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Yusuke Kajihara,Toru Takeuchi,Satoru Takahashi,Kiyoshi Takamasu 한국정밀공학회 2008 International Journal of Precision Engineering and Vol.9 No.3
A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser; a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 ㎚ and that the confocal positioning system provided a depth resolution of 30.8 ㎚. These results indicate that nanostereolithography can be successfully performed with this system.
Fabrication of 8Cr-2W ferritic steel tile for reduction in toroidal magnetic field ripple on JT-60U
yusuke Kudo,K. Masaki,M. Honda,N. Miya,R. Takahashi,S. Jitsukawa,S. Sakurai,T. Sawai,T. Sasajima,T. Hayashi,Y. Suzuki 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.49 No.III
The objectives are to fabricate the ferritic steel for the reduction in the toroidal magnetic field ripple on JT-60U. The ferritic steel (8Cr-2W-0.2V) is selected by saturated magnetization and fabrication processes with more than 20 tons melting are reported. Although the magnetic properties of the plates fabricated are clarified, the little variation is observed but the saturated magnetization is lower than expected. Additional material conditions are clarified to improve the saturated magnetization without degradation of mechanical properties but it is decided not to adapt this process on grounds of cost-effectivenessP
Sasaki, Yusuke,Hamaguchi, Tetsuya,Yamada, Yasuhide,Takahashi, Naoki,Shoji, Hirokazu,Honma, Yoshitaka,Iwasa, Satoru,Okita, Natsuko,Takashima, Atsuo,Kato, Ken,Nagai, Yushi,Taniguchi, Hirokazu,Boku, Nari Asian Pacific Journal of Cancer Prevention 2016 Asian Pacific journal of cancer prevention Vol.17 No.2
Background: It is well known that peritoneal carcinomatosis (PC) from colorectal cancer (CRC) is associated with a poor prognosis. However, data on the prognostic significance of modern chemotherapy containing bevacizumab, cetuximab or panitumumab are not available. Materials and Methods: This retrospective review concerned 526 patients with metastatic CRC who were classified into two groups according to the presence or absence of PC, and were treated with systemic chemotherapy, with or without bevacizumab or anti-EGFR antibodies. The genetic background, in particular KRAS, BRAF, and PIK3CA gene mutations, and overall survival (OS) were compared between the two groups. Results: The median OS values were 23.3 and 29.1 months for PC and non-PC patients, respectively (hazard ratio [HR]=1.20; p=0.17). Among all patients, tumor location, number of metastatic sites and BRAF mutation status were significant prognostic factors, whereas the presence of PC was not. In the PC group, chemotherapy with bevacizumab resulted in a significantly longer OS than forchemotherapy without bevacizumab (HR=0.38, p<0.01), but this was not the case in the non-PC group (HR=0.80, p=0.10). Furthermore, the incidence of the BRAF V600E mutation was significantly higher in PC than in non-PC patients (27.7% versus 7.3%, p<0.01). BRAF mutations displayed a strong correlation with shorter OS in non-PC (HR=2.26), but not PC patients (HR=1.04). Conclusions: Systemic chemotherapy, especially when combined with bevacizumab, improved survival in patients with PC from CRC as well as non-PC patients. While BRAF mutation demonstrated a high frequency in PC patients, but it was not associated with prognosis.
Kajihara, Yusuke,Takeuchi, Toru,Takahashi, Satoru,Takamasu, Kiyoshi Korean Society for Precision Engineering 2008 International Journal of Precision Engineering and Vol.9 No.3
A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.