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      • KCI등재

        펄스변조의 듀티비 변경에 따른 DBD 대기압 플라즈마 특성 연구

        박종인,황상혁,조태훈,윤명수,곽형신,진기남,전부일,최은하,권기청,Park, Jong-in,Hwang, Sang-hyuk,Jo, Tae Hoon,Yun, Myoung Soo,Kwak, Hyoung sin,Jin, Gi nam,Jeon, Buil,Choi, Eun Ha,Kwon, Gi-Chung 한국재료학회 2015 한국재료학회지 Vol.25 No.11

        Atmospheric pressure plasma is used in the biological and medical fields. Miniaturization and safety are important in the application of apply atmospheric plasma to bio devices. In this study, we made a small, pocket-sized inverter for the discharge of atmospheric plasma. We used pulse power to control the neutral gas temperature at which the, when plasma was discharged. We used direct current of 5 V of bias(voltage). The output voltage is about 1 to 2 kilo volts the frequency is about 80 kilo hertz. We analyzsed the characteristics of the atmospheric plasma using OES(Optical emission spectroscopy) and the Current-Voltage characteristic of pulse power. By calculating of the current voltage characteristics, we were able to determine that, when the duty ratio increased, the power that actually effects the plasma discharge also increased. To apply atmospheric plasma to human organisms, the temperature is the most important factor, we were able to control the temperature by modulating the pulse power duty ratio. This means we can use atmospheric plasma on the human body or in other areas of the medical field.

      • Intelligent Color Control for Display Panel

        Jang Gun Jo(조장군),Jong Won Kim(김종원),Jae Yong Seo(서재용),Hyun Chan Cho(조현찬),Tae Hoon Cho(조태훈) 한국지능시스템학회 2006 한국지능시스템학회 학술발표 논문집 Vol.16 No.1

        Human's sight holds the most extents among other senses. It will become more beneficial in person's emotion or body, if we form much better environment to human in connection with visual information as importance of visual information. Human is using a lot of display units on modem society. Basic colors that compose these are Red, Green and Blue. Using these three colors, we can change color sense of monitor or brightness degree. Suitable color degree by individual's environment can reduce person's stress or give comfortable feeling. So Factors by human's emotion and environment are standardized using fuzzy and the method that is to apply the result of Intelligent Color Control(ICC) on display is proposed.

      • KCI등재

        전하밀도파 이론으로 결정질 태양전지의 입사각에 따른 단락전류밀도 변화 연구

        서일원,구제환,윤명수,조태훈,이원영,조광섭,권기청,Seo, Il Won,Koo, Je Huan,Yun, Myoung Soo,Jo, Tae Hoon,Lee, Won Young,Cho, Guang Sup,Kwon, Gi Chung 한국진공학회 2013 Applied Science and Convergence Technology Vol.22 No.4

        광 입사각에 따른 태양전지의 양자효율을 전류의 출력으로 변환시켜 측정하였다. 기존의 태양전지의 원리는 태양전지가 태양광을 받았을 때 전자와 전공으로 분리되어 전류가 흐르게 된다는 것이었다. 그렇지만 저자들 중에 일부가 얼마 전에 태양전지원리를 새롭게 주장한 바 있다. 그 이론은 전하밀도파(charge density wave)들이 고정(pinning) 되었을 때, 이 고정 전위벽(pinning potential barrier)을 태양 광에 의해 넘을 수 있어서 전자 덩어리에 의한 전류 즉 단락전류($I_{SC}$)가 가능하다는 것이었다. 본 실험에서는 태양광의 입사각에 따른 태양전지의 단락전류밀도 ($J_{SC}$)를 측정하여 비교해본 결과 측정값들과 전하밀도파 이론과 매우 일치함을 보인다. We measure solar currents transformed from quantum efficiency as a function of incident angles of solar lights. According to conventional models for solar cells, solar currents can be induced when electrons are separated into electrons and holes in the presence of incident solar lights. On the contrary, solar currents can be possible at the time when pinned charge density waves go beyond the pinning potential barrier under the influence of incident solar beams suggested by some authors. In this experiment, measured solar currents and our theory are in good correspondence to confirm the angle dependence of solar lights.

      • KCI등재

        새로운 대기압 플라즈마 제트를 이용한 태양전지용 고농도 선택적 도핑에 관한 연구

        조이현,윤명수,손찬희,조태훈,김동해,서일원,노준형,전부일,김인태,최은하,조광섭,권기청,Cho, I Hyun,Yun, Myung Soo,Son, Chan Hee,Jo, Tae Hoon,Kim, Dong Hea,Seo, Il Won,Rho, Jun Hyoung,Jeon, Bu Il,Kim, In Tae,Choi, Eun Ha,Cho, Guangsup,Kwon, 한국진공학회 2013 Applied Science and Convergence Technology Vol.22 No.5

        태양전지 제조공정에서 열처리로 레이저를 사용하는 도핑공정은 태양전지의 성능을 결정짓는 중요한 요소이다. 그러나 퍼니스를 이용하는 공정에서는 선택적으로 고농도(Heavy) 도핑영역을 형성하기가 어렵다. 레이저를 사용한 선택적 도핑의 경우 고가의 레이저 장비가 요구되어지며, 레이저 도핑 후 고온의 에너지로 인한 웨이퍼의 구조적 손상 문제가 발생된다. 본 연구는 저가이면서 코로나 방전 구조의 대기압 플라즈마 소스를 제작하였고, 이를 통한 선택적 도핑에 관한 연구를 하였다. 대기압 플라즈마 제트는 Ar 가스를 주입하여 수십 kHz 주파수를 인가하여 플라즈마를 발생시키는 구조로 제작하였다. P-type 웨이퍼(Cz)에 인(P)이 shallow 도핑 된(120 Ohm/square) PSG (Phosphorus Silicate Glass)가 제거되지 않은 웨이퍼를 사용하였다. 대기압 플라즈마 도핑 공정 처리시간은 15 s와 30 s이며, 플라즈마 전류는 40 mA와 70 mA로 처리하였다. 웨이퍼의 도핑프로파일은 SIMS (Secondary Ion Mass Spectroscopy)측정을 통하여 분석하였으며, 도핑프로파일로 전기적 특성인 면저항(sheet resistance)을 파악하였다. 도펀트로 사용된 PSG에 대기압 플라즈마 제트로 도핑공정을 처리한 결과 전류와 플라즈마 처리시간이 증가됨에 따라 도핑깊이가 깊어지고, 면저항이 향상하였다. 대기압 플라즈마 도핑 후 웨이퍼의 표면구조 손상파악을 위한 SEM (Scanning Electron Microscopy) 측정결과 도핑 전과 후 웨이퍼의 표면구조는 차이가 없음을 확인하였으며, 대기압 플라즈마 도핑 폭도 전류와 플라즈마 처리시간이 증가됨에 따라 증가하였다. Doping process using laser is an important process in fabrication of solar cell for heat treatment. However, the process of using the furnace is difficult to form a selective emitter doping region. The case of using a selective emitter laser doping is required an expensive laser equipment and induce the wafer's structure damage due to high temperature. This study, we fabricated a new costly plasma source. Through this, we research the selective emitter doping. We fabricated that the atmospheric pressure plasma jet injected Ar gas is inputted a low frequency (a few tens kHz). We used shallow doping wafers existing PSG (Phosphorus Silicate Glass) on the shallow doping CZ P-type wafer. Atmospheric plasma treatment time was 15 s and 30 s, and current for making the plasma is 40 mA and 70 mA. We investigated a doping profile by using SIMS (Secondary Ion Mass Spectroscopy) and we grasp the sheet resistance of electrical character by using doping profile. As result of experiment, prolonged doping process time and highly plasma current occur a deeper doping depth, moreover improve sheet resistance. We grasped the wafer's surface damage after atmospheric pressure plasma doping by using SEM (Scanning Electron Microscopy). We check that wafer's surface is not changed after plasma doping and atmospheric pressure doping width is broaden by increase of plasma treatment time and current.

      • KCI등재

        BIPV용 건식 및 습식 텍스쳐링 공정에 의한 다결정실리콘 태양전지 모듈 특성 연구

        서일원(Seo, Il-Won),윤명수(Yun, Myung-Soo),조태훈(Jo, Tae-Hoon),손찬희(Son, Chan-Hee),차성호(Cha, Sung-Ho),이상두(Lee, Sang-Du),권기청(Kwon, Gi-Chung) 한국신재생에너지학회 2013 신재생에너지 Vol.9 No.2

        Multi-crystalline silicon solar cells is not exist a specific crystal direction different from single crystalline silicon solar cells. In functional materials, therefore, isotropic wet etching of mc-Si solar cell is easy the acid solution rather than the alkaline solution. The reflectance of wet texturing process is about 25% and the reflectance of RIE texturing process is achieved less than 10%. In addition, wet texturing has many disadvantages as well as reflectance. So wet texturing process has been replaced by a RIE texturing process. In order to apply BIPV, RIE and wet textured multi-crystalline silicon solar cell modules was manufactured by different kind of EVA sheet. Moreover, in case of BIPV, the short circuit current characteristics according to the angle of incidence is more important, because the installation of BIPV is fixed location. In this study, we has measured SEM image and I-V curve of RIE and wet textured silicon solar cell and PV module. Also we has analyzed quantum efficiency characteristics of RIE and wet textured silicon solar cell for PV modules depending on incidence angle.

      • KCI등재

        새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인산 도핑 가능성에 관한 연구

        조이현(I-Hyun Cho),윤명수(Myoung-Soo Yun),조태훈(Tae-Hoon Jo),권기청(Gi-Chung Kwon) 한국조명·전기설비학회 2013 조명·전기설비학회논문지 Vol.27 No.6

        Furnace is currently the most important doping process using POCl₃ in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid(H₃P0₄). Metal tube injected Ar gas was inputted 5 ㎸ of a low frequency(scores of ㎑) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid(H₃P0₄) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 ㎃. We check the doping depth that 287 ㎚ at 90 s and 621 ㎚ at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

      • KCI등재

        산소 유량별 플라즈마 방출광원 세기에 따른 전자온도 진단과 산화주석박막 특성연구

        박혜진(Hye Jin Park),최진우(Jin-Woo Choi),조태훈(Tae Hoon Jo),윤명수(Myoung Soo Yun),권기청(Gi-Chung Kwon) 한국표면공학회 2016 한국표면공학회지 Vol.49 No.1

        The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameters for the diagnosis of plasma. Generally, the range of the electron temperature which is used in a semiconductor process used the range of 1 eV to 10 eV. The difference of electron temperature of 0.5 eV has a influence in plasma process. The electron temperature can be measured by the electrical method and the optical method. Measurement of electron temperature for various gas flow rates was performed in DC-magnetron sputter and Inductively Coupled Plasma. The physical properties of the thin film were also determined by changing electron temperatures. The transmittance was measured using the integrating sphere, and wavelength range was measured at 300 ~ 1100 nm. We obtain the thin film of the mobility, resistivity and carrier concentration using the hall measurement system. As to the electron temperature increase, optical and electrical properties decrease. We determine it was influenced by the oxygen flow ratio and plasma.

      • KCI등재

        새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인(P) 페이스트 도핑에 관한 연구

        조이현(Cho, I-Hyun),윤명수(Yun, Myoung-Soo),조태훈(Jo, Tae-Hoon),노준형(Rho, Junh-Young),전부일(Jeon, BuII),김인태(Kim, In-Tae),최은하(Choi, Eun-Ha),조광섭(Cho, Guang-Sup),권기청(Kwon, Gi-Chung) 한국신재생에너지학회 2013 신재생에너지 Vol.9 No.2

        Furnace and laser is currently the most important doping process. However furnace is typically difficult appling for selective emitters. Laser requires an expensive equipment and induces a structural damage due to high temperature using laser. This study has developed a new atmospheric pressure plasma source and research atmospheric pressure plasma doping. Atmospheric pressure plasma source injected Ar gas is applied a low frequency (a few 10 kHz) and discharged the plasma. We used P type silicon wafers of solar cell. We set the doping parameter that plasma treatment time was 6s and 30s, and the current of making the plasma is 70 mA and 120 mA. As result of experiment, prolonged plasma process time and highly plasma current occur deeper doping depth and improve sheet resistance. We investigated doping profile of phosphorus paste by SIMS (Secondary Ion Mass Spectroscopy) and obtained the sheet resistance using generally formula. Additionally, grasped the wafer surface image with SEM (Scanning Electron Microscopy) to investigate surface damage of doped wafer. Therefore we confirm the possibility making the selective emitter of solar cell applied atmospheric pressure plasma doping with phosphorus paste.

      • SCOPUSSCIEKCI등재

        고양이 뇌압박시 급속 및 완속 만니톨 주입의 국소적 뇌혈류 및 뇌부종에 대한 영향

        조태훈,박춘근,이일우,정철구,김문찬,김달수,강준기,송진언 대한신경외과학회 1989 Journal of Korean neurosurgical society Vol.18 No.4

        The aim of the present study has been to examine the effect of mannitol on regional cerebral blood flow(rCBF) and brain edema both at normal and increased intracranial pressure and to determine which of two infusion methods, rapid infusion or slow mannitol, has better effect on brain compression. Thirty five adult cats weighing between 2.7 and 4.2㎏ were used in this study. The animals were divided into four groups : Mannitol administered normal control(n=5), brain compression(n=10), rapid mannitol treated-brain compression (n=10) and slow mannitol treated-brain compression groups(n=10) respectively. A small balloon connected to a fine polyethylene tube was placed in the epidural space of the right frontal region through a small burr hole and inflated with one ㎖ distilled water in increment of 0.2㎖ to simulate the expanding ma.. The measurements of rCBF and electroencephalography(EEG) activity were carried out in each animal. Mannitol was given in bolus of 1g/㎏ body weight via the femoral vein and two methods of mannitol infusion were used as rapid infusion which was infused the mannitol within 3min and slow infusion, infused within 15min. The rCBF was measured by hydrogen clearance method and the brain edema was measured by gravimetric technique. In brain compression group, the ICP rose immediately following brain compression to 133.00±9.49㎜H₂O from 78.00±11.35㎜Hg H₂O and maintained the elevation during the experiment. Treatment with mannitol in brain compression animals, decreased the ICP at 5 min after infusion of mannitol, and the decreased ICP was maintained for one hour. Brain compression animals showed a significant reduction of rCBF by 38% and 46% in right parietal lobe at the 60 min and 120 min after brain compression, respectively. In mannitol treated brain compression animals, the administration of mannitol made the reduced rCBF increase to baseline value at 30 min after treatment and the increased rCBF value was maintained for one hour. There was generalized brain edema, as judged by a decreased specific gravity in the brain compression, which was maximal close to the brain compression site. The severity of the brain edema was less in the mannitol treated brain compression group than in brain compression group. This study demonstrated that there was no significant different effects between rapid and slow infusion of mannitol in brain compression.

      • SCOPUSSCIEKCI등재

        전두골사골부에 생긴 수막뇌루 1예보고

        이상원,조태훈,김종현 대한신경외과학회 1979 Journal of Korean neurosurgical society Vol.8 No.2

        Meningoencephalocele in the anterior part of the cranium is a rare congenital anomaly and has been sparsely reported in the neurologic literature. Recently we encountered a case of bilateral frontoethmoidal meningoencephalocele in a 3-year-old otherwise healthy boy. The cranial ends of the tumors were amputated by bifrontal craniotomy and dural defect was tightly repaired with Neodura. The external portions of the tumors were excised at the second stage and double-limbed YV shaped canthoplasty was performed. Postoperatively, the patient recovered uneventfully without any complication.

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