ago. This limitation and various other obstacles to the development of semiconductor engineering are the topics of this paper. These obstacles include; devices issues of sub-quarter micron size, device scaling problems near0.1㎛, technical development related to 0.1㎛ lithography and etching, high and low dielectric materials for the higher density, higher speed devices, and dielectric planarization. And in summary, we present a table which illustrate the current research direction and future prospects for device fabrication limits.
구내신연장치를 이용한 치조골증대술 후 임프란트 매식 : 치험 5예 REPORT OF 5 CASES
이용욱,박충열,송종운,박홍주,김영운,오희균,유선열 대한악안면성형재건외과학회 2002 Maxillofacial Plastic Reconstructive Surgery Vol.24 No.2
Successful alveolar ridge augmentation by distraction osteogenesis method has been reported previously. There are several types of devices for alveolar ridge augmentation. In this paper, a new intraoral distraction device was used on the severe atrophic mandible in order to distract an alveolar ridge vertically in 5 patients. Mean amount of distracted alveolar ridge was 7.4㎜ (5∼9.5㎜). Dental implants were placed in the distracted alveolar bone and good osseointegration was obtained in all patients. Mean follow up period is 2years 6months (7months∼4years 9months). No complications, such as infection or resorption was observed in all patients. Alveolar ridge augmentation by gradual distraction seems to be a safe, simple and reliable procedure.
李善鏞,金永銓,張忠根,徐日煥 충남대학교 자연과학연구소 1982 忠南科學硏究誌 Vol.9 No.1
The crystal structure of potassium chloride and potassium bromide have been determined by X-ray diffraction method. Both unit cells are face-centered cubic, F(4/m)3 ̄(2/m) z=4 but a=5.2857Å, V=248,348Å^3, D_c=1.989 gr/㎤ for KCl and a=6.5891Å, V=286.074Å^3, D_c=2.756 gr/㎤ for KBr. the structures were solved by graphical method using thirteen KCl and eleven KBr powder diffractometer data. The agreement between the experimental and theoretical integrated intensities of the reflecting planes is fairly good. The crystal are aggregates of positive and negative ionic atoms. Each atom has six nearest neighbors of the other kind. The distances between unlike atoms are 3.1429Å in KCl and 3.2945Å in KBr.