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한국인 골반내 장기 탈출 환자에서 실리콘 환 페사리의 이용
김진홍 ( J. H. Kim ),이유미 ( Y. M. Lee ),김은중 ( E. J. Kim ),정기욱 ( K. W. Chung ),권동진 ( D. J. Kwon ),유영옥 ( Y. O. Lew ),김도강 ( D. K. Kim ),김수평 ( S. P. Kim ) 대한산부인과학회 1997 Obstetrics & Gynecology Science Vol.40 No.12
Pessaries have been used for centuries in the management of pelvic organ prolapse. Although surgical repair has been popularized by surgeons and gynecologists for younger women with pelvic relaxation, pessaries remain a useful palliative strategy for patients who refuse surgery as represent higher operative risks. Methods: Due to the recent advancement of material science, medical-grade silicone has replaced the traditional rubber, plastic, or Lucite, since it is more durable and non-allergenic. The authors used silicone ring pessaries in 98 Korean women with pelvic organ prolapse compromising those who are at high risks for anesthesia because of medical disease, who want to conceive in the further or those who wish to avoid surgical therapy. Results: 1. The average age of patients is 62.69±11.37 years. Period of pelvic organ prolapse is 78.64±56.23 months and duration of pessary insertion is 17.34±11.75 months. 2. The average time point of first complication was 7.91±4.25 months. The time point of complication of user group and non-user group of estrogen and lubricant was 10.06±3.31 months and 4.13±3.27 months, respecitively, which shows that complication occurred later in user group than in non-user group. 3. Pessary with support(16 out of 43 patients, 37.2 %) shows more serious complications (ulceration of vaginal wall) than pessary without support(1 out of 37 patients, 2.7 %). 4. The pessary sizes that fit best the prolapsed uteri of Korean women are #3(diameter of 63.5 mm) and #4(diameter of 69.8 mm) (60 out of 77, 77.9 %). Natural correction rate after removal of pessary(pessary insertion period: over 1 year) was 22.7 %(10 out of 44). 5. The most common complication in patient with uterine prolapse with or without cystocele is erosion. On the other hand ulceration of vaginal wall is the most common complication in those with rectocele and cystocele. 6. Among patients with pelvic organ prolapse in Korea, when there was uterine prolapse only, #3 and #4 pessary without support was the most commonly used(22 of 35, 62.9 %). When uterine prolapse was accompanied with rectocele or cystocele, #3 and #4 pessary with support fitted the best (accompanied with cystocele only: 14 of 26, 53.8 %, accompanied with cystocele and rectocele: 8 fo 9, 88.9 %). Conclusion: The above results suggest that we could recommend more utilization of proper shaped and sized pessary of patients with pelvic organ prolapse along with regular follow-up examination and proper use of estrogen, Trimosan, antibiotics, and anti-inflammatory drugs, in place of surgical therapy as the population of old aged women increases. Furthermore, education of the old aged women who are reluctant to visit Dr`s office how to do self-fitting the pessary will result in time saving and reduction of medical costs.
CHF₃ / C₂F6 플라즈마에 의한 실리콘 표면 잔류막의 특성
권광호(K.-H. Kwon),박형호(H.-H. Park),이수민(S. M. Lee),강성준(S. J. Kang),권오준(O.-J. Kwon),김보우(B.W. Kim),성영권(Y.-K. Sung) 한국진공학회(ASCT) 1992 Applied Science and Convergence Technology Vol.1 No.1
실리콘을 CHF₃/C₂F_6 가스 플라즈마를 이용하여 식각하면 실리콘위에 탄소, 불소 및 산소로 이루어진 잔류막이 형성된다. 이 잔류막을 XPS로 분석한 결과 탄소는 C-Si, C-Si, C-C/H, C-CF_x(x≤3), C-F, C-F₂, C-F₃ 결합을 하고 있으며, 불소는 F-Si, F-C 및 F-O 결합으로 이루어져 있음을 알았다. 한편 산소는 O-Si 및 O-F 결합으로, 실리콘은 Si-Si, Si-C 및 Si-O 결합상태를 나타낸다. 잔류막의 수직분포 연구를 통하여 Si-O 및 Si-C 결합이 탄소와 불소의 결합층 아래에 존재하고, 잔류막의 표면부에 F-O 결합이 분포함을 알았다. 또한 건식식각 변수가 잔류막 형성에 미치는 영향이 조사되었으며 CHF₃/C₂F_6 가스 유량비, RF power 벚 압력 등이 잔류막의 두께, 조성비 및 잔류막의 결합상태에 영향을 미침을 알 수 있었다. Si surfaces exposed to CHF₃/C₂F_6 gas plasmas in reactive ion etching (RIE) have been characterized by X-ray photoelectron spectroscopy (XPS). CHF₃/C₂F_6 gas plasma exposure of Si surface leads to the deposition of residual film containing carbon and fluorine. The narrow scan spectra of C 1s show various bonding states of carbon as C-Si, C-Si, C-C/H, C-CF_x(x≤3), C-F, C-F₂, and C-F₃. The chemical bonding states of fluorine are described with F-Si, F-C, and F-O. And the oxygen and silicon are also detected. The effects of parameters for reactive ion etching as CHF₃/C₂F_6 gas ratio, RF power, and pressure are investigated.