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이상진(Sangjin Lee),김병우(Byeongwoo Kim) 한국자동차공학회 2012 한국자동차공학회 부문종합 학술대회 Vol.2012 No.5
Haptic device is regarded as the human machine interface technology for easier, more accurate, and intuitive operation. This paper is studied to improve the cognitive ability of existing vehicle haptic device used by only a tactile feedback. On the multi-sensory feedback usability evaluation, the haptic device is used by adding sound feedback to the existing vehicle haptic device. The emotional factor that driver has on the haptic device is extracted by the sensibility analysis. As a result, it is possible to suggest the design direction that satisfies the driver.ract here.
부산 아파트 단지 배치형태 변화의 요인과 과정에 관한 연구
이상진(Lee, Sangjin),박소현(Park, SoHyun) 대한건축학회 2019 대한건축학회논문집 Vol.35 No.3
This study explores the causes and processes of morphological transformation of apartment complexes in Busan. All apartment complexes built until the year 2016 were selected for statistical analysis, drawing/map examination, field observation, selected expert interviews based on 6 periodical groups: Period I(∼1990), Period II(1991∼1995), Period III(1996∼2000), Period IV(2001∼2005), Period V(2006∼2010), and Period VI(2011∼2016). The research argues for three ‘arrangement’ types, P1U, L1U and P2U, which have dominated the whole periods occupying 88% of the total 260 complexes. The switch of the leading type represents for morphological transformation of apartment complexes. Four aspects, density(F.A.R.), height(maximum number of floors), deformed-building-type ratio, and building-orientation, have affected the change of ‘arrangement’ types. Density was the major cause of the arrangement-type switch, from P1U to L1U, on Period II(1991∼1995). The morphological change, from type L1U to P2U, on Period V(2006∼2010) was caused by height and orientation, and is correlated with the increased number of deformed-type buildings. The first phase morphological change on Period II(1991∼1995) was resulted by the supply side of apartment. However, the second phase transformation on Period V(2006∼2010) had gone through the complex process including reflection of consumers’ demands. The significance of research is to reveal the morphological transformation process of apartment complexes through analytical investigation of the entire apartment data in Busan. The result shows that the major change of urban paysage started to occur from Period V(2006∼2010), and the superficial evaluation on apartment ‘being monotonous and repetitive’ may not be proper at least from the perspective of town plan.
사파이어 화학기계적 연마에서 결정 방향이 재료제거 특성에 미치는 영향
이상진(Sangjin Lee),이상직(Sangjik Lee),김형재(Hyoungjae Kim),박철진(Chuljin Park),손근용(Keunyong Sohn) 한국트라이볼로지학회 2017 한국윤활학회지(윤활학회지) Vol.33 No.3
Sapphire is an anisotropic material with excellent physical and chemical properties and is used as a substrate material in various fields such as LED (light emitting diode), power semiconductor, superconductor, sensor, and optical devices. Sapphire is processed into the final substrate through multi-wire saw, double-side lapping, heat treatment, diamond mechanical polishing, and chemical mechanical polishing. Among these, chemical mechanical polishing is the key process that determines the final surface quality of the substrate. Recent studies have reported that the material removal characteristics during chemical mechanical polishing changes according to the crystal orientations, however, detailed analysis of this phenomenon has not reported. In this work, we carried out chemical mechanical polishing of C(0001), R(1102), and A(1120) substrates with different sapphire crystal planes, and analyzed the effect of crystal orientation on the material removal characteristics and their correlations. We measured the material removal rate and frictional force to determine the material removal phenomenon, and performed nano-indentation to evaluate the material characteristics before and after the reaction. Our findings show that the material removal rate and frictional force depend on the crystal orientation, and the chemical reaction between the sapphire substrate and the slurry accelerates the material removal rate during chemical mechanical polishing.