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반도체 감광막 제거공정 적용을 위한 고농도 오존발생장치 개발
손영수,함상용 대한전기학회 2006 전기학회논문지C Vol.55 No.12C
- we have been developed on the ultra high concentration ozone generator system which is the core technology in the realization of the semiconductor photoresist strip process using the ozone-vapor chemistry. The proposed ozone generator system has the structure of the surface discharge type which adopt the high purity ceramic dielectric tube.We investigate the performance of the proposed ozone generator system experimentally and the results show that the system has very high ozone concentration characteristics of 19.7[wt%/O2] at the flow rate of 0.3[ℓ/min] of each discharge cell. As a result of the silicon wafer photoresist strip test, we obtained the strip rate of about 400[nm/min] at the ozone concentration of 16[wt%/O2] and flow rate of 8[ℓ/min.]. So, we confirmed that it's possible to use the proposed high concentration ozone generator system for the ozone-vapor photoresist strip process in the semiconductor and FPD industry.
손영수,함상용,김병인,이성휘,Son, Young-Su,Ham, Sang-Yong,Kim, Byoung-Inn,Lee, Sung-Hwee 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.11
The realization of the photoresist(PR) removal method with vaporized water and ozone gas mixture has been studied for the LCD TFT array manufacturing. The developed PR stripper uses the water boundary layer control method based on the high concentration ozone production technology. We develop the prototype of PR stripper and experiment to find the optimal process parameter condition like as the ozone gas flow/concentration, process reaction time and thin boundary layer formation. As a results, we realize the LCD PR strip rate over the 0.4 ${\mu}m/min$ and this PR removal rate is more than 5 times higher than the conventional immersion type ozonized water process.
SPM을 이용한 반도체 포토레지스트 제거 공정 대체를 위한 DIW-$O_3$ 방식 세정기술 개발
손영수,함상용,Son, Yeong-Su,Ham, Sang-Yong 한국기계연구원 2003 硏究論文集 Vol.33 No.-
Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.
윤동원(Yun Dongwon),함상용(Ham Sangyong),박중호(Park Jungho),윤소남(Yun Sonam),김칠성(Kim Chilsung) 대한기계학회 2011 대한기계학회 춘추학술대회 Vol.2011 No.10
In this paper, a program to analyze the proportional solenoid valve is developed with conventional FEM tool. To achieve the convenience and analysis accuracy, it is supposed that the solenoid valve is composed of some simple geometries, which are a triangle and a rectangle. This assumption make the modeling of valve simple. To check the feasibility of the developed code, a real example of a solenoid valve are analyzed and it is found that the code can calculated for the valve and the characteristic of a proportional valve is shown with graphs.
비례솔레노이드 밸브의 해석을 위한 전후처리기에 대한 연구
윤동원(Dongwon Yun),함상용(Sangyong Ham),박중호(Jungho Park),윤소남(Sonam Yun),김칠성(Chilsung Kim) 대한기계학회 2012 大韓機械學會論文集A Vol.36 No.8
본 논문에서는 기존의 유한요소 프로그램을 이용하여 솔레노이드 밸브의 해석을 용이하게 하는 프로그램 개발에 대해서 다루었다. 비례솔레노이드 밸브에서 정확한 해를 얻기 위해서는 이론적인 식보다 기존의 유한요소 해석툴을 이용하는 것이 유리하며, 이때 사용자의 편의성을 위해서 솔레노이드의 형상을 삼각형, 사각형 등의 간단한 도형의 조합이라고 가정하여 모델링하도록 하였다. 이러한 가정을 사용하여 개발된 솔레노이드 해석 프로그램은 사용자가 솔레노이드의 유한요소 모델을 쉽게 생성할 수 있도록 해주었다. 개발된 프로그램의 유용성을 검증하기 위해 실제 솔레노이드 밸브에 대한 해석을 수행하였으며, 해석결과 개발된 프로그램은 솔레노이드 밸브의 비례특성을 잘 해석할 수 있음을 알 수 있었다. In this study, a wrapping program was developed to analyze a proportional solenoid valve more easily using a conventional finite element method (FEM) tool. To achieve an accurate solution when analyzing a solenoid valve, finite element analysis (FEA) is more suitable than a lumped method. To develop a program for modeling and analyzing the valve performance using FEA code for the user"s convenience, it is assumed that the solenoid valve is composed of some simple geometries, namely, a triangle and a rectangle. This assumption helps users to model a solenoid valve simply. To check the feasibility of the developed code, an actual solenoid valve is analyzed, and it is found that the code can suitably analyze this valve. The characteristics of the proportional valve are well identified as indicated through the graphs.