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적응형 보쉬공정(Adaptive Bosch Process)을 이용한 식각된 바닥면 연구
이승용(Seung-Yong Lee),양승국(Seung-Kook Yang),김한형(Han-Hyoung Kim),유한석(Han-Suk Yoo),신상현(Sang-Hyun Sin),장동훈(Dong-Hoon Chang),이일항(El-Hang Lee),오범환(Beam-Hoan O),이승걸(Seung-Gol Lee),박세근(Se-Geun Park) 대한전자공학회 2007 대한전자공학회 학술대회 Vol.2007 No.7
We do not use dedicated Bosch process equipment of high cost, it is uses Bosch process that fit existent ICP(Inductively Coupled Plasma) equipment. Bosch process which is method of deep silicon etching is connected repeatedly in using SF? Plasma for etching process and using C₄F? Plasma the deposition process. However, between etching bottom layer and side wall not verticality and curved layer is formed. It is used about this curved layer phenomenon. because of considering gas fraction, temperature, substrate voltage, process time etc. It is used about this curved layer phenomenon and suggested optimum process condition. Standard process for study of process gas used SF? and Ar, and source power 600W, substrate voltage used -200V. Deposition process used C₄F? gas, and source power 600W, substrate voltage did not used. Process substrate temperature makes via 0℃ and progressed study. Through these processing condition, we manufactured mold for NIL(Nano Imprint Lithography) process.
생산제조과정의 자동광검사를 위한 조명장치의 특성과 검사 성능 분석
이승걸(Seung Gol Lee),김승용(Seung-Yong Kim),이윤석(Yoon-Suk Lee),김대찬(Dae-Chan Kim) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
In order to find the optimal condition of automated optical inspection used for inspecting mass-produced goods, a ray tracing-based simulator was developed. By using the simulator, the illuminating characteristics of an illuminator specially designed for an automated optical inspection equipment could be analyzed, and also the inspection performance could be evaluated with the simulated images.
Lee, Dong-Jin,Yim, Hae-Dong,Lee, Seung-Gol,O, Beom-Hoan Optical Society of America 2011 Optics express Vol.19 No.21
<P>We propose a tiny surface plasmon resonance (SPR) sensor integrated on a silicon waveguide based on vertical coupling into a finite thickness metal-insulator-metal (f-MIM) plasmonic waveguide structure acting as a Fabry-Perot resonator. The resonant characteristics of vertically coupled f-MIM plasmonic waveguides are theoretically investigated and optimized. Numerical results show that the SPR sensor with a footprint of ~0.0375 μm2 and a sensitivity of ~635 nm/RIU can be designed at a 1.55 μm transmission wavelength.</P>
Nanofocusing of light using three-dimensional plasmonic mode conversion.
An, Shinmo,Lee, Hyun-Shik,Jeong, Yong-Beom,Jun, Young Chul,Lee, Seung Gol,Park, Se-Guen,Lee, El-Hang,Beom-Hoan, O Optical Society of America 2013 Optics express Vol.21 No.23
<P>Efficient nanofocusing of light into a gap plasmon waveguide using three-dimensional mode conversion in a strip plasmonic directional coupler is proposed. Unlike conventional nanofocusing using tapering structures, a plasmonic directional coupler converts E(z)-type odd mode energy into E(y)-type gap plasmon mode by controlling phase mismatch and gap spacing. The simulation result shows the maximum electric field intensity increases up to 58.1 times the input intensity, and 17.3% of the light is focused on the nano gap region.</P>
Wonsoo Ji,Seung Gol Lee,Beom-hoan O,El-Hang Lee,Se-Geun Park,Seoung Jun Jang 한국물리학회 2005 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.47 No.1
Although both the topological information and the propagating characteristics of an optical waveguide device can simultaneously be measured with a Near-field Scanning Optical Microscope (NSOM), the structural distinctiveness of the device makes the height control of NSOM difficult. In order to resolve this difficulty, the hybrid method of controlling the gap between the NSOM probe and the device surface is newly proposed, this being based on the combination of a digital and an analog control method. It is shown that the proposed method is very efficient and stable in measuring a waveguide device with abrupt step coverage.