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연구개발과제의 직후평가항목에 대한 인식도 조사: 기업부설 연구소를 대상으로
이무신 ( Mu Shin Lee ),손병호 ( Byoung Ho Son ),엄기용 ( Ki Yong Om ),신원준 ( Won Jun Shin ),전현곤 ( Hyun Kon Chun ) 기술경영경제학회 1995 Journal of Technology Innovation Vol.3 No.1
This paper addresses three central decision-making problems frequently encountered in developing evaluation checklists for ex-post evaluation of R&D projects at private R&D centers: 1) what kind of evaluation elements and factors should be included in the evaluation forms? 2) how much weight should be assigned to each evaluation factor and element? and 3) could the same evaluation elements and factors with their weights he applied across all the project types(research, development, and engineering)? To answer these questions, we identified the evaluation elements/factors based on the review of relevant literature and measured the perceptions of researchers, R&D managers, and top managements of the three private R&D centers to get the information about the importance levels of the elements and the weights of the factors for each of the three project types, The findings include that 1) all the evaluation elements derived from the literature exhibited high importance levels, and 2) the importance levels of the elements and the weights of the factors were quite varied along the project types. Theoretical and practical implications of the findings for ex-post evaluation of R&D projects are discussed.
손원무,송종관,윤병우,이명진,Son Won-Mu,Song Jong-Kwan,Yoon Byung-Woo,Lee Myeong-Jin 한국융합신호처리학회 2004 융합신호처리학회 논문지 (JISPS) Vol.5 No.4
자동 지문 인식 과정은 지문의 방향성 추출, 이진화, 세선화, 특징점(끝점, 분기점)추출의 과정을 거치게 되며, 여기서 방향성 추출 이후 이진화는 세선화와 특징점(끝점, 분기점)추출 과정에 많은 영향을 미친다. 잘못된 이진화는 특징점의 오추출율을 증가시킨다. 본 논문에서는 기존의 이진화 과정과 비교하여 개선된 이진화 방법으로 더욱 높은 정확도의 특징점 추출 알고리즘을 제안한다. 이진화 과정을 수행할 때 문제가 되는 임계값을 지문의 방향성과 융선간의 반주기를 이용하여 비교 대상 영역의 밝기를 임계값으로 적용함으로써 더욱 뛰어난 이진화를 수행하여 지문인식의 향상된 처리 과정을 수행할 수 있다. NIST DBI의 지문화상에 적용한 결과 제안하는 이진화 알고리즘이 특징점 추출을 향상 시켰음을 나타내고 있다. Automatic fingerprint identification is a process of direction extraction, binarization, thinning, minutiae extraction of fingerprint identification. In this process, binarization after direction extraction affects a process of thinning and minutiae extraction. The fasle binarization is increased the false minutiae extraction rate. In this paper, we proposed more exact minutiae extraction algorithm with more enhanced binarization method, compared with traditional binarization process. We could have more enhanced results by using the direction and the half distance between ridges as the threshold of binarization process. In an experiment, Fingerprint images from NIST DBI are tested and the result shows that the proposed binarization algorithm increases minutiae extraction.
방향족 폴리(에테르-아미드-이미드)중합체와 합성과 그 특성
안영무,손태원,홍성일,An, Yeong-Mu,Son, Tae-Won,Hong, Seong-Il 한국섬유공학회 1994 한국섬유공학회지 Vol.31 No.7
Three different poly(ether-amide imide)s[PEAI], containing benzophenone, bisphenol A and suifone units, have been syllthesized from corresponding poly(ether-amide-allelic aci(B) s[PEAAA] by means of cyclodehydration which were obtained from the reaction of trimellitic anhydride chloride(TMAC) with 4,4'-bis (m-aminophenoxy) benzophenone, 2,2-bis(4-(m-aminophenoxy) phenyl)propane and 4,4'-bis(m-aminophenoxy) diphenyl sulfone, respectively. It hat bell revealed that all PEAI's are thermally stable (temperatures at 5% weight loss are 480-504℃) and have the glass transition temperatures(in the vicinity of 200℃) suitable to be processed by conventional extrusion or injection molding. And also they show the good solubility to polar organic solvents, such as pyridine, N,N-dimethyl formamide and dimethylsulfoxide.
안영무,손태원,홍성일,An, Yeong-Mu,Son, Tae-Won,Hong, Seong-Il 한국섬유공학회 1990 한국섬유공학회지 Vol.27 No.7
4,4 -bis(maminophe nixy) be nzophenone , 2,2-bis (4- (maminophe noxy) phi nyl) propane and 4,4'-bis (maminoph on oxy) biphenyl sulfone which included ketone, i sopropylide no or sulfone group as well as ether group were synthesized. These three diamine monomers were polymerized with 3, Sp, 4,4Fbenzophenone tetracarboxylic dianhydride at low-temperature. The poly(ether-amic acid) s obtained were conducted by adding acetic anhydride and pyridine cosolvent in polymer dope, viz. chemical cyclodehydration. All resulting poly(ether-imide) s are well soluble in pyridine as well as in organic polar solvents such as DMAC and NMP. They revealed not only good thermal stability(76>500℃) but also suitable glass transition temperatures (-200℃) to be processed by extrusion or injection molding.
Contact Barrier metal용 LPCVD W막의 전기적 특성에 대한 $SiH_4/WF_6$비의 효과
이종무,박원구,임영진,손재현,김형준,Lee, Jong-Mu,Park, Won-Gu,Im, Yeong-Jin,Son, Jae-Hyeon,Kim, Hyeong-Jun 한국재료학회 1993 한국재료학회지 Vol.3 No.6
Conatact barrier metal용 selective W CVD 기술에서 $SiH_4//WF_6$(=R)유량비가 W막의 비저항, contact resistance, 접합주설전류 등의 전기적 특성에 미치는 영향을 $\beta$-W 의 생성에 촛점을 맞추어 조사하였다. R의 증가에 따라 W의 비저항이 증가하는데, 그 주원인은 $\alpha$-W로 부터 $\beta$-W 로의 상변태에 있다. $SiH_{4}$환원에 의한 CVD W에서 생성되는 $\beta$-W 는 산소에 의해서가 아니라 막내에 유입된 Si에 의하여 안정화된다. Si기탄상에 W를 증착할 때에는 R값이 클 경우에 $\beta$-W 가 생성되지만, TiN 기판상에 W를 증착할 때에는 R값이 큰 경우에도 $\beta$-W 가 생성되지 않는 것으로 나타났다. 또한 R이 증가함에 따라 접합누설전류가 증가하는데, 이것은 W-Si계면에 대한 수직방향으로의 Si의 소모뿐만 아니라 수평방향으로의 Si의 소모에도 그 원인이 있는 것으로 보인다. Effects of $SiH_4//WF_6$(=R) ratio on the electrical properties of W films such as resistvity, contact resistance, junction leakage current in the selective W CVD technology for contact barrier metal were investigated with the emphasis on the role of $\alpha$-W Resistivity of W increases with increasing R, which is primarily due to the phase transformation from $\alpha$-W to , $\alpha$-W. $\alpha$-W found in the SiH4 reduced CVD W film is stabilized by Si incorporated into the W film rather than by oxygen. $\alpha$-W is found in the W film deposited on the Si substrate for high R, while $\alpha$-W is not found in the W film deposited on the TiN substrate even for high R. Also junction leakages increase with increasing R, which is caused not only by the vertical Si consumption but also the lateral Si consumption.