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할로겐 플라즈마에 의한 Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> 식각 데미지 연구
장윤창,유찬영,유상원,권지원,김곤호,Jang, Yun Chang,Yoo, Chan Young,Ryu, Sangwon,Kwon, Ji Won,Kim, Gon Ho 한국반도체디스플레이기술학회 2019 반도체디스플레이기술학회지 Vol.18 No.4
Effect of Ge2Sb2Te5 (GST) chalcogen composition on plasma induced damage was investigated by using Ar ions and F radicals. Experiments were carried out with three different modes; the physical etching, the chemical etching, and the ion-enhanced chemical etching mode. For the physical etching by Ar ions, the sputtering yield was obtained according to ion bombarding energy and there was no change in GST composition ratio. In the plasma mode, the lowest etch rate was measured at the same applied power and there was also no plasma induced damage. In the ion-enhanced chemical etching conditions irradiated with high energy ions and F halogen radicals, the GST composition ratio was changed according to the density of F radicals, resulting in higher roughness of the etched surface. The change of GST composition ratio in halogen plasma is caused by the volatility difference of GST-halogen compounds with high energy ions over than the activation energy of surface reactions.
플라즈마 정보인자를 활용한 SiO<sub>2</sub> 식각 깊이 가상 계측 모델의 특성 인자 역할 분석
장윤창,박설혜,정상민,유상원,김곤호,Jang, Yun Chang,Park, Seol Hye,Jeong, Sang Min,Ryu, Sang Won,Kim, Gon Ho 한국반도체디스플레이기술학회 2019 반도체디스플레이기술학회지 Vol.18 No.4
We analyzed how the features in plasma information based virtual metrology (PI-VM) for SiO2 etching depth with variation of 5% contribute to the prediction accuracy, which is previously developed by Jang. As a single feature, the explanatory power to the process results is in the order of plasma information about electron energy distribution function (PIEEDF), equipment, and optical emission spectroscopy (OES) features. In the procedure of stepwise variable selection (SVS), OES features are selected after PIEEDF. Informative vector for developed PI-VM also shows relatively high correlation between OES features and etching depth. This is because the reaction rate of each chemical species that governs the etching depth can be sensitively monitored when OES features are used with PIEEDF. Securing PIEEDF is important for the development of virtual metrology (VM) for prediction of process results. The role of PIEEDF as an independent feature and the ability to monitor variation of plasma thermal state can make other features in the procedure of SVS more sensitive to the process results. It is expected that fault detection and classification (FDC) can be effectively developed by using the PI-VM.
초등학생 태권도 수련활동의 재미요인과 신체적 자기효능감 및 정신건강의 관계
장윤창(Jang, Yun-Chang),박남희(Park, Nam-Hui) 한국체육과학회 2018 한국체육과학회지 Vol.27 No.1
The purpose of this study was to identify the relationship among fun factor, physical self-efficacy, and mental health in Taekwondo practice in elementary school. To this end, third to sixth grade elementary school student, who were living A, S, Y, and H cities in southern Gyeon-gi province, were selected. The participants were practicing Taekwondo more than two years at sixteen different Taekwondo studios and having second or third Poom certificate. The sample size used in convenience sampling, insincere materials being excluded, was 320. Validity of the questionnaire was inspected by the experts’ conference, preliminary inspection, and exploratory factor analysis. The reliability of the questionnaire showed =.705~=.920. Statistical methods used in analysis were frequency analysis in order to identify inter-item consistency, exploratory factor analysis, reliability verification, and correlation analysis using SPSS 21.0 program. Moreover, this study conducted confirmatory factor analysis and structural equation analysis using AMOS 20 program in order to verify the research hypothesis. Through these research methods and procedures, the following results were drawn. First, fun factor in Taekwondo practice in elementary school had a positive influence on physical self-efficacy. Second, fun factor in Taekwondo practice in elementary school had a negative influence on mental health. Third, physical self-efficacy from Taekwondo practice in elementary school had a negative influence on mental health.