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염료감응 태양전지의 비백금 상대전극을 위한 니켈 나노입자-흑연질 탄소나노섬유 복합체
오동현,구본율,이유진,안혜란,안효진,Oh, Dong-Hyeun,Koo, Bon-Ryul,Lee, Yu-Jin,An, HyeLan,Ahn, Hyo-Jin 한국재료학회 2016 한국재료학회지 Vol.26 No.11
Ni nanoparticles (NPs)-graphitic carbon nanofiber (GCNF) composites were fabricated using an electrospinning method. The amounts of Ni precursor used as catalyst for the catalytic graphitization were controlled at 0, 2, 5, and 8 wt% to improve the photovoltaic performances of the nanoparticles and make them suitable for use as counter electrodes for dye-sensitized solar cells (DSSCs). As a result, Ni NPs-GCNF composites that were fabricated with 8 wt% Ni precursors showed a high circuit voltage (0.73 V), high photocurrent density ($14.26mA/cm^2$), and superb power-conversion efficiency (6.72%) when compared to those characteristics of other samples. These performance improvements can be attributed to the reduced charge transport resistance that results from the synergetic effect of the superior catalytic activity of Ni NPs and the efficient charge transfer due to the formation of GCNF with high electrical conductivity. Thus, Ni NPs-GCNF composites may be used as promising counter electrodes in DSSCs.
태양열 흡수판용 복층 TiNOx 박막의 제조와 특성 분석
오동현,김현후,한상욱,장건익,이용준 한국전기전자재료학회 2014 전기전자재료학회논문지 Vol.27 No.12
TiNOx multi-layer thin films on aluminum substrates were prepared by DC reactivemagnetron sputtering method. 4 multi-layers of TiO2/TiNOx(LMVF)/TiNOx(HMVF)/Ti/substrate havebeen prepared with ratio of Ar and (N2+O2) gas mixture. TiO2 of top layer is anti-reflection layer ondouble TiNOx(LMVF)/TiNOx(HMVF) layers and Ti metal of infrared reflection layer. In this study, thecrystallinity and surface properties of TiNOx thin films were estimated by X-ray diffraction(XRD) andfield emission scanning electron microscopy(FE-SEM), respectively. The grain size of TiNOx thin filmsshows to increase with increasing sputtering power. The composition of thin films has been investigatedusing electron probe microanalysis(EPMA). The optical properties with wavelength spectrum wererecorded by UV-Vis-NIR spectrophotometry at a range of 200∼1,500 nm. The TiNOx multi-layer filmsshow the excellent optical performance beyond 9% of reflectance in those ranges wavelength. TiNOx 박막은 Al 타깃을 이용하여 Al 기판 위에 Ar과 N2 가스의 비율을 조정하면서 dc 반응성 마그네트론 스퍼터링법으로 증착되었다. Al 타깃은 3 inch의 지름으로 99.99%의 순도를 사용하였다. 진공 챔버는 최저압력 5×10-7 Torr이였고, Ar+N2 가스(99.99%)를 주입하여 동작압력은 약 2~5×10-3 Torr 정도 사용하였다. TiNOx 박막의 물성 및 표면 특성은 XRD, FESEM 및 SIMS (secondary ion mass spectroscopy)로 분석하였고, 광학적 특성은 UV-Vis-NIR spectrophotometry로 측정하였다. 측정결과로 열처리 온도의 증가에 따라 결정립이 커졌으며, 광흡수율은 9% 이하 정도였다.