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Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review
Hussain, Shahzada Qamar,Balaji, Nagarajan,Kim, Sunbo,Raja, ayapal,Ahn, Shihyun,Park, Hyeongsik,Le, Anh Huy Tuan,Kang, Junyoung,Yi, Junsin,Razaq, Aamir The Korean Institute of Electrical and Electronic 2016 Transactions on Electrical and Electronic Material Vol.17 No.2
The surface morphology of the front transparent conductive oxide (TCO) films plays a vital role in amorphous silicon thin film solar cells (a-Si TFSCs) due to their high transparency, conductivity and excellent light scattering properties. Recently, plasma textured glass surface morphologies received much attention for light trapping in a-Si TFSCs. We report various plasma textured glass surface morphologies for the high efficiency of a-Si TFSCs. Plasma textured glass surface morphologies showed high rms roughness, haze ratio with micro- and nano size surface features and are proposed for future high efficiency of a-Si TFSCs.
Shahzada Qamar Hussain,Kumar Mallem,Muhammad Ali Khan,Muhammad Quddamah Khokhar,Youngseok Lee,박진주,이경수,김영국,조은철,조영현,이준신 한국전기전자재료학회 2019 Transactions on Electrical and Electronic Material Vol.20 No.1
Excellent surface passivation and carrier selective contact formed by the metal oxide induced junctions is required for future high efficiency silicon solar cells. Due to wide optical bandgap and high work function of molybdenum oxide (MoOx,x < 3) films envisioned as a superior hole selective layer in organic light emitting diodes and photovoltaics applications. We have studied the influence of ultrathin MoOx layer, as a hole-selective contact for high efficiency of silicon heterojunction (SHJ) solar cell. MoOx films can be deposited by atomic layer deposition, magnetron sputtering and thermal evaporation. Due to higher work function of MoOx films, a potential barrier can develop against electrons while it supports the hole carriers flow hence current density of SHJ solar cells can be enhanced. A summary of single layer and solar cell characteristics of MoOx layer for the application of carrier selective contact and dopant-free asymmetric heterocontact (DASH) solar cells is reported.
Shahzada Qamar Hussain,Sunbo Kim,Shihyun Ahn,Hyeongsik Park,Anh Huy Tuan Le,Seungho Lee,Youngseok Lee,Jae Hyeong Lee,이준신 대한금속·재료학회 2014 METALS AND MATERIALS International Vol.20 No.3
ITO and ITO:Zr films with various thicknesses were prepared on glass substrates by RF magnetron sputtering. We observed a decrease in sheet resistance with increasing film thickness that in good agreement with Fuchs-Sondheimer theory. The ITO films doped with ZrO2 (~0.2 wt%) showed improvement in some of the electricaland optical properties of ITO films. The surface roughness of ITO:Zr films increased with increasingfilm thickness. ITO:Zr films with thickness of 120 nm showed highest work function of 5.13 eV, as estimatedfrom XPS data. The ITO:Zr films were employed as front electrodes in HIT solar cells; the best device performancewas found to be: Voc = 710 mV, Jsc = 34.44 mA/cm2, FF = 74.8%, η = 18.30% at a thickness of 120nm. A maximum quantum efficiency (QE) of 89% was recorded for HIT solar cells at a wavelength of700 nm for 120 nm thick ITO:Zr films.
Hussain, Shahzada Qamar,Le, Anh Huy Tuan,Mallem, Kumar,Park, Hyeongsik,Ju, Minkyu,Kim, Yongjun,Cho, Jaehyun,Park, Jinjoo,Kim, Youngkuk,Yi, Junsin Elsevier 2018 APPLIED SURFACE SCIENCE - Vol.447 No.-
<P><B>Abstract</B></P> <P>We report the light scattering characteristics of multi-textured aluminum-doped zinc oxide (AZO) thin films with high optical transmittance, haze ratio and step coverage for amorphous silicon thin film solar cells (a-Si TFSCs). Multi-textured AZO films were deposited on inverted hemisphere textured (IHT) glass surface morphologies. Multi-textured process was used to create modulated surface morphologies with micro and nano-features useful for the light scattering in visible as well as near-infrared wavelength region. Highly transparent IHT glass surface morphologies with high haze ratio were prepared by wet chemical etching of periodic glass substrates. Total transmittance of the IHT glass substrates showed higher average values (91.38–93.40%) as compared to that of bare glass (90.94%) in the visible wavelength region due to lower reflectance. Multi-textured AZO films showed higher rms roughness 100.479 nm, optical transmittance 82.60% and haze ratio 75.09% in the visible wavelength region. X-ray photoelectron spectroscopic analysis of multi-textured AZO thin films was used to study the atomic compositions and chemical binding states. Multi-textured AZO films with high transmittance and haze ratio were used as front transparent conductive oxide layers for the fabrication of a-Si TFSCs using an absorber layer thickness of 400 nm. Multi-textured AZO films deposited on the optimal textured glass surface morphologies yield the maximum performance of a-Si TFSCs as; V<SUB>oc</SUB> = 871 mV, J<SUB>sc</SUB> = 16.55 mA/cm<SUP>2</SUP>, FF = 66.6% and η = 9.61%. An enhancement of photocurrent was noticed from 15.64 to 16.55 mA/cm<SUP>2</SUP> for the a-Si TFSCs deposited on as deposit AZO to optimal textured AZO films.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Micro-featured IHT glass surfaces with high transmittance, haze ratio were prepared. </LI> <LI> Multi-textured AZO films were deposited on IHT glass surface morphologies. </LI> <LI> XPS analysis of AZO films revealed Zn 2p, O 1s and C 1s as the dominating peaks. </LI> <LI> Increase in J<SUB>sc</SUB> upto 16.55 mA/cm<SUP>2</SUP> was related to light scattering in vis-NIR region. </LI> <LI> We propose multi-textured AZO films for future high efficiency silicon TFSCs. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>
Hussain, Shahzada Qamar,Le, Anh Huy Tuan,Mallem, Kumar,Park, Hyeongsik,Ju, Minkyu,Lee, Sunhwa,Cho, Jaehyun,Lee, Youngseok,Park, Jinjoo,Cho, Eun-Chel,Lee, Youn-Jung,Kim, Youngkuk,Yi, Junsin Elsevier 2018 SOLAR ENERGY -PHOENIX ARIZONA THEN NEW YORK- Vol.173 No.-
<P><B>Abstract</B></P> <P>We report an efficient light trapping for maskless large area randomly textured glass structures with various haze ratios in silicon thin film solar cells. By well controlling the ratio of buffered hydrofluric acid (BHF) and sulfuric acid (H<SUB>2</SUB>SO<SUB>4</SUB>), we were able to prepare the randomly textured maskless glass structures with high transmittance above 90% and variable haze ratio from 20.79 to 54.78% in the visible wavelength (380–800 nm) region. It was observed that haze ratio of textured glass was dependent on feature size, etching depth and rms roughness. Multi-textured aluminum-doped zinc oxide (AZO) films were deposited on textured glass structures showed high transmittance (83.78–85.06)% and haze ratio (45.03–65.05)% in visible wavelength region. An enhancement in haze ratio of multi-textured AZO films was due to an increase of rms roughness from 16.4 to 185.5 nm as shown by 3D-alpha step profiler images. Multi-textured AZO films deposited on various textured glass superstrates were employed as a front transparent conductive oxide (TCO) layer for the fabrication of amorphous silicon (a-Si) thin film solar cells (TFSCs). The a-Si TFSCs deposited on structure-C glass showed the maximum performance as; open circuit voltage = 869 mV, short circuit current density = 16.68 mA/cm<SUP>2</SUP>, fill factor = 67.8% and efficiency = 9.79%. An enhancement of photocurrent was noticed from 15.64 to 16.68 mA/cm<SUP>2</SUP> for as deposited a-Si TFSCs to structure-C based a-Si TFSCs.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Maskless textured glass structures with high transmittance and variable haze ratio are prepared. </LI> <LI> Multi-textured AZO films showed high transmittance, variable haze ratio and modulated surfaces. </LI> <LI> Haze ratio of textured glass was dependent on feature size, etching depth and rms roughness. </LI> <LI> Enhancement of J<SUB>sc</SUB> in a-Si TFSCs upto 16.68 mA/cm<SUP>2</SUP> was related to light trapping invis-NIR wavelength region. </LI> <LI> We propose maskless textured glass with variable haze ratio for future high efficiency Si TFSCs. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>
Hussain, Shahzada Qamar,Oh, Woong-Kyo,Kim, Sunbo,Ahn, Shihyun,Le, Anh Huy Tuan,Park, Hyeongsik,Lee, Youngseok,Dao, Vinh Ai,Velumani, S,Yi, Junsin American Scientific Publishers 2014 Journal of nanoscience and nanotechnology Vol.14 No.12
<P>Pulsed DC magnetron sputtered indium tin oxide (ITO) films deposited on glass substrates with lowest resistivity of 2.62 x 10(-4) ω x cm and high transmittance of about 89% in the visible wavelength region. We report the enhancement of ITO work function (φ(ITO)) by the variation of oxygen (O2) flow rate and N2O surface plasma treatment. The φ(ITO) increased from 4.43 to 4.56 eV with the increase in O2 flow rate from 0 to 4 sccm while surface treatment of N2O plasma further enhanced the ITO work function to 4.65 eV. The crystallinity of the ITO films improved with increasing O2 flow rate, as revealed by XRD analysis. The ITO work function was increased by the interfacial dipole resulting from the surface rich in O- ions and by the dipole moment formed at the ITO surface during N2O plasma treatment. The ITO films with high work functions can be used to modify the front barrier height in heterojunction with intrinsic thin layer (HIT) solar cells.</P>
Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review
Shahzada Qamar Hussain,Nagarajan Balaji,Sunbo Kim,Jayapal Raja,Shihyun Ahn,Hyeongsik Park,Anh Huy Tuan Le,강준영,Junsin YI,Aamir Razaq 한국전기전자재료학회 2016 Transactions on Electrical and Electronic Material Vol.17 No.2
The surface morphology of the front transparent conductive oxide (TCO) films plays a vital role in amorphous silicon thin film solar cells (a-Si TFSCs) due to their high transparency, conductivity and excellent light scattering properties. Recently, plasma textured glass surface morphologies received much attention for light trapping in a-Si TFSCs. We report various plasma textured glass surface morphologies for the high efficiency of a-Si TFSCs. Plasma textured glass surface morphologies showed high rms roughness, haze ratio with micro- and nano size surface features and are proposed for future high efficiency of a-Si TFSCs.
Surface Passivation Schemes for High-Efficiency c-Si Solar Cells - A Review
Balaji, Nagarajan,Hussain, Shahzada Qamar,Park, Cheolmin,Raja, Jayapal,Yi, Junsin,Jeyakumar, R. The Korean Institute of Electrical and Electronic 2015 Transactions on Electrical and Electronic Material Vol.16 No.5
To reduce the cost of solar electricity, the crystalline-silicon (c-Si) photovoltaic industry is moving toward the use of thinner wafers (100 μm to 200 μm) to achieve a high efficiency. In this field, it is imperative to achieve an effective passivation method to reduce the electronic losses at the c-Si interface. In this article, we review the most promising surface passivation schemes that are available for high-efficiency solar cells.