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치수 치근단 병소의 전구 위험요인으로서의 제 2 형 당뇨의 역할에 관한 소고
김진희,배광식,서덕규,홍성태,이윤,홍삼표,금기연 大韓齒科保存學會 2009 Restorative Dentistry & Endodontics Vol.34 No.3
Diabetes Mellitus (DM) is a syndrome accompanied with the abnormal secretion or function of insulin, a hormone that plays a vital role in controlling the blood glucose level (BGL). Type 1 and 2 DM are most common form and the prevalence of the latter is recently increasing. The aim of this article was to assess whet her Type 2 DM could act as a predisposing risk factor on the pulpo-periapical pathogenesis. Previous literature on the pathologic changes of blood vessels in DM was thoroughly reviewed. Furthermore, a histopathologic analysis of artificially-induced periapical specimens obtained from Type 2 diabetic and DM-resistant rats was compared. Histopathologic results demonstrate that the size of periapical bone destruction was larger and the degree of pulpal inflammation was more severe in diabetic rats, indicating that Type 2 DM itself can be a predisposing risk factor that makes the host more susceptible to pulpal infection. The possible reasons may be that in diabetic state the lumen of pulpal blood vessels are thickened by atheromatous deposits, and microcirculation is hindered. The function of polymorphonuclear leukocyte is also impaired and the migration of immune cells is blocked. leading to increased chance of pulpal infection. Also, lack of collateral circulation of pulpal blood vessels makes the pulp more susceptible to infection. These decrease the regeneration capacity of pulpal cells or tissues, delaying the healing process. Therefore, when restorative treatment is needed in Type 2 DM patients, dentists should minimize irritation to the pulpal tissue under control of BGL. 당뇨(Diabetes Mellitus)란 혈당을 조절하는 인슐린의 분비나 기능에 장애를 야기하는 질환으로 인슐린 의존성 여부에 따라 제 1 형과 제 2 형으로 분류된다. 본 종설은 최근 증가 추세에 있는 제 2 형 당뇨가 치수 치근단 병소의 병인 과정에 전구 위험 요인으로 작용할 수 있는지를 평가 하고자 문헌고찰을 통해 당뇨의 병인 과정에서 특징적으로 나타나는 혈관 합병증에 관해 알아보고, 부가적으로 제 2 형 당뇨 쥐 모델에서 인위적인 치수감염 후 얻은 치근단 조직의 조직병리학적 분석을 시행하였다. 조직학적 관찰 결과 제 2 형 당뇨 쥐에서 대조군에 비해 치수 치근단 병소의 크기가 증가하였고, 치수 염증 반응도 심하게 나타난 것으로 보아 당뇨 자체가 숙주를 감염에 취약한 상태로 만드는 전구 위험요소로 작용하였음을 알 수 있었다. 이러한 이유로는 첫째, 당뇨 시 전반적으로 나타나는 혈관 내 죽상 침착(atheromatous deposits)에 의해 혈관 내벽의 두께가 두꺼워져 미세 순환의 장애는 물론 탐식 세포의 기능 저하, 면역 세포의 혈류 이동이 차단되어 치수 감염 시 쉽게 치근단 병소로 이환될 가능성이 높고, 둘째 치수 혈관에서 특징인 측부 순환(collateral circulation)의 부재에 따른 살균성 다형핵 백혈구의 활동 억제를 포함한 미세 혈관계의 취약성으로 인해 치수 조직의 재생능이 저하되어 추가적인 감염원의 공격에 대한 방어 및 치유 저하를 더욱 심화시키기 때문인 것으로 사료된다. 따라서 제 2 형 당뇨 환자의 수복치료 시 치과의사는 당뇨 조절 하에서 치수 조직의 자극을 최소화하기 위한 세심한 처치가 필요하다.
( Sung Gyu Pyo ) 대한금속재료학회 ( 구 대한금속학회 ) 2008 METALS AND MATERIALS International Vol.14 No.6
This study is concerned with the effect of CH2I2 iodine catalysis on the film structure and superfilling properties of Chemically Enhanced Chemical Vapor Deposition (CECVD) Cu process. It was found that, under optimal conditions, treatment of MOCVD Cu deposition with a chemical enhancer increases deposition rate and intensity and decreases the incubation time and surface roughness. These results imply that the chemical enhancer has a surfactant effect that promotes two-dimensional layer-by-layer growth. The deposition of CECVD Cu film in the low temperature region (<150℃) shows superfilling behavior and void-free filling, but shows conformal step coverage in the intermediate temperature range. The growth of CECVD Cu film does not proceed in a layer-by-layer manner, and becomes agglomerate in the high temperature region (190℃). Super-conformal coverage and the best superfilling performance of CEMOCVD Cu film is demonstrated with a (hfac)Cu(DMB) precursor of 0.10 um feature size and 17500A height [AR = 17.5:1].
Plasma Damage Mechanism of Electron Beam Curing Process for Spin on Dielectrics
Sung Gyu Pyo,Sibum Kim IEEE 2013 IEEE electron device letters Vol.34 No.5
<P>This letter presents the plasma damage mechanism of electron beam curing process for spin on dielectrics. Device damage is studied using the antenna gate metal-oxide-semiconductor field-effect transistor (MOSFET) in terms of the threshold voltage variation as a function of electron beam conditions such as ambient and cathode voltage. Threshold voltages of nMOSFET are decreased by an electron beam curing process without antenna ratio dependency. The electron energy and interlayer dielectric thickness between active devices and metal layers largely affect the variation of threshold voltage. From the experimental results, it is concluded that device damage induced by an electron beam curing process is characterized as radiation damage rather than electron charging damage. For the damage free electron beam curing process, it is essential to control the penetration depth of high-energy electrons by adjusting the cathode voltage while considering the dielectric thickness over active devices.</P>
( Sung Gyu Pyo ),( D. W. Lee ),( Si Bum Kim ) 대한금속재료학회 ( 구 대한금속학회 ) 2008 METALS AND MATERIALS International Vol.14 No.6
We propose a simple model to describe the electroplated topography over trench patterns of line widths and spacing ranging up to 30 ㎛. Excellent agreement between model predictions and measured protrusion heights was observed. This was especially true for the cases of narrow line widths and spacing below 4 ㎛. The model suggests the existence of a critical spacing for each line width above which the protrusion height becomes positive. It also shows that an increasing film thickness on electroplated copper leads to a decrease in critical spacing.
Effect of particle size of PtRu nanoparticles embedded in WO3 on electrocatalysis.
Yoo, Sung Jong,Park, Hee Young,Hwang, Seung Jun,Pyo, Sung Gyu,Kim, Soo-Kil,Sung, Yung-Eun,Lim, Tae-Hoon American Scientific Publishers 2013 Journal of Nanoscience and Nanotechnology Vol.13 No.5
<P>Size-controlled PtRu nanoparticles embedded in WO3 were prepared by simultaneous multigun sputtering on pure targets of Pt, Ru, and WO3. The mean diameter of the PtRu nanoparticles, as confirmed by high-resolution transmission electron microscopy, can be varied from -2.3 to -3.6 nm by varying the RF power ratio of PtRu and WO3. On the basis of transmission electron diffraction results for the PtRu nanoparticles embedded in WO3, it was confirmed that PtRu exists as an alloy metal phase, whereas the WO3 matrix is present as an amorphous phase. Size-controlled PtRu/WO3 electrodes were found to exhibit unique electronic properties depending on their size, which affected the potential of zero total charge and the methanol oxidation reaction. The mass activity of PtRu/WO3 for methanol oxidation was determined by the interplay of the surface electronic factors at the metal-solution interface; the oxophilicity of the nanoparticles increased with decreasing particle size.</P>
Seo, Sang-Gyu,Kim, Ji-Seong,Jeon, Seo-Bum,Shin, Mi-Rae,Kang, Seung-Won,Lee, Gung-Pyo,Hong, Jin-Sung,Harn, Chee-Hark,Ryu, Ki-Hyun,Park, Tae-Sung,Kim, Sun-Hyung The Korean Society of Plant Biotechnology 2009 식물생명공학회지 Vol.36 No.4
Previously, two events (H15 and B20) of transgenic pepper (Capsicum annuum L.) that enhanced resistance to Cucumber mosaic virus (CMV) by the introduction of CMV coat protein (CP) gene were constructed. Presently, a single copy number of the CP gene was revealed in H15 and B20 by Southern blot. To predict possible unintended effects due to transgene insertion in an endogenous gene, we carried out sequencing of the 5'-flanking region of the CP gene and a Blastbased search. The results revealed that insertion of the transgene into genes encoding putative proteins may occur in the H15 and B20 transgenic event. Mutiplex polymerase chain reaction (PCR) for simultaneous detection and identification of transgenic pepper was conducted with a set of nine primers. Both transgenic event were differentiated from non-transgenic event by the presence of 267 bp and 430 bp PCR products indicative of CP gene specific primer pairs and primer pairs targeting the CP gene and 35S promoter. H15 and B20 uniquely possessed a 390 bp and 596 bp PCR product, respectively. The presence of a 1115 bp product corresponding to intrinsic pepper actin gene confirmed the use of pepper DNA as the PCR template. The primer set and PCR conditions used presently may allow the accurate and simple identification of CMV resistant transgenic pepper.
원위부 대장 선종의 특성에 따른 근위부 대장 선종 빈도에 대한 연구
이준성,황성규,홍성표,박필원,홍창권,권창일,김경철,임규성 대한소화기내시경학회 2000 Clinical Endoscopy Vol.21 No.3
Background/Aims: The aim of this study was to examine the incidence of proximal colon adenoma according to characteristics of distal colon adenoma. Methods: Ninety-two colon adenoma patients who underwent total colonoscopy and endoscopic polypectomy were analyzed retrospectively. Adenoma was classified as proximal when located in proximal to splenic flexure. The advanced adenoma was defined as an adenoma larger than 10 mm or any size with a villous component or severe dysplasia. Results: The incidence of proximal adenoma was increased significantly in those with old age (odds ratio (OR)=3.3), villous (OR=5.3) or dysplastic histology (OR=8.1) or the presence of advanced distal adenoma (OR=3.4). However, the incidence of advanced proximal adenoma was increased only in those with old age (OR=11.2). Nineteen in thirty-nine (48.7%) patients with proximal colon adenoma did not have distal colon adenoma, Conclusions: Various characteristics of distal colon adenoma couldn't exactly predict the presence of synchronous proximal adenoma and a greater percentage of subjects with proximal adenoma didn't have distal adenoma. So, colonoscopy could be a standard method for colon cancer screening in Korea.