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Lee, Younghyun,Kim, Yang Jee,Choi, Young Joo,Lee, Joong Won,Lee, Sunyeong,Cho, Yoon Hee,Chung, Hai Won Informa Healthcare 2015 International Journal of Radiation Biology Vol.91 No.2
<P><I>Purpose</I>: We investigated the association between occupational radiation exposure and DNA methylation changes in nuclear power plant workers. We also evaluated whether radiation- induced DNA methylation alterations are associated with chromosome aberrations.</P><P><I>Materials and methods</I>: The study population included 170 radiation-exposed workers and 30 controls. We measured global, long interspersed nuclear element-1 (LINE-1), and satellite 2 methylation levels in blood leukocyte DNA. The analysis of chromosome aberrations was performed on peripheral lymphocytes.</P><P><I>Results</I>: Global DNA methylation levels were lower in radiation-exposed workers than in controls. The methylation levels were negatively associated with the recent 1.5-year radiation dose in a multiple linear regression model (β = − 0.0088, <I>p</I> ≤ 0.001); the levels increased proportionally with the total cumulative dose in radiation-exposed workers. LINE-1 methylation levels were higher in radiation-exposed workers than in controls and were significantly associated with the total cumulative radiation dose in a multiple linear regression model (β = − 0.031, <I>p</I> = 0.035). Global DNA methylation levels were also correlated with chromosome aberrations among workers. Workers with low global methylation levels had a higher frequency of chromosome aberrations than did subjects with high global methylation levels.</P><P><I>Conclusion</I>: Occupational exposure to low-dose radiation could affect DNA methylation levels, and the radiation-induced DNA methylation alterations may be associated with chromosome aberrations.</P>
Analysis of Korean Facial Measurements for Sizing System of Face Wearable Products
Baekhee Lee,Nahyeon Lee,Younggeun Choi,Eunjin Jeon,Kwangae Park,Boyoung Park,Wonsup Lee,Hee-Eun Kim,Jeongrae Lee,Junghee Won,Hyoseon Kim,Younghyun Kim,Heecheon You 대한인간공학회 2015 대한인간공학회 학술대회논문집 Vol.2015 No.10
Objective: The present study is to analyze Korean facial dimensions and select facial key dimension candidates for establishing a sizing system of face wearable products such as dust mask and oxygen mask. Background: An anthropometric sizing system accommodating different facial characteristics of the target population can contribute to improving usability of the face wearable product. Method: Facial key dimension candidates were selected by correlation analysis among 19 facial dimensions. Korean facial sizes measured by KATS (2004, 2010) and Lee et al. (2013) were compared to Chinese facial sizes measured by Du et al. (2008) to each facial key dimension candidate. Results: Face length, bitragion breadth, bitragion-subnasale arc, and bitragion-pronasale arc were selected as facial key dimension candidates. The face length of Korean was 6.6 mm longer compared to that for Chinese; the bitragion-subnasale arc 17.4 mm shorter. Conclusion: The present study proposed four facial key dimensions for Korean face wearable product sizing systems. Found that Korean have longer face length and lower cheekbones compared to Chinese. Application: The facial key dimension and corresponding analysis result can be applied to design for sizing system of Korean facial wearable products.
이재명(Jaemyung Lee),이주성(Jusung Lee),이영현(Younghyun Lee),이준수(Jaemyung Lee) 대한전자공학회 2020 대한전자공학회 학술대회 Vol.2020 No.8
Instance segmentation-based approach using Mask R-CNN is currently one of the leading methods for the text localization task. Different from general object detection tasks, the aspect ratio of text instances is too high to apply Mask R-CNN as it is. To simply apply Mask R-CNN for text detection yields false positives due to overgeneralized receptive fields for bounding boxes. In this paper, we propose a modified Mask R-CNN architecture for text detection. We present a method to extract features containing word-level and character-level receptive fields simultaneously. Our approach shows consistent performance improvement on MLT 2017 and Incidental Scene Text. Moreover, our method surpasses most of prior state-of-the-art text localization methods appeared in recent computer vision conferences.
Younghyun Lim,Jeonghyun Lee,Yongsun Lee,Seong-Sik Song,Hong-Teuk Kim,Ockgoo Lee,Jaehyouk Choi Institute of Electrical and Electronics Engineers 2017 IEEE transactions on very large scale integration Vol.25 No.11
<P>An external capacitor-less ultra low-dropout (LDO) regulator that can continue to provide high power-supply rejection (PSR) over a wide range of the load current is proposed. Using the loop-gain stabilizer (LGS) to fix the dc level of the output voltage of the error amplifier to the optimal value, the LDO can keep maximizing the unity-gain frequency, while the load current changes widely up to 200 mA. Despite the multiple poles in the regulating loop, the stability can easily be obtained due to an intrinsic left-half plane zero, generated by the auxiliary path of the LGS. The proposed LDO was fabricated in a 40-nm CMOS process, and it had an input voltage of 1.1 V. When the dropout voltage was 0.1 V and the load current was 200 mA, the measured PSRs were -60 and -35 dB at 1 and 10 MHz, respectively. Due to the LGS, the dc loop gain was maintained to be high, resulting in good load and line regulations of 19 mu V/mA and 0.75 mV/V, respectively. While the total current consumption of the LDO was 275 mu A, the LGS consumed only 7 mu A. The area was 0.008 mm(2) with 4-pF on-chip capacitance for compensation.</P>