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권봉수,김진성,박영록,안정호,문학기,정창룡,허욱,박지수,이내응,이성권 한국표면공학회 2009 한국표면공학회 학술발표회 초록집 Vol.2009 No.-
In this study, the deformation and etch characteristics of ArF and EUV photoresists were compared in a dual frequency superimposed capacitively coupled plasma (DFS-CCP) etcher systems using CF₄/O₂/Ar and CF₄/CHF₃/O₂/Ar mixture gas chemistry which are typically used for BARC open and Si₃N₄ etching chemistry, respectively. Etch rate of the resists tend to increase with low-frequency source power (PLF) and high-frequency source (fHF). The etch rate of ArF resist was higher than that of EUV resist.
권봉수,이혜림,이내응,김창영,최치규 한국물리학회 2013 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.62 No.1
Highly selective nanoscale etching of a low-dielectric constant (low<sub>-</sub><i>k</i>) organosilicate (SiCOH) layer using a mask pattern of chemical-vapor-deposited (CVD) amorphous carbon layer (ACL) was carried out in CF<sub>4</sub>/C<sub>4</sub>F<sub>8</sub>/Ar dual-frequency superimposed capacitively-coupled plasmas. The etching characteristics of the SiCOH layers, such as the etch rate, etch selectivity, critical dimension (CD), and line edge roughness (LER) during the plasma etching, were investigated by varying the C<sub>4</sub>F<sub>8</sub> flow rate. The C<sub>4</sub>F<sub>8</sub> gas flow rate primarily was found to control the degree of polymerization and to cause variations in the selectivity, CD and LER of the patterned SiCOH layer. Process windows for ultra-high etch selectivity of the SiCOH layer to the CVD ACL are formed due to the disproportionate degrees of polymerization on the SiCOH and the ACL surfaces.
임봉수,김형진,권충진 대전대학교 환경문제연구소 2007 환경문제연구소 논문집 Vol.11 No.-
This survey was accomplished to compare the characteristics of water quality and algae at the Daechung Dam with those at its regulating reservoir from the year 2003 to 2005. In the case of Daechung Dam, three sites, such as the area near dam body, the Mooneui intake station, and Chudong intake station, were selected averaged data were used for the comparison. The water quality of the Daechung Dam are an follows; temperature is from 4 to 25℃(average 15), pH is from 7.3 to 8.6(average 7.9), DO is from 5.7 to 13.0mg/L(average 9.9), BOD is from 0.7 to 1.7mg/L(average 1.1), COD is from 2.5 to 4.4mg/L (average 3.1), SS is from 1.1 to 9.8mg/L(average 3.2), total coliform is from 0 to 37MPN/100mL(average 11), total phosphorus is from 0.008 to 0.074mg/L(average 0.022) and total nitrogen is from 1.087 to 2.175mg/L(average 1.492). The water quality of regulating reservoir are an follows; temperature is from 1.0 to 24.0℃(average 13), pH is from 6.7 to 8.2(average 7.6), DO is from 5.9 to 13.2mg/L(average 9.2), BOD is from 0.3 to 1.8mg/L(average 0.8), COD is from 2.4 to 5.3mg/L(average 3.8), SS is from 1.2 to 50mg/L(average 9.0), total coliform is from 0 to 260MPN/100mL(average 56), total phosphorus is from 0.005 to 0.224mg/L(average 0.04) and total nitrogen is from 1.123 to 5.227mg/L (average 2.3). The water quality of regulating reservoir had been the Class Ⅱ raw water criteria ein years ago, but it has been improved to Class I recently. Whereas the water quality of the Daechung Dam has been maintained as Ⅱ except COD.
감염성 폐기물이 주입된 병원폐수 처리시설의 공정개선에 따른 처리효율 평가
임봉수,김도영,권충진,길태형 대전대학교 환경문제연구소 2008 환경문제연구소 논문집 Vol.12 No.-
The average BOD concentration was found to be about 269mg/L before a process innovation, but after the innovation, it became 30mg/L, which satisfied the effluent standard of 120mg/L. The removal effluent standard of 120mg/L. The removal efficiency was about 60~80%, and the concentration of the treated water was found th be low. after the process innovation, the average COD concentration was 29mg/L, and the CODmn removal efficiency became low to the level of about 65~76%, which was found lower than the effluent standard of 130mg/L. After the process innovation the SS average concentration of the treated water was 13mg/L, which was lower than that before the innovation (32mg/L). By the activated sludge process innovation, the SS removal efficiency was improved to be 30~70%. The average concentration of total coliform before the process innovation was 6100 count/mL because an Activated sludge process only occasionally pass over the allowed standard(The average number of the total coliform of Activated sludge process treated water was about 8100 count/mL), UV disinfection process was introduced. after the introduction, the average number of the total coliform was 1800 count/mL, which satisfied the allowed effluent standard of 3000 count/mL.
권충진,김도영,임봉수 대전대학교 환경문제연구소 2011 환경문제연구소 논문집 Vol.15 No.-
We performed water analysis at the water quality measuring points of Gap Stream and Youdenug Stream to examine the water quality impact by the Youdeung Stream inflow to Gap Stream Lake Park due to moving of movable weir. As analytical results, the SS concentration was found to be high during a rainy season, but during a dry season COD and TP concentrations were found to be high. Especially, the TP was higher after the moving of movable weir. From the measuring results of sediments of Gap Stream Lake Park, the concentration of organic matter due to the decrease of flow rate of water was higher than a non-freshwater period, and the downstream concentration of organic matter was found to be higher than the upstream of Lake Park during a fresh water period. The analytical results of water quality for the inflow of Yudeung Stream for maintaining utility water of Daejeon Stream showed no concentration difference according to the points in organic matters and nutrient salts, but the COD and SS concentrations were found to be partially high in the Okgye Bridge outfall. In case of heavy metals they were not mostly detected, so their effects were not high.