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UV/O<sub>2</sub> 가스상 세정을 이용한 실리콘 웨이퍼상의 PEG 반응기구의 관찰
권성구,김도현,김기동,이승헌,Kwon, Sung-Ku,Kim, Do-Hyun,Kim, Ki-Dong,Lee, Seung-Heun 한국전기전자재료학회 2006 전기전자재료학회논문지 Vol.19 No.11
An experiment to find out the removal mechanism of PEG(polyethyleneglycol) by using UV-enhanced $O_2$ GPC (gas phase cleaning) at low substrate temperature below $200^{\circ}C$ was executed under various process conditions, such as substrate temperature, UV exposure, and $O_2$ gas. The possibility of using $UV/O_2$ GPC as a low-temperature in-situ cleaning tool for organic removal was confirmed by the removal of a PEG film with a thickness of about 200 nm within 150 sec at a substrate temperature of $200^{\circ}C$. Synergistic effects by combining photo-dissociation and photo oxidation can only remove the entire PEG film without residues within experimental splits. In $UV/O_2$ GPC with substrate temperatures higher than the glass transition temperature, the substantial increase in the PEG removal rate can be explained by surface-wave formation. The photo-dissociation of PEG film by UV exposure results in the formation of end aldehyde by dissociation of back-bone chain and direct decomposition of light molecules. The role of oxygen is forming peroxide radicals and/or terminating the dis-proportionation reaction by forming peroxide.
실제 산업 폐수로부터 견운모를 이용한 Batch 공정에서의 니켈 흡착
권성구(Seong-Ku Kwon),정강연(Kang-Yeon Jung),전충(Choong Jeon) 유기성자원학회 2022 유기성자원학회 학술발표대회논문집 Vol.2022 No.추계
Sericite was used as a adsorbent to efficiently remove Ni(II) from actual industrial wastewater which has Na(I) of high concentration. The removal efficiency for Ni(II) could not be affected by Na(I) which generate ionic strength and the highest removal efficiency was about 93% at pH 7.5. The silanol (SiO2) and aluminol (Al2O3) groups in sericite are likely to play important role in adsorption process. All adsorption process was completed in 120min and removal efficiency of sericite was higher than that of Amberlite IR 120 plus resin. The effect of temperature on the removal efficiency of Ni(II) was negligible. Also, to investigate the surface condition and functional groups of sericite, SEM (Scanning Electron Microscopy) photograph, EDX (Energy Dispersive X-ray) spectrum, and FT-IR spectrum were applied. In addition, previously adsorbed Ni(II) onto sericite could be easily and completely eluted by HNO3.
편차제곱평균과 수정량분산의 균형을 위한 단일 및 이중 지수가중이동평균 피드백 수정기의 수정
박창순,권성구,Park, Chang-Soon,Kwon, Sung-Gu 한국데이터정보과학회 2009 한국데이터정보과학회지 Vol.20 No.1
수정절차에서 공정수정기는 잡음이 존재하지만 제거할 수 없을 때 공정수준을 목표치에 가깝게 수정하는데 종종 유용하게 사용된다. 강건 수정기의 예로는 단일 및 이중 지수가중이동평균 수정기가 있다. 이중 지수가중이동평균 수정기는 단일 지수가중이동평균 수정기가 제거할 수 없는 공정편차의 치우침을 줄일 수 있도록 고안되었다. 이 논문에서는 이 두 가지 수정기가 적용될 때 과도하게 커질 수 있는 수정량분산을 줄일 수 있도록 원래의 수정기에 지수가중이동평균을 적용함으로써 수정되었다. 주어지 수정기에 대한 지수가중이동평균 수정은 편차제곱평균은 조금 증가시키지만, 수정량분산을 줄이는데 성공적임을 보이고 있다. The process controller in the adjustment procedure is often used effectively to control the process level close to target when noise is present and unremovable. Examples of the robust controller are single EWMA controller and double EWMA controller. Double EWMA controller is designed to reduce the offset of the process deviation, which single EWMA can not eliminate. In this paper, the two controllers are modified by taking EWMA of the original controller to reduce the adjustment variance, which may become excessively large when the two given controllers are implemented. It is shown that the EWMA modification of the given controllers is successful in reducing the adjustment variance, while the mean squared deviation increases slightly.