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Effect of Artifitial Bleeding on Blood Pressure in Hypophysectomised or Neurohypophysectomised Rats
마츠무라 토미오,박전홍,권종국,Matsumura, Tomio,Park, Jun Hong,Kwun, Jong Kuk The Korean Society of Veterinary Science 1979 大韓獸醫學會誌 Vol.19 No.1
뇌하수체(腦下垂體) 전체(全體) 또는 뇌하수체후엽(腦下垂體後葉)만을 제거(除去)한 쥐에 있어서 방혈(放血)이 혈압(血壓)에 미치는 영향을 관찰하기 위하여 뇌하수체(腦下垂體) 또는 뇌하수체후엽(腦下垂體後葉)을 제거(除去)한 쥐에서 경동맥(頸動脈)을 통하여 체중(體重) kg 당(當) 10ml의 피를 뽑은 다음 physiograph 와 수은주(水銀柱)를 이용한 kymograph를 사용하여 혈압(血壓)을 측정하였던바 아래와 같은 결과를 얻었다. 1. 정상 쥐의 혈압(血壓) 및 hematocrit 값은 수컷이 $162{\pm}4mmHg$, $45{\pm}0.7%$이었고 암컷은 $157{\pm}5mmHg$, $34{\pm}0.6%$이었다(p>0.05). 2. 뇌하수체(腦下垂體)를 제거한 쥐의 혈압(血壓)은 $117{\pm}8mmHg$로서 정상($159{\pm}9mmHg$) 및 뇌하수체후엽(腦下垂體後葉)을 제거한 쥐의 혈압(血壓)($149{\pm}10mmHg$)보다 낮았다(p<0.001). 3. 뇌하수체(腦下垂體) 또는 뇌하수체후엽(腦下垂體後葉)을 제거한 쥐와 정상적(正常的)인 쥐에 있어서 방혈후(放血後)(10ml/kg BW) 혈압(血壓)은 50%이상 감소하였다(p<0.001).
Rethinking Japanese Fascism from the Politics of the Household
웬디 마츠무라 경상대학교 사회과학연구원 2016 마르크스주의 연구 Vol.13 No.4
Debates over Japanese fascism have been framed in the past as an issue of the relationship between the Japanese nation-state qua empire, its political structure, and the ideology of the family-nation. This debate has largely echoed the dominant framing of the prewar Japanese capitalism debate between the Rōnō and the Kōza faction of Marxists who debated the nature of Japanese capitalism and the conditions of readiness of Japanese society for revolutionary struggle, which despite its vast differences, operated from an assumption of Japan’s deviation from normal (English) models of development. In order to go beyond this framework, I turn to a theoretically informed historical inquiry into protectionist policies aimed at reforming ‘all aspects’, as Uno Kōzō put it, of agricultural life following World War I. I focus on the complex relationship between the family, gender relations, imperialism and capitalism during this time of massive reorganization of the metropole-colony relation. Approaching capitalism as a social relation enables us to understand the full significance of the state’s prioritization of the small farming household as the primary unit through which private property relations and national belonging were authorized.
W CMP 공정에서의 연마패드표면 안정화 상태와 그 개선
박재홍,키노시타 마사하루,요시다 코이치,신이치 마츠무라,정해도,Park, Jae-Hong,Kinoshita, Masaharu,Yoshida, Koichi,Matsumura, Shinichi,Jeong, Hae-Do 한국전기전자재료학회 2007 전기전자재료학회논문지 Vol.20 No.12
In this research, the polishing pad for W CMP has been analyzed to understand stabilization of polishing performance. For stabilization of process, the polishing pad condition is one of important factors. The polishing pad plays a key role in polishing process, because it contact with reacted surface of wafer[1]. The physical property of pad surface is ruled by conditioning tool which makes roughness and profile of pad surface. Pad surface affects on polishing performance such as RR(Removal Rate) and uniformity in CMP. The stabilized pad surface has stable roughness. And its surface has high level of wettability which can increase the probability of abrasive adhesion on pad. The result of this research is that the reduction of break-in and dummy polishing process were achieved by artificial machining to make stable pad surface. In this research, urethane polishing pad which is named IC pad(Nitta-Haas Inc.) and has micro pore structure, is studied. Because, this type of pad is the most conventional type.