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다중 슬릿 구조를 이용한 EFG 법으로 성장시킨 β-Ga<sub>2</sub>O<sub>3</sub> 단결정의 다양한 결정면에 따른 특성 분석
장희연,최수민,박미선,정광희,강진기,이태경,김형재,이원재,Hui-Yeon Jang,Su-Min Choi,Mi-Seon Park,Gwang-Hee Jung,Jin-Ki Kang,Tae-Kyung Lee,Hyoung-Jae Kim,Won-Jae Lee 한국결정성장학회 2024 한국결정성장학회지 Vol.34 No.1
β-Ga<sub>2</sub>O<sub>3</sub> is a material with a wide band gap of ~4.8 eV and a high breakdown-voltage of 8 MV/cm, and is attracting much attention in the field of power device applications. In addition, compared to representative WBG semiconductor materials such as SiC, GaN and Diamond, it has the advantage of enabling single crystal growth with high growth rate and low manufacturing cost [1-4]. In this study, we succeeded in growing a 10 mm thick β-Ga<sub>2</sub>O<sub>3</sub> single crystal doped with 0.3 mol% SnO<sub>2</sub> through the EFG (Edge-defined Film-fed Growth) method using multi-slit structure. The growth direction and growth plane were set to [010]/(010), respectively, and the growth speed was about 12 mm/h. The grown β-Ga<sub>2</sub>O<sub>3</sub> single crystal was cut into various crystal planes (010, 001, 100, ${\bar{2}}01$) and surface processed. The processed samples were compared for characteristics according to crystal plane through analysis such as XRD, UV/VIS/NIR/Spec., Mercury Probe, AFM and Etching. This research is expected to contribute to the development of power semiconductor technology in high-voltage and high-temperature applications, and selecting a substrate with better characteristics will play an important role in improving device performance and reliability.
입방정 질화붕소 박막의 잔류응력 형성에 미치는 산소 첨가 효과
장희연(Hee-yeon Jang),박종극(Jong-Keuk Park),이욱성(Wook-Seong Lee),백영준(Young-Joon Baik),임대순(Dae-Soon Lim),정증현(Jeung-hyun Jeong) 한국표면공학회 2007 한국표면공학회지 Vol.40 No.2
In this study, we investigated the oxygen effect on the nucleation and its residual stress during unbalanced magnetron sputtering. Up to 0.5% in oxygen flow rate, cubic phase (c-BN) was dominated with extremely small fraction of hexagonal phase (h-BN) of increasing trend with oxygen concentration, whereas hexagonal phase is dominated beyond 0.75% flow rate. Interestingly, the residual stress in cubic-phase-dominated films was substantially reduced with small amount of oxygen (~0.5%) down to a low value comparable to the h-BN case. This may be because oxygen atoms break B-N sp³ bonds and make B-O bonds more favorably, increasing sp² bonds preference, as revealed by FTIR and NEXAFS. It was confirmed by experimental facts that the threshold bias voltage for nucleation and growth of cubic phase were increased from ?55 V to ?70 V and from ?50 V to ?60 V, respectively. The reduction of residual stress in O-added c-BN films is seemingly resulting from the microstructure of the films. The oxygen tends to increase slightly the amount of h-BN phase in the grain boundary of c-BN and the soft h-BN phase of 3D network including surrounding nano grains of cubic phase may relax the residual stress of cubic phase.