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Next Generation Flexible Antennas for Radio Frequency Applications
Aamir Razaq,Asim Ali Khan,Unsa Shakir,Asim Arshad 한국전기전자재료학회 2018 Transactions on Electrical and Electronic Material Vol.19 No.5
In the era of modern disposable electronic technology, fl exible substrate materials are excessive in demand due to foldable,bendable and stretchable choices. This paper reviews the research undertaken on fl exible substrates particularly employed inhigh-tech applications of radio frequency and antenna design technologies. Irrespective of traditional applications, naturalfi brils based substrates are considered most promising candidates as substrates for next-generation electronic applicationsdue to abundant, low profi le, light-weight, fl exible and environment safe characteristics. This paper also presents a comprehensivestudy of the design and methods that have been applied to use mentioned materials in radio frequency applications. Several challenges are highlighted in the large-scale production and deployment of these technologies in real-world systems.
Muhammad Quddamah Khokhar,Shahzada Qamar Hussain,Duy Phong Pham,박형식,Ishrat Sultana,Aamir Razaq,G.T. Chavan,김용국,조은철,이준신 한국물리학회 2020 Current Applied Physics Vol.20 No.8
We report the influence of reactive oxygen (O2) and argon (Ar) plasma based ITO:Zr bi-layers for silicon heterojunction (SHJ) solar cells. The purpose of reactive O2 sputtered ITO:Zr was to improve the Hall mobility and work function while the Ar based ITO:Zr films play an important role to maintain good electrical characteristics. The thickness of reactive O2 based ITO:Zr films was fixed at 15 nm while Ar based films was varied from 65 to 125 nm, respectively. ITO:Zr bi-layers with the thickness of 15/105 nm deposited by O2 and Ar plasma, respectively, showed lowest resistivity of 2.358 × 10−4 Ω cm and high Hall mobility of 39.3 cm2/V · s. All ITO:Zr bi-layers showed an average transmittance of above 80% in the visible wavelength (380–800 nm) region. Work function of ITO:Zr bi-layers was calculated from the X-ray photoelectron spectroscopic (XPS) data. The ITO:Zr work function was enhanced from 5.3 eV to 5.16 eV with the variation of ITO:Zr bi-layers from 15/65 to 15/ 125 nm, respectively. Front barrier height in SHJ solar cells can be modified by using TCO films with high work function. The SHJ solar cells were fabricated by employing the ITO:Zr bi-layer as front anti-reflection coating. The SHJ solar cells fabricated on ITO:Zr bi-layer with the thickness of 15/105 nm showed the best photo-voltage parameters as; Voc = 739 mV, Jsc = 39.12 mA/cm2, FF = 75.97%, η = 21.96%.
Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review
Shahzada Qamar Hussain,Nagarajan Balaji,Sunbo Kim,Jayapal Raja,Shihyun Ahn,Hyeongsik Park,Anh Huy Tuan Le,강준영,Junsin YI,Aamir Razaq 한국전기전자재료학회 2016 Transactions on Electrical and Electronic Material Vol.17 No.2
The surface morphology of the front transparent conductive oxide (TCO) films plays a vital role in amorphous silicon thin film solar cells (a-Si TFSCs) due to their high transparency, conductivity and excellent light scattering properties. Recently, plasma textured glass surface morphologies received much attention for light trapping in a-Si TFSCs. We report various plasma textured glass surface morphologies for the high efficiency of a-Si TFSCs. Plasma textured glass surface morphologies showed high rms roughness, haze ratio with micro- and nano size surface features and are proposed for future high efficiency of a-Si TFSCs.
Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review
Hussain, Shahzada Qamar,Balaji, Nagarajan,Kim, Sunbo,Raja, ayapal,Ahn, Shihyun,Park, Hyeongsik,Le, Anh Huy Tuan,Kang, Junyoung,Yi, Junsin,Razaq, Aamir The Korean Institute of Electrical and Electronic 2016 Transactions on Electrical and Electronic Material Vol.17 No.2
The surface morphology of the front transparent conductive oxide (TCO) films plays a vital role in amorphous silicon thin film solar cells (a-Si TFSCs) due to their high transparency, conductivity and excellent light scattering properties. Recently, plasma textured glass surface morphologies received much attention for light trapping in a-Si TFSCs. We report various plasma textured glass surface morphologies for the high efficiency of a-Si TFSCs. Plasma textured glass surface morphologies showed high rms roughness, haze ratio with micro- and nano size surface features and are proposed for future high efficiency of a-Si TFSCs.