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정연태 ( Yeon Tae Jeong ),이은주 ( Eun Ju Lee ),박정영 ( Jeong Yeong Park ) 한국화상학회 2001 한국화상학회지 Vol.7 No.2
The addition of the acid amplifier to a chemically amplified photoesist consisting of photoacid generator and acid-sensitive polymer results in the improvement of photosensitivity due to the amplified generation of catalytic acid molecules as a result of the decomposition of acid amplifiers. We synthesized and evaluated 4-hydroxy-4`-tosyloxy isopropylidene dicyclohexane(AA-1) and 4,4`-ditosyloxy isopropylidene dicyclo-hexane (AA-2) as novel acid amplifiers. The acid amplifiers(AA-1, AA-2) showed reasonable thermal stability for resist processing temperature. tort-Butyl methacrylate hompolymer(PtBMA) film doped with AA-1 or 2 exhibited much higher photosensitivity than PtBMA film without AA-1 or 2. And AA-1 showed higher effect than AA-2 on enhancing photosensitivity of PtBMA film.