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경사각 증착법 이용한 1차원 나노구조체 기반의 가스센서에 관한 연구 동향
이승기(Seunggi Lee),정재한(Jae Han Chung),조윤행(Yun Haeng Cho),조동휘(Donghwi Cho),심영석(Young-Seok Shim) 한국세라믹학회 2023 세라미스트 Vol.26 No.3
One-dimensional (1D) nanostructures allow for precise control of geometrical size and shape, offering greater design flexibility than other nanostructures. 1D nanostructures, in particular, hold immense potential for revolutionizing the gas sensor field, owing to their extensive surface areas conducive to chemical reactions. To harness this potential, researchers have dedicated their efforts to developing fabrication methods that incorporate 1D nanostructures into gas sensor applications. Various techniques have been explored, including hydrothermal synthesis, electrospinning, sol-gel processes, solid-state chemical reactions, vapor-phase transport, and chemical vapor deposition. Despite these advancements, challenges regarding uniformity and reproducibility persist. In this report, we review the glancing angle deposition (GLAD) technique for applying 1D nanostructures to gas sensors and discuss to the potential of GLAD in overcoming existing limitations and driving forward the realm of 1D nanostructure-based gas sensors.
Seo, Seunggi,Yeo, Byung Chul,Han, Sang Soo,Yoon, Chang Mo,Yang, Joon Young,Yoon, Jonggeun,Yoo, Choongkeun,Kim, Ho-jin,Lee, Yong-baek,Lee, Su Jeong,Myoung, Jae-Min,Lee, Han-Bo-Ram,Kim, Woo-Hee,Oh, Il-K American Chemical Society 2017 ACS APPLIED MATERIALS & INTERFACES Vol.9 No.47
<P>The reaction mechanism of area-selective atomic layer deposition (AS-ALD) of Al2O3 thin films using self-assembled monolayers (SAMs) was systematically investigated by theoretical and experimental studies. Trimethylaluminum (TMA) and H2O were used as the precursor and oxidant, respectively, with octadecylphosphonic acid (ODPA) as an SAM to block Al2O3 film formation. However, Al2O3 layers began to form on the ODPA SAMs after several cycles, despite reports that CH3-tenninated SAMs cannot react with TMA. We showed that TMA does not react chemically with the SAM but is physically adsorbed, acting as a nucleation site for Al2O3 film growth. Moreover, the amount of physisorbed TMA was affected by the partial pressure. By controlling it, we developed a new AS-ALD Al2O3 process with high selectivity, which produces films of similar to 60 nm thickness over 370 cycles. The successful deposition of Al2O3 thin film patterns using this process is a breakthrough technique in the field of nanotechnology.</P>
이승기(SeungGi Lee),박진렬(JinLyul-Park),성홍근(HongGun-Sung) 대한전자공학회 2015 대한전자공학회 학술대회 Vol.2015 No.6
Due to global warming issue, There has been discussion about lowering greenhouse gas Since 1980. UNFCCC (United Nations Framework Convention on Climate Change) tried to reduce greenhouse gas emissions with the concept of common but differentiated responsibilities in 1992. The Korean Government is pushing through a plan about technical development of green ships against emissions trading. And private firms are considering introducing green ships. Also, They are considering importing integrated control system and Floating LNG Bunkering Terminal (FLBT) for efficient supply of fuel. Therefore, this paper introduces ‘FLBT Multi Docking Aid System’ can monitor ships in real time for making effort to prevent large accident such as fires and explosions when bring the ship alongside the FLBT.
이승기(SeungGi Lee),김원태(Won-Tae Kim) 한국통신학회 2021 한국통신학회 학술대회논문집 Vol.2021 No.6
화재 감지 시스템은 화재 발생 시 경보를 통해 신속한 안전조치를 가능하게 하여 피해를 최소화하는 필수적인 설비로써 주택에 적용되었다. 하지만, 기존 화재 감지 시스템은 센서의 고장 또는 화재와 유사한 상황이 발생하는 경우 실제로 화재가 발생하지 않았음에도 불구하고 경보를 울리는 경우가 종종 발생한다. 이와 같은 오경보는 시민들에게 안전 불감증을 불러일으키고 무의미한 소방관 출동으로 소방 인력의 낭비와 비용 손실을 발생시키기 때문에 오경보에 강인한 화재 감지 시스템의 필요성이 높아지고 있다. 본 논문에서는 이상 데이터 재학습 기반의 고신뢰 화재 감지 시스템을 제안한다. 제안하는 화재 감지 시스템은 오경보를 발생시키는 이상 데이터를 판별하고 해당 데이터를 적합한 클래스로 레이블링하여 재학습을 통해 지속적으로 정확도를 향상시킨다. 제안한 화재 감지 시스템은 여러 오경보 발생 상황에서 테스트를 수행하였으며, 이상 데이터 재학습을 통해 최대 12%의 성능 향상을 확인하였다.
딥 러닝 알고리즘을 활용한 뇌파 분석 기반 졸음운전 사고예방 시스템
이승기(SeungGi Lee),권용수(YongSu Kwon),박지수(Jisoo Park),윤성진(Seongjin Yun),김원태(Won-Tae Kim) 대한전자공학회 2018 전자공학회논문지 Vol.55 No.3
졸음운전은 운전자의 지각, 인식 및 차량 제어 능력의 현저한 저하를 야기하여 매년 교통사고의 원인에 상당히 기여하고 있는 위험 요인 중의 하나이다. 최근에는 졸음운전으로 인한 사고를 막기 위하여 ADAS 등의 운전 보조 기술들이 적용되거나 운전자의 생체 데이터를 활용한 졸음상태 판단으로 사고를 방지하는 방법들이 대두되고 있다. 특히 뇌파를 이용한 운전자의 졸음운전을 판단하는 기술이 활발하게 연구되고 있다. 본 논문에서는 뇌파를 활용하여 졸음 상태를 효과적으로 판단할 수 있는 딥 러닝 알고리즘을 제안한다. 제안한 알고리즘은 3가지의 운전자 상태를 판단하며, 평균 93%의 정확도를 얻었다. 또한, ADAS 등의 운전 보조 기술에 제안한 알고리즘을 접목하여 졸음운전으로 인한 사고를 방지할 수 있는 시스템을 제시하였다. Drowsy driving which drops the driver"s perception, recognition, and vehicle control ability is one of the fatal factors that cause a lot of traffic accidents each year. Recently, many studies have been researched for applying driver assistant technology like ADAS, as well as using driver"s biometric data to analyze one"s drowsiness in order to prevent accidents from drowsy driving. Especially, the technologies for recognizing the condition of driver’s drowsy driving are actively studied. In this paper, we propose a deep-learning algorithm that can effectively determine drowsiness status using EEG. The proposed algorithm determines the three kinds of driver states and shows an average of 93% accuracy. In addition, we proposed the system which can prevent accidents from drowsiness operation by applying the proposed algorithm to driving assistive technology.
신규 합성 전구체를 이용한 원자층 증착법 기반 텅스텐 박막의 성장 메커니즘 및 박막 물성 비교 연구
이유진(Yujin Lee),서승기(Seunggi Seo),남태욱(Taewook Nam),이현호(Hyunho Lee),윤휘(Hwi Yoon),선상규(Sangkyu Sun),오일권(Il-Kwon Oh),이상훈(Sanghun Lee),서진형(Jin Hyung Seo),석장현(Jang Hyeon Seok),김형준(Hyungjun Kim) 대한전자공학회 2021 대한전자공학회 학술대회 Vol.2021 No.6
Tungsten (W) has a wide range of industrial applications since it has several advantages such as high conductivity, thermal stability, and electromigration durability. We report the properties of plasma-enhanced atomic-layer-deposited (ALD) tungsten (W) thin films. ALD is promising deposition method for obtaining thin films with good conformality, good uniformity, and low impurity contamination, as its growth mechanism is entirely based on self-limited surface reaction. Thus, the choice of an appropriate precursor for ALD is critical for obtaining high-quality films. We comparatively investigate the growth characteristics and film properties using two newly synthesized precursors, tungsten pentachloride (WCl5) and ethylcyclopentadienyltungsten(Ⅴ) tricarbonyl hydride (HEtCpW(CO)₃), and Ar/H₂ plasma as the reactant. Growth characteristics and film properties were significantly affected by ligands of precursors. These results provide fundamental and useful information, with respect to the selection of the suitable precursor, for practical implementation of device fabrication.