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다층박막 Fe(50 Å) / [Co(17 Å) / Cu(24 Å)]20의 증착률 및 열처리가 자기저항에 미치는 효과
김미양(M. Y. Kim),최수정(S. J. Choi),최규리(K. L. Choi),송은영(E. Y. Shong),오미영(M. Y. Oh),이장로(J. R. Rhee),이상석(S. S. Lee),황도근(D. G. Hwang),박창만(C. M. Park),이기암(K. A. Lee) 한국자기학회 1998 韓國磁氣學會誌 Vol.8 No.5
Dependence of magnetoresistance on base pressure and deposition rates of each Fe, Co, Cu layers in the Fe(50 Å)/[Co(17 Å)/Cu(24 Å)_(20) multilayer thin films, prepared by dc magnetron sputtering on Corning glass, were investigated. AFM analysis, X-ray diffraction analysis, vibrating sample magnetometer analysis, and magnetoresistance measurement (4-probe method) were performed. The multilayer films deposited under low base pressure increases magnetoresistance ratio by preventing oxidation. Annealing for the samples at a moderate temperature allowed larger textured grain with no loss in the periodicity. Magnetoresistance ratio of the annealed multilayers was increased due to the increase antiferromagnetically coupled fraction of the film after annealing. Optimization of deposition rate was greater than 1 Å/s for Fe, and 2.8 Å/s for Cu. Deposition rate of Co showed a tendency of increasing of magnetoresistance ratio due to the formation of flat magnetic layer in case of high deposition rate of Co.
[FeNi / Cu / CoFe(Co) / Cu]N Spin - Valve 다층박막의 자기저항 특성
김미양(M. Y. Kim),이정미(J. M. Lee),최규리(K. L. Choi),오미영(M. Y. Oh),이장로(J. R. Rhee) 한국자기학회 1999 韓國磁氣學會誌 Vol.9 No.1
Buffer/[NiFe/Cu/CoFe(Co)/Cu]_N spin-valve multilayers prepared by dc magnetron sputtering on a coming glass substrate using NiFe and CoFe(Co) possess different coercivities. Dependence of magnetoresistance on the type and thickness of buffer layer, thickness of Cu, NiFe, stacking number of multilayer, substrate temperature and annealing temperature in the form [NiFe/Cu/CoFe(Co)/Cu]_N spin-valve multilayers were investigated. To evaluate effect of magnetoresistance for this samples, X-ray diffraction analysis, vibrating sample magnetometer analysis, and magnetoresistance measurement (4-probe method) were performed. The maximum magnetoresistance ratio and coercivity were 7.5 % and 140 Oe, respectively for Cr-50Å/[NiFe-20Å/Cu-50Å/Co-20Å/Cu-50Å]_(10) at substrate temperature of 90 ℃. Magnetoresistance slope maintained 0.25% / Oe until 150 ℃ of annealing temperature, and then decreased to 0.03% / Oe at 200 ℃. It was confirmed that the main factor of thermal stability was deteriorating of soft magnetic properties in the NiFe layer.
R.F. 마그네트론 스퍼터링을 이용한 LiCoO<sub>2</sub> 양극활물질의 Ar 증착분압에 따른 박막전지 전극 특성
박호영,임영창,최규길,이기창,박기백,권미연,조성백,남상철,Park, H.Y.,Lim, Y.C.,Choi, K.G.,Lee, K.C.,Park, G.B.,Kwon, M.Y.,Cho, S.B.,Nam, S.C. 한국전기화학회 2005 한국전기화학회지 Vol.8 No.1
Ar공정 분압에 따라 스퍼터링된 $LiCoO_2$박막 양극의 $400^{\circ}C$저온 열처리를 통한 전기화학적 및 미세구조적 특성을 연구하였다. Ar분압이 변화함에 따라 양극 박막의 미세구조 및 조성이 변화하였으며, Ar분압이 증가할수록 $LiCoO_2$ 박막의 안정성 및 전기화학적 특성이 개선되었다. 순환전류전위법 및 정전류 충방전 시험에 의해 전극반응의 가역성 및 안정성 등을 고찰하였으며, 박막의 조성, 결정성, 표면 특성 등 물리적 특성은 ICP-AES, XRD, SEM 및 AFM을 통해 분석하였다. We investigated the electrochemical properties and microstructure on the various argon deposition pressure $(P_{Ar})$ and the low annealing temperature $(400^{\circ}C)$ of $LiCoO_2$ cathodes, which deposited by R.F. magnetron sputtering. The microsuucture and composition of Lico02 thin film was changed as a function of $P_{Ar}$. The capacity and electrochemical properties were improved with Ph of $LiCoO_2$ thin films. The cycling reversibility and stability of thin film batteries were measured by cyclic voltammetry and the constant current charge-discharge. The physical properties of cathode films were analyzed by ICP-AES, XRD, SEM and AFM for composition, crystallization and surface morphology.