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증착 후 열처리 조건에 따른 ITO박막의 광학적, 전기적 특성 연구
이기암 단국대학교 1998 論文集 Vol.33 No.-
Electronbeamevaporated Indium Tin Oxide(ITO) films were analyzed by investigation of transmittance. sheet resistance and crystalline structure with varying annealing temperature and oxygen partial pressure in air and vacuum. With increasing annealing temperature, ITO films showed two changes ; the transmittance increased and the sheet resistance became lower. In vacuum annealing, transmittance increased with increasing oxygen partial pressure. The best conditions for nonabsorbing ITO thin films are annealing temperature of 280℃ and oxygen partial pressure of 5×10^-5 torr. The crystalline structure of ITO films were more excellent at the vacuum annealing than the annealing in air, with the increase of annealing temperature and the decrease of oxygen partial pressure.
Rolling stones with nonconvex sides II: all time regularity of interface and surface
이기암,이은재 대한수학회 2012 대한수학회지 Vol.49 No.3
In this paper we consider the evolution of the rolling stone with a rotationally symmetric nonconvex compact initial surface 0 under the Gauss curvature ow. Let X : Sn[0,1) ! Rn+1 be the embeddings of the sphere in Rn+1 such that (t) = X(Sn, t) is the surface at time t and (0) = 0. As a consequence the parabolic equation describing the motion of the hypersurface becomes degenerate on the interface sep-arating the nonconvex part from the strictly convex side, since one of the curvature will be zero on the interface. By expressing the strictly convex part of the surface near the interface as a graph of a function z = f(r, t)and the non-convex part of the surface near the interface as a graph of a function z = φ(r), we show that if at time t = 0, g = 1n fn-1r vanishes linearly at the interface, the g(r; t) will become smooth up to the interface for long time before focusing.
李起岩 단국대학교 1985 論文集 Vol.19 No.-
^14N-Nuclear Quadrupole Resonance studies has been made for the polycrystalline of hydrazaine nirtrate*N_2H_5NO_3) at 293K. Resonance frequencies, ν^+ = 4.5566MHz, ν_- = 2.6182Mhzat 293K are obwerved. The quadrupole coupling constant E^2qQ/hand the asymmetry parameter η are 4.7832MHz and 0.8105 respectively at the room temperature(293K).
Sputtering 성막속도가 박막의 특성에 미치는 영향
이기암(Ky Am Lee) 한국진공학회(ASCT) 1993 Applied Science and Convergence Technology Vol.2 No.2
본 연구에서는 DC magnetron sputtering 장비를 이용하여, GdFe, Co, CoCr 박막을 제작함에 있어서 sputtering 조건에 관계되는 Ar 압력, 투입전력, 기판의 종류 등의 요소가 박막의 특성, 특히 보자력과 미세구조에 미치는 영향을 관찰하였다. GdFe의 경우 성막속도가 증가함에 따라 Gd의 atomic%가 줄어드는 것을 알 수 있었으며, Ar 압력이 증가함에 따라 성막속도는 감소하였고, 투입전력이 증가함에 따라 성막속도는 거의 선형적으로 증가함을 알 수 있었다. 또한 투입전력이 증가함에 따라 박막의 보자력도 증가함을 알 수 있었다. Co 박막에 대해서는 투입전력과 Ar 압력에 관한 성막속도와 미세구조에 관하여 관찰하였다. 이로써 투입전력이 증가하면 성막속도가 증가하며 결정립의 크기가 감소함을 알 수 있었고, Ar 압력이 증가하면 성막속도가 감소함을 알 수 있었다. CoCr의 박막에서는 substrate 종류에 따라 보자력 및 미세구조에 미치는 영향에 대해 연구를 행하였으며, substrate의 종류가 미세구조와 보자력에 상당한 영향을 준다는 것을 알 수 있었다. In this study, we have investigated the influence of sputtering conditions (Ar pressure, input powers, substrates) on coercivity and microstructures of GdFe, Co, CoCr thin films produced by the method of DC magnetron sputtering. In GdFe films, we have observed that the Gd atomic ratio was decreased with the deposition rate, and the deposition rate decreased with the pressure of Ar gas and the increased linearly with input power. It was also observed that the coercivity of thin films was increased with input power. In Co films, we have investigated the deposition was increased and the Co thin film became finer structure with the increase in the input power, was increased and the Co thin film became finear structure with the increase in the input power, and the deposition rate was decreased with the pressure of Ar gas. In CoCr films, we have investigated the effects of substrates on the coercivity (H_c) and the microstructure. We have found that the substrates plays a crucial role in the microstructure and the coercivity (H_c).