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중증 궤양성 대장염에서 치료 성적의 예측인자와 Cyclooxygenase - 2 발현과의 관계
박동일(Dong Il Park),김영호(Young Ho Kim),성인경(In Kyung Sung),이용육(Yong Wook Lee),이준행(Jun Haeng Lee),김지은(Jee Eun Kim),현재근(Jae Geun Hyun),장재권(Jae Kwon Jang),손희정(Hee Jung Son),이풍렬(Poong Lyul Rhee),김재준(Jae J . K 대한소화기학회 2001 대한소화기학회지 Vol.38 No.1
Background/Aims: Percutaneous endoscopic gastrostomy (PEG) has been widely performed for patients who require prolonged tube feeding support. A retrospective study was conducted to evaluate the complications of PEG and determine the predictors of wound infection. Methods: Medical records of 144 cases of PEG that was per- formed between January 1996 and June 2000 were reviewed to examine the types and frequency of complication, difference in wound infection rates according to age, sex, and underlying diseases. We also analyzed the effects of antibiotics prophylaxis on wound infection and the result of culture from wound infection site. Results: In 28 of 144 PEG cases (19.4%), several complications developed after procedure. Wound infection was the most common complication and occurred in 22 of 144 cases (15.3%) and Pseudomonas aeruginosa was the most common pathogenic microorganism. Other complications included bleeding from gastrostomy site, stomal leaks, and gastroesophageal reflux. There was no statistical difference in wound infection rates according to underlying diseases and antibiotics prophylaxis. However, wound infection developed more frequently in diabetes patients (p<0.05). Old age and underlying diabetes were predictors for developing wound infection after PEG in multiple logistic regression analysis. Conclusions: Old age and DM can be predictors of wound infection associated with PEG. (Korean J Gastroenterol 2001;38:23-28)
원발성 담즙성 경변증 16예의 임상상 : 단일 센터 경험
박동일(Dong Il Park),고광철(Kwang Cheol Koh),이준혁(Jun Hyek Lee),최문석(Moon Seok Choi),강태욱(Tae Wook Kang),문원(Won Moon),류민규(Min Kyoo Ryu),이용욱(Yong Wook Lee),김지은(Jee Eun Kim),현재근(Jae Geun Hyun),장재권(Jae Kwon Jang) 대한내과학회 2000 대한내과학회지 Vol.59 No.6
Background : Primary biliary cirrhosis (PBC) is a chronic cholestatic liver disease of unknown etiology. The disease is relatively common in western countries, but so far, only about 20 cases have been reported in Korea. Thus, the purpose of our prospective study was to evaluate the clinical characteristics of PBC in Korea. Methods : Between October 1994 and February 1999, 16 patients diagnosed as PBC at our department were enrolled in this study. We analyzed these patients for the distribution of age and sex, initial symptoms and signs, associated disorders, laboratory, endoscopic, and radiologic and histologic findings. Results : Of the 16 patients, the ratio of male to female was 1:7 and the average age was 57.5 years. Pruritus (37.5%) was the most frequent presenting symptom followed by xerostomia and xerophthalmia (12.5%), jaundice (6.3%), chronic fatigue (6.3%), melena (6.3%). Associated disorders were Sj gren's syndrome (25%), arthropathy (12.5%), Raynaud's phenomenon (6.3%) and diabetes (6.3%). Abnormalities of liver function were found frequently. Antimitochondrial antibody (100%), antinuclear antibody (31.25%) and rheumatoid factor (31.25%) were found. Long-term administration of UDCA improved both clinical and biochemical signs in most patients, however, 2 patients experienced exacerbation during UDCA therapy. Conclusions : We experienced 16 cases of PBC within a short period. It is expected that we can find these patients more frequently if we suspect this disease in patients with pruritus and unexplained obstructive pattern of liver function abnormality.(Korean. J. Med 59:634-640, 2000)
박동일(Dong Il Park),조남인(Nam-Ihn Cho) 한국진공학회(ASCT) 1997 Applied Science and Convergence Technology Vol.6 No.1
0.25 ㎛ 이하의 최소선폭을 갖는 초고집적회로에 사용할 수 있는 구리박막의 형성기술을 조사하였다. 본 실험에서는 측면박막 형성에 적합한 화학적 증착을 시도하였으며 (hfac)Cu(VTMS) (hexafluoroacetylacetonate vinyltrimethylsilane copper(Ⅰ))로 명명된 금속유기 화합물을 원료로 사용하였다. 구리박막의 형성은 TiN와 SiO₂ 모재 위에 이루어 졌으며, 형성 중에 모재의 온도와 증착용기 내 압력의 함수로서 집적회로 공정상 주요 변수인 박막의 비저항, 박막의 증착선택도를 측정하였다. 구리박막은 모재온도 180℃와 증착용기의 압력 0.6 Torr의 조건에서 가장 좋은 전기적 성질을 보여 주었다. 이 조건에서 형성된 구리박막은 다결정 구조를 나타내었으며 구리박막의 증착속도는 120 ㎚/min, 비저항은 2.5 μΩㆍ㎝, 평균 거칠기는 15.5 ㎚로서 0.25 ㎛ 이하 선폭의 집적회로에서 요구되는 전기적, 재료적 사양에 근접한 구리박막을 얻었다. 또한 140-250℃의 모재 온도 범위에서 TiN 모재와 SiO₂ 모재 사이에 뚜렷한 증착선택성이 관측되었다. We have investigated the formation techniques of copper thin films which would be useful for sub-quarter-micron integrated circuits. A chemical vapor deposition technology has been tried for the better side wall formation of the thin films, and a metal organic compound, named (hfac)Cu(VTMS) (hexafluoroacetylacetonate vinyltrimethylsilane copper(Ⅰ)) was used as the precursors. We have deposited the copper thin films on TiN and SiO₂ substrates. The film resistivity and deposition selectivity have been measured as functions of substrate temperature and chamber pressure. Best electrical properties were obtained at 180℃ of substrate temperature and 0.6 Torr of chamber pressure. Under the optimun deposition conditions, polycrystalline copper structures were observed to be grown, and the deposition rate of 120 ㎚/min was measured. The electrical resistivity as low as 2.5 μΩㆍ㎝, and the surface roughness of 15.5 ㎚ were also measured. These are the suitable electrical and material properties required in the sub-quarter-micron device fabrication. Also, in the substrate temperature range of 140-250℃, high deposition selectivity was observed between TiN and SiO₂.