http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
- 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
- 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
RISS 인기검색어
- 검색키워드
- 저자 : 金昌鎰 (검색결과 515 건)
- 무료
- 기관 내 무료
- 유료
-
Cl$_2$ 유도결합 플라즈마를 이용한 SBT 박막의 식각특성
김동표,김창일,Kim, Dong-Pyo,Kim, Chang-Il 대한전기학회 2001 전기학회논문지C Vol.49 No.5
SBT thin films were etched at different content of $Cl_2$ in $Cl_2$/Ar or $Cl_2/N_2$(80%). As $Cl_2$ gas increased in $Cl_2$/Ar or $Cl_2/N_2$ gas plasma. the etch rate decreased. The result indicates that physical puttering of charged particles is dominant to chemical reaction in etching SBT thin films. To evaluate the etching mechanism of SBT thin films, x-ray photoelectron to chemical reaction in etching SBT thin films. To evaluate the etching mechanism of SBT thin films, x-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM) were carried out. From the result of AFM, the rms values of etched samples in Ar only or $Cl_2$ only plasma were higher than that of as-deposited, $Cl_2$/Ar and $Cl_2/N_2$ plasma. This can be illustrated by a decrease of Bi content of nonvolatile etching products (Sr-Cl and Ta-Cl), which are revealed by XPS and SIMS.
-
-
전력계통 구조물의 상태진단용 자가발전 무선 센서 노드 개발 및 평가
김창일 ( Chang Il Kim ),정영훈 ( Young-hun Jeong ),윤지선 ( Ji Sun Yun ),홍연우 ( Youn Woo Hong ),장용호 ( Yong-ho Jang ),최범진 ( Beom-jin Choi ),박신서 ( Shin-seo Park ),손천명 ( Chun Myung Son ),서덕기 ( Duck Ki Seo ),백종후 ( 한국센서학회 2016 센서학회지 Vol.25 No.5
A self-powered piezoelectric energy harvester was developed for the application in wireless sensor node. The energy harvester was evaluated with power generation characteristics for the wireless sensor node for structural diagnosis of the electric power system. The self-powered wireless sensor node was set to measure temperature, vibration frequency of the electric power system. A piezoelectric harvester composed of 7 uni-morph cantilevers (functionalized as 6 generators and 1 vibration sensor) was connected to be an array and revealed to produce significantly high output power of approximately 10 mW at 120 Hz under 3.4 g((1 g = 9.8 m/sec²). The wireless sensor node could work as the electric power generated by the developed piezoelectric harvester.
-
특집 - 한국의 병원건축 : 이대부속 목동병원을 설계하면서 ( Mok-Dong Hospital Ewha-Woman`s University )
김창일 대한건축학회 1994 建築 Vol.38 No.11
국내병원설계 수준은 선진국에 비하여 병원설계 경험은 물론, 각 분야별 전문가(consultant)가 거의 없는 상황에서 건축가는 건축주가 준비해야 할 여러가지 프로그램과 병원 컨설턴트가 전담해야 할 각 과의 배분계획 및 스페이스 프로그램까지도 담당해야 하는 실정이다 보면, 독창적이고, 의사나 환자모두에게 편리한 병원을 설계하기란 결코 쉽지 않다는 것을 느끼게 된다. 그러나. 건축가 스스로 분명한 설계목표를 설정하고. 이를 실현키 위하여 목동병원의 설계에 임하였다.
-
-
Quasi-F 공간과 극소 Quasi-F cover의 역사적 배경
김창일,Kim, Chang-Il 한국수학사학회 2005 Journal for history of mathematics Vol.18 No.4
티코노프공간 X에 대하여 C(X)와 $C^*(X)$는 Riesz-공간이다 C(X)가 순서-코시완비일 필요충분한조건은 X가 quasi-F 공간이고, X가 컴팩트공간이며 QF(X)가 X의 극소 quasi-F cover일 때, C(X)의 순서-코시완비화와 C(QF(X))는 동형이다. 본 논문에서는 quasi-F 공간의 정의와 극소 quasi-F cover의 구성에 관한 동기 및 역사적 배경을 살펴본다. For a Tychonoff space X, C(X) is a Riesz-space. It is well known that C(X) is order-Cauchy complete if and only if X is a quasi~F space and that if X is a compact space and QF(X) is a minimal quasi-F cover of X, then the order- Cauchy completion of C(X) is isomorphic to C(QF(X)). In this paper, we investigate motivations and historical backgrounds of the definition for quasi-spaces and the construction for minimal quasi-F covers.
-
-
김창일,이춘분,Kim, Chang-Il,Lee, Choon-Boon 한국수학사학회 2008 Journal for history of mathematics Vol.21 No.3
본 연구에서는 중학교 2학년 도형의 성질 단원의 증명학습을 세 단계로 나누어 설문을 통하여 학생들이 증명학습에서 겪는 어려움을 조사하였다. 설문 분석 결과 학생들은 증명학습에서 증명의 의미를 이해하지 못해 명제의 참을 판단하는 정도의 간단한 추론도 하지 못할 뿐만 아니라 제시된 증명을 읽고 그것이 증명하려는 명제의 가정과 결론을 파악하지 못한다. 이는 학생들이 명제의 가정과 결론의 의미와 역할을 명확히 이해하지 못하는데서 비롯된다. 따라서 학생들에게 명제의 가정과 결론의 의미와 역할에 대한 지도에 좀 더 역점을 두는것이 필요하다. In this study, we divided the teaching and learning of proof into three steps in the demonstrative geometry of the middle school mathematics. And then we surveyed the student's difficulties in the teaching and learning of proof by using of questionnaire. Results of this survey suggest that students cannot only understand the meaning of proof in the teaching and learning of proof but also they cannot deduce simple mathematical reasoning as judgement for the truth of propositions. Moreover, they cannot follow the hypothesis to a conclusion of the proposition It results from the fact that students cannot understand clearly the meaning and the role of hypotheses and conclusions of propositions. So we need to focus more on teaching students about the meaning and role of hypotheses and conclusions of propositions.
-
김창일,김태형,장의구 한국전기전자재료학회 1996 電氣電子材料學會誌 Vol.9 No.2
The AlSi etching process using the MERIE type reactor carried out with different process parameters such as C1$_{2}$ and N$_{2}$ gas flow rate, RF power and chamber pressure. The etching characteristics were evaluated in terms of etch rate, selectivity, uniformity and etched profile. As the N2 gas flow rate is increased, the AlSi etch rate is decreased and uniformity has remained constant within .+-.5%. The etch rate is increased and uniformity is decreased, according to increment of the C1$_{2}$ gas flow rate, RF power and chamber pressure. Selective etching of TEOS with respect to AlSi is decreased as the RF power is increased while it is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, on the other hand, selective etching of photoresist with respect to AlSi is increased by increment of the C1$_{2}$ gas flow rate and chamber pressure, it is decreased as the N$_{2}$ gas flow rate is increased.
-
Cl$_2$/Ar 가스 플라즈마에 $O_2$ 첨가에 따른 Pt 식각 특성 연구
김창일,권광호 대한전자공학회 1999 電子工學會論文誌, D Vol.d36 No.5
Pt박막의 ICP 식각을 위한 Cl\sub 2 \/Ar 가스 플라즈마에 O\sub 2\ 가스를 첨가하여 Pt 식각 메카니즘을 XPS와 QMS로 조사하였다. 또한 single Langmuir probe를 사용하여 이온전류밀도를 Ar/Cl\sub 2 \/O\sub 2\ 가스 플라즈마에서 측정하였다. O\sub 2\가스 첨가비가 증가할수록 Cl과 Ar species가 급격하게 감소하고 이온전류밀도 역시 감소함을 QMS와 single Langmuir probe로 확인하였다. Pt 식각율의 감소는 O\sub 2\가스 첨가비가 증가할수록 반응성 species와 이온전류밀도의 감소에 기인함을 의미한다. 150 nm/min의 치대 식각율과 2.5의 산화막식각 선택비가 50 sccm의 Ar/Cl\sub 2 \/O\sub 2\ 가수 유량, 600 W의 RF 전력, 125 V의 dc 바이어스 전압 및 10mTorr의 반응로 압력에서 얻었다. Inductively coupled plsama etching of platinum thin film was studied using $O_2$ addition to $Cl_2$/Ar gas plasma. In this study, Pt etching mechanism was investigated with Ar/$Cl_2$ /$O_2$ gas plasma by using XPS and QMS. Ion current density was measured with Ar/$Cl_2$ /$O_2$ gas plasma by using single Langmuir probe. It was confirmed by using QMS and single Langmuir probe that Cl and Ar species rapidly decreased and ion current density was also decreased with increasing $O_2$ gas ratios. These results implied that the decrease of Pt etch rate is due to the decrease of reactive species ans ion current density with increasing $O_2$ gas mixing ratios. A maximum etch rate of 150nm/min and the oxide selectivity of 2.5 were obtained at Ar/$Cl_2$ /$O_2$ flow rate of 50 seem, RF power of 600 W, dc bias voltage of 125 V, and the total pressure of 10 mTorr.
KISS연관 검색어 추천
이 검색어로 많이 본 자료
활용도 높은 자료
