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비정질 SmFe₂ 합금의 자기적 및 자기변형 특성에 미치는 B 첨가와 열처리 영향
최규길(K. G. Choi),장호(Ho Jang),한석희(S. H. Han),김희중(H. J. Kim),임상호(S. H. Lim) 한국자기학회 2000 韓國磁氣學會誌 Vol.10 No.5
Effects of B addition and heat treatment on the magnetic and magnetostrictive properties of amorphous SmFe₂ thin films are investigated. A significant improvement in the magnetostrictive properties at low magnetic fields is observed with the addition of B. This improvement, however, is achieved at a heavy cost of intrinsic properties such as saturation magnetostriction. For example, at a magnetic field of 30 Oe, magnetostriction of a thin film with a B content of 9.9 at. % is increased from 190 to 333 ppm, but saturation magnetostriction is decreased by more than 50 %. This result is in accord with the deterioration (reduction) of saturation magnetization and the improvement (reduction) of coercive force at this B content. The magnetostrictive properties are also improved by annealing and optimum annealing temperature is found to be in the range 300-400℃. The main reason for the improvement is mainly considered to be due to the reduction of coercive force caused by stress relief, not due to the ultrafine SmFe₂ precipitates which were originally expected to form by annealing.
다층박막 Fe(50 Å) / [Co(17 Å) / Cu(24 Å)]20의 증착률 및 열처리가 자기저항에 미치는 효과
김미양(M. Y. Kim),최수정(S. J. Choi),최규리(K. L. Choi),송은영(E. Y. Shong),오미영(M. Y. Oh),이장로(J. R. Rhee),이상석(S. S. Lee),황도근(D. G. Hwang),박창만(C. M. Park),이기암(K. A. Lee) 한국자기학회 1998 韓國磁氣學會誌 Vol.8 No.5
Dependence of magnetoresistance on base pressure and deposition rates of each Fe, Co, Cu layers in the Fe(50 Å)/[Co(17 Å)/Cu(24 Å)_(20) multilayer thin films, prepared by dc magnetron sputtering on Corning glass, were investigated. AFM analysis, X-ray diffraction analysis, vibrating sample magnetometer analysis, and magnetoresistance measurement (4-probe method) were performed. The multilayer films deposited under low base pressure increases magnetoresistance ratio by preventing oxidation. Annealing for the samples at a moderate temperature allowed larger textured grain with no loss in the periodicity. Magnetoresistance ratio of the annealed multilayers was increased due to the increase antiferromagnetically coupled fraction of the film after annealing. Optimization of deposition rate was greater than 1 Å/s for Fe, and 2.8 Å/s for Cu. Deposition rate of Co showed a tendency of increasing of magnetoresistance ratio due to the formation of flat magnetic layer in case of high deposition rate of Co.