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      • KCI등재

        상 변화 메모리 재료 내의 Ga 주입에 미치는 GaGe 스퍼터링 전력의 영향

        정순원,이승윤,Jung, Soon-Won,Lee, Seung-Yun 한국전기전자재료학회 2015 전기전자재료학회논문지 Vol.28 No.5

        The phase change memory material is an active element in phase change memory and exhibits reversible phase transition behavior by thermal energy input. The doping of the phase change memory material with Ga leads to the increase of its crystallization temperature and the improvement of its amorphous stability. In this study, we investigated the effect of GaGe sputtering power on the formation of the phase change memory material including Ga. The deposition rate linearly increased to a maximum of 127 nm and the surface roughness remained uniform as the GaGe sputtering power increased in the range from 0 to 75 W. The Ga concentration in the thin film material abruptly increased at the critical sputtering power of 60 W. This influence of GaGe sputtering power was confirmed to result from a combined sputtering-evaporation process of Ga occurring due to the low melting point of Ga ($29.77^{\circ}C$).

      • 유전 알고리즘을 이용한 퍼지 패턴 매칭 분류기의 설계와 응용

        정순원,박귀태,Jung, Soon-Won,Park, Gwi-Tae 대한전자공학회 1996 전자공학회논문지-B Vol.b33 No.1

        본 논문에서는 새로운 퍼지 패턴 매칭 분류기(fuzzy pattern matching classifier) 설계 방법을 제안하였다. 기존의 퍼지 패턴 매칭 분류기를 설계함에 있어 분류기의 성능에 결정적인 영향을 미치는 소속 함수 (membership functions)의 모양과 개수에 대한 정확한 정보를 알 수 없었다. 따라서 소속 함수를 구하기 위하여 시행 착오(trial-error)법 혹은 경험에 의존하는(heuristic) 방법이 사용되어 왔다. 그러나 이러한 방법은 다양한 종류의 패턴에 대하여 적용하기에는 한계가 있다. 본 논문에서는 유전 알고리즘을 사용하여 분류 에러를 최소로 줄이는 소속 함수의 적절한 모양과 개수를 찾기 위한 새로운 방법을 제안한다. 유전 알고리즘(genetic algorithms)은 진화라는 생물학적 모델을 기초로한 통계적 알고리즘의 한 부류이다. 이는 여러 함수 최적화 문제에 적용되어 최적 혹은 최적 근처의 해를 찾아 준다. 본 논문에서 유전 알고리즘은 분류 에러에 반비례하는 적합도 함수(fitness function)를 기본으로 소속 함수의 모양과 개수를 결정하는데 쓰인다. 유전 알고리즘에 있어서의 스트링은 소속 함수를 결정하게 되며 인식 결과는 다음 세대의 재생(reproduction) 연산에 영향을 미치게 된다. 제안되는 방법을 타이어 접지면 패턴과 필기체 영문자 인식에 적용하여 보았다. 실험 결과는 본 방법이 유용함을 보여준다. A new design scheme for the fuzzy pattern matching classifier (FPMC) is proposed. in conventional design of FPMC, there are no exact information about the membership function of which shape and number critically affect the performance of classifier. So far, a trial and error or heuristic method is used to find membership functions for the input patterns. But each of them have limits in its application to the various types of pattern recognition problem. In this paper, a new method to find the appropriate shape and number of membership functions for the input patterns which minimize classification error is proposed using genetic algorithms(GAs). Genetic algorithms belong to a class of stochastic algorithms based on biological models of evolution. They have been applied to many function optimization problems and shown to find optimal or near optimal solutions. In this paper, GAs are used to find the appropriate shape and number of membership functions based on fitness function which is inversely proportional to classification error. The strings in GAs determine the membership functions and recognition results using these membership functions affect reproduction of next generation in GAs. The proposed design scheme is applied to the several patterns such as tire tread patterns and handwritten alphabetic characters. Experimental results show the usefulness of the proposed scheme.

      • KCI등재후보

        Local min/max 연산을 이용한 필기체 숫자의 방향특징 추출

        정순원,박중조,Jung, Soon-Won,Park, Joong-Jo 한국융합신호처리학회 2009 융합신호처리학회 논문지 (JISPS) Vol.10 No.1

        본 논문에서는 local min/max 연산을 이용한 필기체 숫자의 방향특징 추출 기법을 제안한다. 숫자의 방향특징은 숫자를 이루는 선에서 수평, 수직 및 두 대각방향인 4개 방향의 선들로 구성된 방향선분 영상으로부터 구해진다. Kirsch 마스크를 사용하는 기존의 방향특징 추출기법은 에지형태인 두 겹으로 된 방향선분 영상을 생성하는데 반해 본 논문에서 제시하는 방법은 방향성 수축연산을 사용하여 한 겹으로 된 방향선분 영상을 생성한다. 본 방향성 수축연산을 숫자영상에 적용하기 위해서는 먼저 세선화, 영상 팽창 등의 전처리가 필요하지만 이 방법은 숫자를 이루는 선 자체와 더욱 유사한 형태를 갖는 방향선분을 제공한다. 우리가 구하고자 하는 [$4{\times}4$] 크기인 4개의 방향특징은 4개의 방향선분 영상으로부터 조닝방법을 통해 구해진다. 보다 높은 필기체 숫자인식을 얻기 위해, 본 연구에서는 우리가 제안한 방향특징에 기존의 Kirsch 방향특징과 오목특징을 결합한 다중특징을 사용하였다. 본 숫자 특징에 의한 인식률을 테스트를 위해 오류역전파 알고리즘으로 학습되는 다층퍼셉트론 신경회로망을 인식기로 사용하였으며, Concordia 대학의 CENPARMI 숫자 데이터베이스를 사용하여 실험한 결과 98.35%의 인식률을 얻을 수 있었다. In this paper, we propose a directional feature extraction method for off-line handwritten numerals by using the morphological operations. Direction features are obtained from four directional line images, each of which contains horizontal, vertical, right-diagonal and left-diagonal lines in entire numeral lines. Conventional method for extracting directional features uses Kirsch masks which generate edge-shaped double line images for each direction, whereas our method uses directional erosion operations and generate single line images for each direction. To apply these directional erosion operations to the numeral image, preprocessing steps such as thinning and dilation are required, but resultant directional lines are more similar to numeral lines themselves. Our four [$4{\times}4$] directional features of a numeral are obtained from four directional line images through a zoning method. For obtaining the higher recognition rates of the handwrittern numerals, we use the multiple feature which is comprised of our proposed feature and the conventional features of a kirsch directional feature and a concavity feature. For recognition test with given features, we use a multi-layer perceptron neural network classifier which is trained with the back propagation algorithm. Through the experiments with the CENPARMI numeral database of Concordia University, we have achieved a recognition rate of 98.35%.

      • KCI등재

        Pt/LiNbO<sub>3</sub>/AlN/Si(100) 구조를 이용한 MFIS 커패시터의 전기적 특성

        정순원,김광호,Jung, Soon-Won,Kim, Kwang-Ho 한국전기전자재료학회 2004 전기전자재료학회논문지 Vol.17 No.12

        Metal-ferroelectric-insulator-semiconductor(WFIS) capacitors using rapid thermal annealed LiNbO$_3$/AlN/Si(100) structure were fabricated and demonstrated nonvolatile memory operations. The capacitors on highly doped Si wafer showed hysteresis behavior like a butterfly shape due to the ferroelectric nature of the LiNbO$_3$ films. The typical dielectric constant value of LiNbO$_3$ film in the MFIS device was about 27, The gate leakage current density of the MFIS capacitor was 10$^{-9}$ A/cm$^2$ order at the electric field of 500 kV/cm. The typical measured remnant polarization(2P$_{r}$) and coercive filed(Ec) values were about 1.2 $\mu$C/cm$^2$ and 120 kV/cm, respectively The ferroelectric capacitors showed no polarization degradation up to 10$^{11}$ switching cycles when subjected to symmetric bipolar voltage pulses of 1 MHz. The switching charges degraded only by 10 % of their initial values after 4 days at room temperature.e.

      • UV 센서 응용을 위한 SiC MIS 소자에 관한 연구

        구경완(Kyung一Wan Koo),정순원(SoonWon Jung) 호서대학교 공업기술연구소 2006 공업기술연구 논문집 Vol.25 No.1

        In this paper, we propose aluminum nitride(AlN) thin film as gate insulating material instead of SiC )2 on 6H~SiC MIS devices. For quite a low lattice misfit with SiC, AIN is as attractive as new gate insulating material in SiC devices. The fabrication of aluminium nitride (AIN) films directly on 6 H-S 1 ᄂ(0001) substrates by reactive magnetron sputtering method has been performed with rapid thermal annealing at a temperature range 01 ZOO 1000 °C in nitrogen ambient for enhancement of crystallization of films. The structural properties of AIN films on 6H-SiC(0001) by RTA analysed by XRD(X-Ray diffraction). The A1N(0002) peaks was clearly found. The dielectric constant of deposited films was obtained as around 8.4 from the accumulation region of capacitance-voltage curve. It is almost the same value with the bulk AIN. Also, the gate leakage current density of the MIS capacitor was 10 9 A/cm2 order within the electric field of 2 MV/cm. The amount of Djt was evaluated as about 5X1010 eV_1cm at a location of 0.5 eV from the midgap.

      • KCI등재후보

        사이버공간에서 靑少年 保護를 위한 規制論

        鄭淳元(Jung Soon-won) 미국헌법학회 2007 美國憲法硏究 Vol.18 No.1

        This paper is reviews the Acts and judical precedents of America on regulations for child protection in cyberspace. The Internet was first used in America, and consequently encountered the unprecedented legal problems regarding children. The progress made in the American legal system regarding child protection in cyberspace can thus serve as a guideline for Korea's cyberspace child protection act. This issue is clearly not one that has been addressed by the U.S. alone, due to the very nature of cyberspace, this paper therefore reviews regulations from an international perspective too. In America, formally enacted the "Communication Decency Act(CDA)" in the late 1990's, and the Supreme court delivered seven separate decisions within a 10 year period on the constitutionality of said act. A currently debated issue is the balance between freedom of speech and child protection interests for the enactment of a new act regarding children's protection. This issue is not only addressed by the federal government but also by each state, which can enact their own cyberspace protection laws. It is addressed at a more immediate level by schools and in the home. In brief, it establishes a standard regarding the issue of regulation and whether it is a matter of national-regulation or self-regulation. We usually think of American regulation principles as conforming to the latter. However, it is important to pay attention to the role and responsibility of home, school, society and nation as the subject of obligation for children's protection. Self-regulation is a more effective means of control, because the rights of child custody are based in the home, so it restricts intervention at a national level. The parent is responsible for the regulation of child access to harmful content on the internet. Schools are responsible for the education and care of students, and as schooling is a required public service, they can adequately implement national regulations. Finally, the nation must provide administrative and financial support to the internet service industry, as the national regulation of cyberspace is a physical impossibility. Thus, the effective means of self-regulation is by the internet service provider or its association.

      • KCI우수등재

        사회 · 인구학적 요인과 시간활동양상에 따른 톨루엔 개인노출의 영향요인 분석

        정순원(Soon-Won Jung),이석용(Seok-Yong Lee),김현정(Hyun jeong Kim),최욱희(Wookhee Choi),김수진(Suejin Kim),유승도(Seungdo Yu),양원호(Wonho Yang) 한국환경보건학회 2017 한국환경보건학회지 Vol.43 No.2

        Objectives: Exposure to hazardous air pollutants could be affected by sociodemographic factors such as age, gender and more. Information on time spent in microenvironments has a critical role in exposure assessment. The purpose of this study was to analyze the exposure pathways which influence personal exposure through timeactivity patterns and sociodemographic factors. Methods: A total of 379 subjects were collected from the second term of the Korean National Environmental Health Survey. A questionnaire survey in relation to sociodemographic factors and a time-activity diary were carried out for personal exposure to toluene. Focusing on personal exposure to toluene, factors affecting personal exposure were analyzed using multiple regression analysis. Results: Participants spent their time in an indoor house for 16.8±4.0 hr, workplace or school 2.3±3.5 hr, and other indoor 2.1±2.2 hr. Sociodemographic factors were significantly different among each personal exposure and microenvironment. Time of staying at an office turned out to be a main factor from point of exposure in exposure pathway using multiple regression analysis. As a result, this means that exposure may be different according to the time of staying in each microenvironment. Conclusions: Personal exposure to air pollutants might be decided by time-activity pattern indicating when, where, and which activities people pursue, as well as individual sociodemographic factors.

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