마스크 선택기준이 브랜드 인지와 패션 마스크 구매의도에 미치는 영향

김민수,이하경,김한나 한국의류학회 2022 한국의류학회지 Vol.46 No.1

This study used text mining to analyze big data to understand consumers' demand for and perceptions of fashion masks. Based on the text-mining analysis results, a survey was conducted with those living in Korea to investigate the influence of consumers' mask selection criteria on mask brand awareness and purchase intention for fashion masks. “Fashion mask” and “functional mask” were used as the keywords in a text-mining analysis, and an online survey of 242 respondents was conducted. The analysis results were as follows: First, the text-mining analysis extracted commonly appearing words that had a high frequency and TF-IDF, such as “COVID-19,” “fashion,” “celebrity,” “antibacterial,” and “filter.” This confirmed that during the COVID-19 pandemic, consumers have demanded masks that are both functional and fashionable. Second, among consumers' mask selection criteria, trend and design had positive effects on face-mask brand awareness. Third, face-mask brand awareness had a positive effect on the purchase intention for both brand and fashion masks, and the purchase intention for brand masks had a positive effect on the purchase intention for fashion masks.

Selective Electrochemical Etching of Stainless Steel Using Laser-Patterned Copper Layer

Hong-Shik Shin 한국정밀공학회 2019 International Journal of Precision Engineering and Vol.20 No.5

This paper proposes a novel electrochemical etching process without the need for a metal mask or photo-resist mask. The selective electrochemical etching using laser-patterned (SEEL) copper layer process consists of three steps: electrodeposition, laser patterning, and electrochemical etching. In the SEEL copper layer process, a deposited copper layer was formed on stainless steel by an electrodeposition process. A patterned copper layer on stainless steel was formed by laser beam irradiation. A patterned copper layer serves as both a sacrificial layer and a protective mask during the electrochemical etching process. The results were observed via scanning electron microscopy and surface profiler measurement. The appropriate conditions for stable SEEL copper layer process were determined. Finally, selective electrochemical etching with various micro patterns on stainless steel was been successfully performed.

선택적 에미터 결정질 실리콘 태양전지 제작을 위한 할로겐 램프 장치 개발

한규민,최성진,이희덕,송희은 한국태양에너지학회 2012 한국태양에너지학회 논문집 Vol.32 No.5

Halogen lamp was applied to fabricate the selective emitter crystalline silicon solar cell. In selective emitter structure, the recombination of minority carriers is reduced with heavily doped emitter under metal grid, consequently improving the conversion efficiency. Laser selective emitter process which is recently used the most generally induces the damage on the silicon surface. However the lamp has enough heat to form heavily doped emitter layer by diffusing phosphorus from PSG without surface damage. In this work, we have studied to find the design and the suitable condition for halogen lamp such as power, time, temperature and figured out the possibility to fabricate the selective emitter silicon solar cell by lamp heating. The sheet resistance with 100Ω/□ was lower to 50Ω/□ after halogen lamp treatment. Heat transfer to lightly doped emitter region was blocked by using the shadow mask.

분류 정확도 향상을 위한 선택적 마스킹 기반 추가 사전 학습 기법

서수민(Sumin Seo),김남규(Namgyu Kim) 한국정보과학회 2021 정보과학회 컴퓨팅의 실제 논문지 Vol.27 No.9

최근 여러 자연어 처리 분야에서 사전 학습 언어 모델인 BERT를 활용하여 분석 과제에 최적화된 텍스트 표현을 추출하려는 연구가 활발하게 이루어지고 있다. 특히 BERT의 학습 방식 중 하나인 MLM(Masked Language Model)을 활용하여 도메인 정보 또는 분석 과제 데이터를 추가 사전 학습(Further Pre-training)하는 시도가 이어지고 있다. 하지만 기존의 MLM 기법이 채택한 무작위 마스킹을 사용하여 감성 분류 과제에서 추가 사전 학습을 수행하는 경우, 분류 학습에 중요한 단서가 되는 단어가 마스킹될 수 있다는 가능성으로 인해 문장 전체에 대한 감성 정보 학습이 충분히 이루어지지 않는다는 한계가 있다. 이에 본 연구에서는 무작위 마스킹이 아닌 단서 단어를 제외하고 마스킹하는 선택적 마스킹을 통해 감성 분류 과제에 특화된 추가 사전 학습을 수행할 수 있는 방법을 제안한다. 더불어 주변 단어를 선택하기 위해 어텐션 메커니즘(Attention Mechanism)을 활용하여 단어의 감성 기여도를 측정하는 방안도 함께 제안한다. 제안 방법론을 실제 감성 댓글에 적용하여 문장 벡터를 추론하고 감성 분류 실험을 수행한 결과, 제안 방법론이 기존의 여러 비교 모델에 비해 분류 정확도 측면에서 우수한 성능을 나타냄을 확인하였다. Recently, studies to extract text expressions optimized for analysis tasks by utilizing bidirectional encoder representations from transformers (BERT), which is a pre-training language model, are being actively conducted in various natural language processing fields. In particular, attempts are being made to further pre-train domain information or target data using masked language model (MLM), which is one of the BERT training methods. However, if further pre-training is performed with the existing random masking when performing sentiment classification, there is a limitation that sentimental nuance for the entire sentence may not be sufficiently learned if the words that are important clues to the sentiment classification are masked. Therefore, in this study, we propose an further pre-training method specialized for sentiment classification tasks which sufficiently reflect sentiment information in sentences by selective masking that excludes clue words from masking candidates. In addition, this study proposes a method to distinguish between clue words and surrounding words as the role of words by utilizing the attention mechanism. On inferring sentence vectors by applying the proposed methodology to actual sentiment comments and performing sentiment classification experiments, it was confirmed that the proposed methodology showed superior performance in terms of classification accuracy compared to several existing comparison models.

미세입자 분사가공에서 SU-8 마스크의 특성

고태조(Tae Jo Ko),박동진(Dong Jin Park),김희술(Hee Sool Kim) Korean Society for Precision Engineering 2007 한국정밀공학회지 Vol.24 No.1

Abrasive jet machining (AJM) has been traditionally used for removing rusts or paints. Nowadays, this is promising technology for micro bulk machining where brittle substrate materials are used. In order to get accurate details, masks such as metal, polymer or elastomer is inevitable. Among them, photo polymer which is sensitive to the light has been attractive for it's high accuracy using photolithography. In this research, SU-8 as a photo polymer is used since it is adequate for making thick mask. So, this paper describes how to make AJM masks using SU-8 with a photolithography process, and investigates the characteristics of SU-8 masks during AJM process. Also, an example of fabrication using AJM was shown.

Selective area epitaxy of complex oxide heterostructures on Si by oxide hard mask lift-off

Ruiguang Ning,Soo Young Jung,Haneul Choi,Byeong-hyeon Lee,Min-Seok Kim,Hyung-Jin Choi,Jun Young Lee,Jin Soo Park,Sung-Jin Jung,Ho Won Jang,Sung Ok Won,Hye Jung Chang,Ji-Soo Jang,Kyu Hyoung Lee,Byung C 대한금속·재료학회 2023 ELECTRONIC MATERIALS LETTERS Vol.19 No.2

Epitaxial complex oxide heterostructures on Si are an excellent platform for the realization of multifunctional electronicdevices to exploit the unique functionalities of the oxides that Si does not possess. It is often necessary to make patternsof epitaxial films on selected areas of Si. Here, a path towards the selective area epitaxial growth of complex oxide heterostructureson Si using a hard mask lift-off technique is reported. A water-soluble oxide (Sr3Al2O6) is used as a lift-offhard mask that can survive the high temperature (~ 750 °C) and oxidizing environments for epitaxial oxide growth and beselectively etched away subsequently using deionized water. It is found that the epitaxial growth of yttria-stabilized zirconia(YSZ) buffer layers on Si is very sensitive to organic residues formed during photolithography. Island patterns of epitaxial(La, Sr)MnO3/CeO2/YSZ heterostructures are successfully fabricated on Si through the use of oxygen plasma treatment toremove residues. A simple and low-cost method to pattern complex oxide single crystals integrated on Si for the realizationof multifunctional oxide-integrated electronics is provided in this study.

유-무기 하이브리드 하드마스크 소재의 합성 및 식각 특성에 관한 연구

유제정(Yu, Je-Jeong),황석호(Hwang, Seok-Ho),김상범(Kim, Sang-Bum) 한국산학기술학회 2011 한국산학기술학회논문지 Vol.12 No.4

반도체 산업은 지속적으로 비약적인 발전을 이루어내면서 점점 고집적회로를 제작하기 위하여 패턴의 미세 화가 이루어지게 되었다. 현재 미세 나노패턴의 형성을 위하여 여러층의 하드마스크가 사용되고 있으며, 화학증기증 착(CVD)공정을 이용하여 형성한다. 이에 본 연구에서는 스핀공정(spin-on process)이 가능한 유-무기 하이브리드 중합 체를 이용한 단일층의 하드마스크를 제작하였는데, 하드마스크 내의 무기계 성분이 감광층 보다 쉽게 식각되는 반면 에 하드마스크의 유기계 성분으로 인해 substrate층 보다 덜 식각되었다. 유-무기 하이브리드 중합체를 이용한 하드마 스크막의 광학 및 표면 특성을 조사하였고, 감광층과 하드마스크막의 식각비를 비교하여 유-무기소재의 하이브리드 중합체에 대한 미세패턴을 형성시킬 수 있는 하드마스크막으로써의 유용성을 확인하였다. Semiconductor industry needs to have fine patterns in order to fabricate the high density integrated circuit. For nano-scale patterns, hard-mask is used to multi-layer structure which is formed by CVD (chemical vaporized deposition) process. In this work, we prepared single-layer hard-mask by using organic-inorganic hybrid polymer for spin-on process. The inorganic part of hard-mask was much easier etching than photo resist layer. Beside, the organic part of hard-mask was much harder etching than substrate layer. We characterized the optical and morphological properties to the hard mask films using organic-inorganic hybrid polymer, and then etch rate of photo resist layer and hard-mask film were compared. The hybrid polymer prepared from organic and inorganic materials was found to be useful hard-mask film to form the nano-patterns.

가스 센서용 ZnO, SnO₂ 박막의 이방성 식각을 위한 mask 재료의 식각 선택도 조사

박종천,조현,Park, Jong-Cheon,Cho, Hyun 한국결정성장학회 2011 韓國結晶成長學會誌 Vol.21 No.4

고이온밀도 플라즈마 식각에 의한 고종횡비, 고이방성을 갖는 ZnO, $SnO_2$ 나노 구조 가스 감응층 형성을 위하여 mask 재료들과의 식각 선택도를 조사하였다. $25BCl_3$/10Ar ICP 플라즈마에서는 ZnO와 Ni 간 5.1~6.1 범위의 식각 선택도가 확보된 반면에 Al의 경우 효율적인 식각 선택도를 확보할 수 없었다. $25CF_4$/10Ar ICP 플라즈마에서는 ZnO와 Ni 간에 7~17 범위의 높은 식각 선택도를 얻을 수 있었다. $SnO_2$는 $SnF_x$ 식각 생성물의 높은 휘발성에 기인하여 Ni에 비해 매우 높은 식각 속도를 나타내었고, 최고치 약 67의 매우 높은 식각 선택도를 확보하였다. Etch selectivities of mask materials to ZnO and $SnO_2$ films were studied in $BCl_3$/Ar and $CF_4$/Ar inductively coupled plasmas for fabrication of nanostructure-based gas sensing layer with high aspect ratios. In $25BCl_3$/10Ar ICP discharges, selectivities of 5.1~6.1 were obtained for ZnO over Ni while no practical selectivity was obtained for ZnO over Al. High selectivities of 7 ~ 17 for ZnO over Ni were produced in $25CF_4$/10Ar mixtures. $SnO_2$ showed much higher etch rates than Ni and a maximum selectivity of 67 was observed for $SnO_2$ over Ni.

Etch selectivities of mask materials for micromachining of ultrananocrystalline diamond film

최병수,박종천,황승구,김진곤,신성철,이인원,류정호,조현 한양대학교 세라믹연구소 2016 Journal of Ceramic Processing Research Vol.17 No.11

Ultra-nanocrystalline diamond (UNCD) is a very promising candidate for microelectromechanical system moving mechanicalassemblies (MEMS MMAs) due to its excellent mechanical and tribological properties. In order to fabricate UNCD-basedMEMS MMAs, it is important to find the mask material suitable for micromachining process. The etch characteristics ofUNCD and selected mask materials (Ni, Al and SiO2) were examined in O2/Ar, O2/CF4 and O2/SF6 inductively coupled plasmas,and the etch selectivities of the mask materials were compared. The Ni showed very high etch selectivities to UNCD (≥ 50 : 1)in all three oxygen-based ICP discharges and the maximum etch selectivity of ~140 : 1 for UNCD over Ni was obtained in10O2/5Ar ICP discharges. The Al and SiO2 mask layers presented relatively good etch selectivities in 10O2/5Ar ICP discharges,6.3-28.3 : 1 for UNCD over Al and 4-20 : 1 for UNCD over SiO2, respectively. Under most of the conditions examined in 10O2/5CF4 and 10O2/5SF6 discharges, the Al mask showed relatively low etch selectivities of ~ 5 : 1 while the SiO2 showed etchselectivities less than unity due to the extremely high volatility of SiFx etch products.

전자문서 무한 노출 방지를 위한 선택적 마스킹․해제 및 열람 이력 관리 모델

이부형(Boo-Hyung Lee) 한국정보기술학회 2010 한국정보기술학회논문지 Vol.8 No.9

This paper presents selective masking, unmasking, and open history management model for unlimited exposure protection of electronic documents. The proposed model is composed of a masked electronic paper production system, registration and history management system of masked electronics documents, unmasking and its notification system of masked documents, finally masked documents transmission system. The electronic paper can be masked partially or overall and such produced documents are distributed and traded online or offline. Masked documents can be opened and changed by certain users and all information produced during these processes are managed by the registration and history management system and also notified to the electronic paper maker. Using the proposed model, we can achieve the efficient production and management control of electronic papers, expect effect of a information protection and an intellectual property rights infringe as well.