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Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O2-PECVD
Rangaswamy Navamathavan,Chi Kyu Choi,Kwang Man Lee 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.48 No.6
Low-dielectric-constant SiOC(-H) films were deposited on p-type Si (100) substrates by using plasma-enhanced chemical- vapor deposition with methyltriethoxysilane and oxygen gas as precursors. SiOC(-H) films are prepared with different radio frequency (rf) powers and annealed at different temperatures in an Ar ambient for 30 min. The film thickness and the refractive index were measured by using field emission scanning electron microscopy and ellipsometry, respectively. The bonding characteristics and the relative concentrations of the bonds in the films were investigated by using Fourier transform infrared spectroscopy in the absorbance mode. The dielectric constant of the SiOC(-H) film was evaluated by using C-V measurements on the metal-insulator-semiconductor, Al/SiOC(-H)/p-Si structure, and the experimental lowest dielectric constant of the SiOC(-H) film was found to be 2.28 at an annealing temperature 500 C. These results reveal the promising characteristics of SiOC(-H) films deposited by using methyltriethoxysilane and oxygen gases.
Rangaswamy Navamathavan,Chi Kyu Choi,An Soo Jung,Hyun Seung Kim,Kwang-Man Lee,Yong Jun Jong 한국물리학회 2007 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.50 No.6
The SiOC(-H) films were deposited on \emph{p}-type Si(100) substrates by using UV-source-assisted plasma-enhanced chemical-vapor deposition from methyltrimethoxysilane (MTMS) and oxygen precursors. The bonding configuration and the chemical structures of the SiOC(-H) films were investigated by using Fourier- transform infrared spectroscopy in the absorbance mode. UV irradiation of the MTMS+Ar+O$_{2}$ bulk plasma enhanced the selective dissociation of precursor molecules, leading to good film formation. At the same time, the carbon content increased about 2 \% for the film deposited with UV irradiation compared to the film deposited without UV irradiation. The dielectric constant of the SiOC(-H) film deposited with UV irradiation decreased compared to that of the film deposited without UV. The lowest dielectric constant, about 2.13, was obtained for the SiOC(-H) film deposited with UV irradiation and annealed at 400 $^\circ$C with a MTMS/O$_{2}$ flow rate ratio of 80 \% at an rf power of 500 W.
Rangaswamy Navamathavan,Chang Young Kim,An Soo Jung,Chi Kyu Choi,이헌주 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.53 No.1
Low-dielectric-constant SiOC(-H) thin films were deposited on p-type Si(100) substrates by using plasma enhanced chemical vapor deposition (PECVD) from triethoxysilane (TES; C6H16O3Si) and oxygen gas as precursors. A detailed characterization, such as the chemical structure, bonding configurations and dielectric constant (k), of the SiOC(-H) films was performed. A possible mech- anism responsible for the reduction in the dielectric constant of the SiOC(-H) is described. In the SiOC(-H) film, the CH₃ group as an end group is introduced into the -O-Si-O- network, thereby reducing the density to decrease the dielectric constant. X-ray photoelectron spectroscopic (XPS) studies were carried out to study the binding energies of Si-C, O-Si-O, C-C(H), C=C, C-O and C=O bonds in the SiOC(-H) films as functions of the ow rate ratio. The dielectric constant of the SiOC(-H) film was evaluated by using the C-V measurements for a metal-insulator-semiconductor (MIS), Al/SiOC(-H)/p-Si(100), structure.
Thin-Film Transistors Based on ZnO Fabricated by Using Radio-Frequency Magnetron Sputtering
Rangaswamy Navamathavan,Seong-Ju Park,김백현,황대규,Hyun-Sik Kim,Jae-Hong Lim,장재형,Jin-Ho Yang,Jin-Yong Oh 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.48 No.II
We report on enhancement-mode thin-film transistors (TFTs) using ZnO as an active channel layer deposited by radio-frequency (rf) magnetron sputtering at 350 C. The TFT structure consisted of ZnO as a channel, SiNx as a gate insulator, and indium tin oxide (ITO) as a gate, which were deposited onto a Corning glass substrate. Atomic force microscopic images showed an atomically flat morphology of ZnO channel layer with a root-mean-square roughness of 0.7 nm. The X-ray diffraction pattern revealed a dense columnar structure of closely packed ZnO nano grains along the c-axis. The transfer characteristics of a typical ZnO TFT exhibited a field effect mobility of 1.698 cm2/V·s, a drain current on/off ratio of 105, a low off-current value on the order of 10.10 A, and a threshold voltage of 2.5 V.
김창영,이형석,우종관,Rangaswamy Navamathavan,이광만,현명택,최치규 한국물리학회 2010 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.57 No.61
We report on the electrical characteristics of the metal-insulator-semiconductor (MIS) structure of low-dielectric-constant SiOC(-H) films. SiOC(-H) thin films were deposited on p-Si(100) substrates by using a plasma-enhanced chemical vapor deposition (PECVD) system. The frequency dependence of the capacitance-voltage (C-V) and the conductance-voltage (G/w-V) characteristics of the A1/SiOC(-H)/p-Si(100)/Al MIS structures was analyzed. C-V and G/w-V measurements were carried out over a frequency range of 1 kHz to 5 MHz. Based on our analysis, the C-V and the G/w-V characteristics confirmed that the surface states and the series resistance were important parameters that strongly influenced the electrical properties of the A1/SiOC(-H)/p-Si(100)/Al MIS structures.
Bactericidal Efficacy of Electrospun Rosin/Poly(ε-caprolactone) Nanofibers
Rajkumar Nirmala,김학용,백우일,Rangaswamy Navamathavan,김태우,Duraisamy Kalpana,박미라,박수진 한국고분자학회 2014 Macromolecular Research Vol.22 No.2
Poly(ε-caprolactone) (PCL)-containing rosin nanofibers were prepared via electrospinning technique forbiomedical applications. To improve the biocompatibility properties, rosin was blended into PCL to prepare nanofibers. Nanofibers mats were prepared with different concentrations of rosin. The morphology, structure, and thermalproperties of the resultant PCL/rosin nanofibers were analyzed using scanning electron microscopy (SEM), X-raydiffraction (XRD), Fourier transform infrared (FTIR) spectroscopy, differential scanning calorimetry (DSC), andthermogravimetry (TGA) analysis. SEM images revealed that the nanofibers were well-oriented and had good incorporationof rosin. FTIR results indicated the various bonding groups of PCL/rosin nanofibers with stable structure. TGA analysis revealed that the onset degradation temperature was decreased with increasing rosin content in thenanofibers. The bactericidal activity of PCL/rosin nanofibers was also investigated. These results indicate that thePCL blended with rosin nanofibers can be utilized as a promising candidate material for many biomedical applications.
Narayanasamy Tamil Selvi,Rangaswamy Navamathavan,김학용,Rajkumar Nirmala 한국고분자학회 2019 Macromolecular Research Vol.27 No.11
Current trends will affirm that the use of nanotechnology principles has become an important area of research today, due to the wide range of applications of these technologies in various fields and industries. By the same token, silver nanoparticles have been gaining more importance due to their optical, electrical, thermal and biological properties, when comparing these qualities to other metal nanoparticles. The use of plants for silver nanoparticle synthesis has also drawn attention from the scientific research community, because of its rapid, eco-friendly, non-pathogenic and economical protocols. Thus, in the present study, we report on the synthesis process of silver nanoparticles, by using aqueous rhizome extract of Canna indica Linn. In this case, the silver nanoparticle synthesis was performed by using a simple autoclave method. The utilization of a fixed ratio of plant extract to metal salt was prepared, and the mixture was allowed to autoclave for 15 minutes. The colour change was observed as resembling the hue of red wine, which was evidenced in the noted formation of silver nanoparticles. The synthesized silver nanoparticles were characterized by using UV-Vis spectrophotometer, Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), X-ray diffraction (XRD), and high resolution transmission electron microscopy (HR-TEM) analyses. The silver nanoparticles were witnessed for any noted antimicrobial activity against the identified and selected bacterial strains.