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김진석(J.S. Kim),김한수(H.S. Kim),이동윤(D.Y. Lee),이석우(S.W. Lee),강은구(E.G. Kang) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
In recently, trends of the miniaturization of micro parts machining pattern by laser machining methods have been emerged. However, the conventional laser processing methods have limitations on the resolution. So, e-beam process has been considered as alternatives. Especially, e-beam lithography has been taken accounted of tools for micro and nano pattern. But e-beam lithography equipment have some disadvantages such as lower productivity and smaller processing area etc. than other micro parts machining tools. Therefore we have carried out the development of micro column electron beam lithography equipment for achieving the more higher productivity, lager processing area, and also higher resolution. And then we tried to develop e-beam lithography system with micro column type and using wafer lens for multi column e-beam lithography system and modular e-beam lithography unit. In this paper, we developed the electro static lens system, composed of accelerator lens, condenser lens, objective lens, beam blanker, stigmator and deflector.