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      • 捻轉法이 竝行된 鍼刺戟 및 電鍼刺戟이 鎭痛效果에 미치는 影響

        Park, Dong-Seok,Kim, Ji-Hoon,Min, Byung-Il,Oh, Soo-Myung 경희대학교 동서의학연구소 1999 INTERNATIONAL SYMPOSIUM ON EAST-WEST MEDICINE Vol.1999 No.1

        Dong-Seok Park¹, Ji-Hoon Kim¹ and Byung-Il Min, Soo-Myung Oh,³¹Department of Acupuncture and Moxibustion, College of Medicine, ²Department of Physiology, College of Medicine, And ³East-West Medical Research Institute, Kyung Hee University,Seoul, Korea. Analgesic Effect of Manual Acupuncture and Electroacupuncture combined with Twirling Method. Proceeding of International Symposium on East-West Medicine Seoul. 187-200, 1999.-Twirling the needle (TN) is one of several needing methods frequently used for acupuncture in the oriental medicine. The present study was conducted to see if TN enhanced the antinociceptive effect produced by plain-or electroacupuncture in the rat tail flick test. Rats (Sprague-Dawley, 200-300g)lightly anesthetized with thiopental sodium(40mg/kg, i.p.) were used in the tail-flick test. The basal reaction time for tail-flick was 2 sec. For "plain" acupuncture(PA), a needle was inserted for 20 min into a Chock-samni (ST36) acupuncture point which (is located at the anterior tibial muscle and about 10mm below the knee joint). For electroacupuncture(EA), train-pulses(3 Hz,0.3-ms pulse width, 0.2-0.3mA) were applied to the inserted needle for the period of insertion. For combining TN with either PA or EA, TN was performed during the each acupuncture period. Two methods for TN were used; twirling 3 times for 1 second persisted for 1 min in every 5 mins(long-duration and long-interval;LDLI) and twirling 3 times for 1 second persisted for 10 sec in every 1 min(short-duration and short-interval;SDSI). PA and EA produced an increase in tail flick latency (TFL); peak increases were 21.3±5.1% and 42.1±17.3% of the pre-acupunture control, respectively, and occurred immediately after cessation of 20min-acupuncture. Performing TN combined with PA increased TFL more than PA itself by showing a greater peak increase in TFL when performed with a SDSI-TN than with a LDLI-TN(60.6±12.5% and 42.7±22.7% of the pre-acupuncture control, respectively). Performing TN combined with EA also increased TFL more than EA itself and a greater peak increase in TFL was observed with a SDSI-TN as compared to a LDLI-TN(77.5±13.8% and 67.3±14.0% of the pre-acupuncture control, respectively). These results indicate that TN enhances both PA-and EA-produced antinociception where an greater enhanced antinociception than a LDLI-TN. It is suggested that performing a SDSI-TN combined with EA seems to be one of the most effective ways to produce analgesia.

      • 트렌치 게이트 전력 DMOSFET 응용을 위한 트렌치 게이트 형성

        박훈수 위덕대학교 산업기술연구소 2005 산업기술연구소 논문집 Vol.9 No.1

        본 연구에서 실리콘 트렌치 에칭공정에서 에칭 가스 및 첨가가스에 따른 단면, 표면 거칠기 및 결정결함을 포함한 트렌치 에칭 특성에 대하여 연구하였다. HBr/He-O_(2)/SiF_(4) 에칭 가스를 사용한 경우 기장 좋은 트렌치 모양과 결정결함이 최소화된 트렌치를 형성할 수 있었다. 첨가한 산소 가스로 인하여 표면에 잔류 산화막이 형성되어 트렌치 식각과정에서 보호막으로 작용하여 under cut이나 결함 발생이 억제됨을 알 수 있었다. 트렌치 게이트의 특성을 향상시키기 위하여 수소 어닐링 공정을 실시하였다. 수소 어닐링 공정으로 트렌치 코너로의 실리콘 원자 이동이 발생하여 트렌치 코너부가 라운딩되었다. 트렌치 코너가 라운딩 됨으로써 균일한 게이트 산화막이 성장되고 게이트 전장을 줄일 수 있어 게이트 산화막의 TDDB 신뢰성 특성이 크게 증가하였다. In this study, the etched trench properties including cross-sectional profile, surface roughness, and crystalline defects were investigated depending on the various silicon etching and additive gases. For the case of HBr/He-O_(2)/SiF_(4) trench etching gas mixtures, the excellent trench profile and minimum defects in the silicon trench were achieved. Due to the residual oxide film grown by the additive oxygen gas, which acts as a protective layer during trench etching, the undercut and defects generation in the trench were suppressed. To improve the electrical characteristics of trench gate, the hydrogen annealing process after trench etching was also adopted. Through the hydrogen annealing, the trench corners might be rounded by the silicon atomic migration at the trench corners having high potential. The rounded trench corner can afford to reduce the gate electric field and grow a uniform gate oxide. As a result, dielectric strength and TDDB characteristics of the hydrogen annealed trench gate oxide were remarkably increased compared to the non-hydrogen annealed one.

      • SCIESCOPUSKCI등재
      • KCI등재

        2.9% 과산화수소를 함유한 부착형 미백제의 임상적 효능과 안정성에 관한 연구

        박은숙,성소래,홍성태,김지은,이소영,황수연,이신재,진보형,손호현,조병훈 大韓齒科保存學會 2006 Restorative Dentistry & Endodontics Vol.31 No.4

        2.9%의 과산화수소를 함유한 시험용 부착형 미백제(Medison dental whitening strip, Samsung medical Co.,Anyang,Korea)를 실험군 피험자 23명, 시험용 미백제에서 과산화수소를 제외한 동일한 제재를 대조약으로 대조군 피험자 24명에게 매일 1시간 30분씩, 2주간 적용하여 임상적 효능과 안전성을 평가하였다. 미백 효과는 Shade Vision, Chroma Mete 및 Vitapan classical shade guide를 이용하여 색변화를 측정하여 다음과 같은 결론을 얻었다. 1. 실험군에서의 전체 치아의 색변화량(ΔE^(*))은 세 가지 측정법에서 모두 대조군에 비해 통계적으로 유의한 차이를 보였고 (p < 0.05). 쉽게 인지할 수 있는 정도였다. 2. 색변화는 색좌표 상에서 명도의 증가와 녹색조 및 청색조로의 변화에 의해 얻어졌다. 3. 치아별로는 어두운 견치의 색변화량이 가장 컸고, 측절치, 중절치 순으로 감소하였다. 4. 47명의 피험자 중 5명이 경도의 과민증을 경험하였으나 곧 완화되었다, 치은염증지수와 전기치수검사 결과 시험 전후에 차이가 없어 안전성을 확인하였다. This study evaluated the effectiveness and safety of an experimental bleaching strip (Medison dental whitening strip, Samsung medical Co., Anyang, Korea) containing 2.9% hydrogen peroxide. Twenty-three volunteers used the bleaching strips for one and a half hour daily for 2 weeks. As control group, the same strips in which hydrogen peroxide was not included were used by 24 volunteers with the same protocol. The shade chang (ΔE^(*), color differnce) of twelve anterior teeth was measured using Shade Vision (X-Rite Inc., S. W. Grandville, MI, USA), Chroma Meter (Minota Co., Ltd. Osaka, Japan) and Vitapan classical shade guide (Vita Zahnfabrik, Germany). The shade change of overall teeth in the experimental group was significantly greater than that in the control group (p < 0.05) and was easily perceivable. The change resulted from the increase of lightness (CIE L^(*) value) and the decrease of redness (CIE a^(*) value) and yellowness (CIE b^(*) value). The shade change of individual tooth was greatest in canine, can smallest in central incisor. The safety of the bleaching strip was also confirmed. 〔J Kor Acad Cons Dent 31(4):269-281, 2006〕

      • KCI등재후보

        다양한 파장폭의 가시광선에 의해 중합된 복합레진의 미세경도와 변연누출도

        박수만,이재용,한승렬,하상윤,신동훈 大韓齒科保存學會 2002 Restorative Dentistry & Endodontics Vol.27 No.4

        Several ways of curing are being tried to improve material's properties and reduce marginal gap. However, all are considering about the pattern of light intensity. It was noted from the preliminary study the change of light wavelength from filter chaning may give an impact on material's property and microleakage. The object of this study was to verify the effect of filters with various wavelength width on the microhardness and microleakage of composite resin; hybrid type of DenFil and submicron hybrid type of Esthet X. Composite resins were cured using 3 kinds of filter; narrow-banded(465-475 nm), mid-banded(430-470 nm), wide-banded(400-500 nm). After the estimation of microhardness, degree of dye penetration and the maximum gap from SEM evaluation were done between 4 groups that showed no difference in microhardness value of the lower surface. The results were as follows: 1. Adequate microhardness could not be gained with a narrow-banded filter irrespective of curing time. At the upper surface. DenFil should be polymerized with middle or wide-banded filter for 20 seconds at least, while Esthet X be cured with middle or wide-banded filter for 30 seconds at least to get similar hardness value to control group. 2. There was little dye penetration in enamel margin, but all dentin margins showed much more dye penetration irrespective of curing conditions. Although there was not statistical difference, groups cured with mid-banded filter for 40 seconds and with wide-width filter for 20 seconds showed relatively less dye penetration. 3. It was revealed from the SEM examination that group cured with wide-banded filter had the smallest gap without statistical significance. Spearman's rho test showed that the correlation between the results of dye penetration and SEM examination was very low. From these results, it could be concluded that curing with wide-width filter would be better than the other techniques. even though the curing technique using mid-width filter seems to have its own unique advantage.

      • KCI등재

        체험 요소(4Es)가 체험즐거움, 만족도, 재방문에 미치는 영향: Pine과 Gilmore의 체험경제이론(Experience Economy)을 중심으로

        박수경,박지혜,차태훈 한국방송광고공사 2007 광고연구 Vol.0 No.76

        본 연구에서는 Pine과 Gilmore(1998)의 체험경제이론에 근거하여, 매장 내 체험을 4가지 측면으로 분류하고, 각각 의 체험이 소비자에게 즐거움을 주는지 확인해보고, 더 나아가 체험의 즐거움이 구매만족과 재구매의도 및 추천의 도에까지 영향을 미치는지 살펴보고자 하였다. Build a Bear Workshop 앞에서 판단표본추출법(purposive sampling)을 통하여 인형을 직접 제작하거나 액세서리를 구매한 고객만을 대상으로 하여, 130개의 질문지가 수집되었다. 경로분석 결과 엔터테인먼트와 현실도피적 체험 요소는 즐거움에 영향을 미치지 않았으나, 교육적 체험 요소와 미적 체험 요소는 즐거움에 긍정적 영향을 주었으며, 체험의 즐거움은 체험만족도, 재방문/구매의도, 추천의도에 영향을 주는 것으로 나타났다. The purpose of this study is to examine the effects of 4Es on experience enjoyment, satisfaction, and revisit intention, following Pine & Gilmore(1998). 130 questionnaires were collected in front of‘ Build a Bear Workshop’where the subjects participated in the teddy bear making process. The results of path analysis show that educational and aesthetic experience has a positive influence on the enjoyment. The expereicne enjoyment has an effect on the satisfaction and revisit intention. The theoretical and practical implications are provided.

      • 고집적 Bipolar-CMOS-DMOS 트렌지스터의 전기적 특성 분석

        박훈수 위덕대학교 산업기술연구소 2003 산업기술연구소 논문집 Vol.7 No.1

        본 연구는 기존 0.8㎛ CMOS 기술을 기반으로 제작한 CMOS 호환 구조의 BCD(bipolar-CMOS-DMOS) 소자의 제작기술과 전기적 특성에 대한 연구이다. 집적도를 향상시키기 위하여 최초로 트랜치 격리(trench isolation) 기술을 적용하였다. 또한, 공정 단계를 줄이기 위하여 고전압 LDMOS 및 바이폴라 트랜지스터의 표동 영역과 베이스 영역을 동시에 구현하였다 동일 칩상에서 구현한 고전압 LDMOS 소자, 수직형 npn, pnp 바이폴라 트랜지스터 및 CMOS 소자의 전기적 특성 변화를 소자 설계 및 공정 조건에 따라 분석하였다. This paper describes the fabrication technology and the electrical characteristics of on-chip CMOS compatible BCD (bipolar-CMOS-DMOS) devices, which are fabricated with the conventional 0.8㎛ CMOS technology. To increase the packing density, trench isolation process was adopted for the first time. In addition, the drift and base diffusions of high-voltage LDMOS and bipolar devices were simultaneously performed to minimize the process steps. Depending on the device design and process condition, the electrical characteristics of the high-voltage LDMOS, vertical npn, pnp bipolar transistors, and CMOS devices were investigated.

      • KCI등재후보
      • 스마트전력 IC응용을 위한 고집적도 BCD(Bipolar-CMOS-DMOS) 기술에 관한 연구

        박훈수 위덕대학교 산업기술연구소 2000 산업기술연구소 논문집 Vol.4 No.1

        0.8㎛ CMOS 기술을 이용하여 바이폴라 트랜지스터, CMOSFET 및 고전압 DMOS 트랜지스터를 동일 칩상네 집적할 수 있는 BCD (Bipolar-CMOS-DMOS) 기술을 제안하였다. 집적도를 향상시키기 위하여 최초로 트랜치 격리 공정을 적용하였고, 공정단계를 단순화하기 위하여 고 전압소자의 표동영역 및 바이폴라 트랜지스터의 베이스 확산 영역을 동시에 형성하였다. 본 연구의 BCD 기술은 소자구조 및 공정조건이 소자의 특성에 매우 민감하므로 소자구조 및 공정조건에 따른 고전압 LDMOS, 중전압 ED-MOS, 수직형 npn/pnp 바이폴라 소자 및 CMOS 트랜지스터의 특성을 분석하여 최적공정 조건을 제시하였다. A 0.8 ㎛ CMOS compatible BCD technology that combines versatile bipolar-CMOS-DMOS transistors on the same chip is proposed. To increase packing density, trench isolation process was adopted for the first time. In addition, the drift and base diffusions of high-voltage and bipolar devices were simultaneously performed to simplify the process steps. Depending on the device structure and process conditions, the electrical characteristics of on-chip compatible high-voltage LDMOS, medium voltage ED-MOSFET, vertical npn/pnp bipolar, and CMOS devices were investigated.

      • 마이크로 공장을 위한 디지털 생산 시뮬레이션

        박상호,정영상,송준엽,이승우,김동훈,이수훈,박종권 한국공작기계학회 2005 한국공작기계학회 춘계학술대회논문집 Vol.2005 No.-

        Existing manufacturing system has consumed too much energy, space and resource in micro parts manufacturing. To improve this, micro factory system is suggested. But it is difficult to get the high reliability in the assembly, production and inspection of the minute parts because the construction of the micro factory has been started just before. In this study, we will build the digital manufacturing simulation on the micro factory's process and verify the production and assembly process using this simulation.

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