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MPEG 시퀸스의 장면 변화 검출을 위한 하이브리드 알고리즘
최윤식,이준형,Choe, Yoon-Sik,Lee, Joon-Hyoung 대한전자공학회 1998 電子工學會論文誌, S Vol.s35 No.10
본 논문에서는 MPEG 기반 압축 영상데이터의 장면 변화를 검출하기 위한 하이브리드 알고리즘을 제안한다. MPEG이나 Motion JPEG으로 압축된 영상의 장면 변화를 검출하기 위해 사용된 알고리즘은 크게 두 가지로 나눌 수 있다. 한가지 방법은 압축된 상태의 영상에 직접 처리를 하는 방법으로서 수행시간을 줄일 수 있는 장점이 있지만 정확성이 떨어지는 문제점이 있고, 다른 방법은 복원된 영상에 처리를 하는 방법으로 보다 정확한 검출이 가능하나 속도가 느린 단점이 있다. 따라서 본 논문에서는 이러한 두 가지 알고리즘을 혼합하여, 우선 빠른 검출을 위하여 압축된 시퀀스로부터 DC값에 의한 영상에 의해 컷을 검출하고, 이 결과에서 적절한 영역을 선택한 뒤, 그 영역에 대해서만 영상을 복원하여 윤곽선 정보에 의해 점진적인 장면 변화를 검출한다. 실험결과 수행시간의 단축과 정확한 검출에 있어서 매우 효율적임을 확인하였다. In this paper, the hybrid algorithm for the scene change detection of MPEG-based compressed video data is proposed. There have been two methods to detect scene changes of video data compressed using algorithms such as MPEG or motion-JPEG: analyzing the compressed data directly, and analyzing from the retrieved data. The former has the advantage of taking less time, while the latter can obtain detail results at the expense of time and memory. Thus by combining each algorithm we detect cuts from compressed sequence, retrieve data for some selected region, and detect gradual scene changes. Simulation results verify the superiorities of the proposed algorithm in analyzing time and accuracy.
고온 응축수 재활용을 위한 보일러 설비의 스팀 콤프레셔 개발
임석진 ( Seok-jin Lim ),이준형 ( Joon-hyoung Lee ) 대한설비관리학회 2020 대한설비관리학회지 Vol.25 No.4
The importance of reusing energy and recycling resources in current industrial environment is growing. Generally, boilers produce hot steam and hot water. But most of the hot steam energy produced is wasted after use. It is a study of high temperature steam energy produced in the boiling system. This study is to develop steam compressor system for boiler that reuse the after using. The developed system is consisting of three subsystems that are piston ring, pressure valve and steam compressor for improving equipment efficiency. The developed system can applied to boiling system in small and medium-sized industries. The developed system can be able to contribute to the energy saving and reduction of environmental pollution.
신석우(Shuk Woo Shin),이준형(Joon Hyoung Lee),민택기(Taeg Ki Min) 대한공업교육학회 2001 대한공업교육학회지 Vol.26 No.2
We performed the friction welding of Cu to SM45C carbon steel. This paper deals with the characteristics of tensile strength, shearing strength, hardness and temperature in friction welds. The results obtained from this experimental study are as followed. 1. The welding conditions of the maximum tensile strength of friction weld were t₁=1.8sec, P₂=100㎫ in Cu-SM45C. In this case, the maximum tensile strength was 247㎫, which was about 80% of Cu base metal tensile strength. The observation of tensile fracture surface showed that most breaks happened in the heat affected zone of Cu and under the welding condition of maximum tensile strength, the deepest dimple was formed. 2. The maximum shearing strength of friction welded joints were acquired at the same welding conditions. The maximum shearing strengths were 147㎫ in Cu-SM45C, which was about 75% of Cu base metal shearing strength. 3. The welding conditions of the maximum tensile strength of friction weld were t₁=1.8sec, P₂=100㎫ in Cu-SM45C. In this case, the total upset length was 13.4㎜.
전자빔과 무반사층이 없는 크롬 마스크를 이용한 나노그레이팅 사출성형용 고종횡비 100㎚ 급 니켈 스템퍼의 제작
서영호(Young Ho Seo),최두선(Doo-Sun Choi),이준형(Joon-Hyoung Lee),제태진(Tae-Jin Je),황경현(Kyung-Hyun Whang) 대한기계학회 2004 대한기계학회 춘추학술대회 Vol.2004 No.4
We present high aspect ratio 100㎚-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and e-beam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of 10.0μC/㎠ and 8.5μC/㎠, respectively. Finally, we have fabricated 116㎚±6㎚-width and 240㎚±20㎚-height nickel grating stamper for the injection molding pattern.