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골격성 II급 성장기 환자에서 과개교합 개선 후 하악의 자발적인 성장
송근수,이협수,최동순,장인산,차봉근 대한치과교정학회 2019 대한치과교정학회 임상저널 Vol.9 No.2
A 9-year-old boy presented a skeletal Class Ⅱ facial type, an uprighted upper incisors, and anterior deep bite. He received an interceptive orthodontic treatment using removable active plate with anterior bite block. After 8 months of treatment, the expansion of upper dental arch, labioversion of the upper incisors, decrease of anterior overbite was achieved. The forward growth of the mandible was spontaneously occurred, improving the skeletal Class Ⅱ facial type and large anterior overjet. This case report presents and discusses the effect of anterior bite block applied in mixed dentition patient.
정전효과가 있는 100mm보다 큰 반도체 웨이퍼로의 입자침착
송근수,유경훈,이건형 한국입자에어로졸학회 2009 Particle and Aerosol Research Vol.5 No.1
Particle deposition on a semiconductor wafer larger than 100 mm was studied experimentally and numerically. Particularly the electrostatic effect on particle deposition velocity was investigated. The experimental apparatus consisted of a particle generation system, a particle deposition chamber and a wafer surface scanner. Experimental data of particle deposition velocity were obtained for a semiconductor wafer of 200 mm diameter with the applied voltage of 5,000 V and PSL particles of the sizes between 83 and 495 nm. The experimental data of particle deposition velocity were compared with the present numerical results and the existing experimental data for a 100 mm wafer by Ye et al. (1991) and Opiolka et al. (1994). The present numerical method took into consideration the particle transport mechanisms of convection, Brownian diffusion, gravitational settling and electrostatic attraction in an Eulerian frame of reference. Based on the comparison of the present experimental and numerical results with the existing experimental results the present experimental method for a 200 mm semiconductor wafer was found to be able to present reasonable data.
정전효과가 있는 300 ㎜ 보다 큰 반도체 웨이퍼로의 입자침착 수치해석
송근수(Gen-Soo Song),유경훈(Kyung-Hoon Yoo) 대한설비공학회 2010 대한설비공학회 학술발표대회논문집 Vol.2010 No.6
Particle deposition on a semiconductor wafer larger than 300 mm was studied numerically. In particular the electrostatic effect on particle deposition velocity was investigated. The present numerical method took into consideration the particle transport mechanisms of convection, Brownian diffusion, gravitational settling and electrostaic attraction to characterize particle deposition on a horizontal semiconductor wafer under the laminar flow field. The averaged particle deposition velocities on the upper surface of the wafer were calculated from the particle concentration equation in the Eulerian frame of reference. It was observed from the numerical results that the electrostatic effect of wafer increased the particle deposition velocities. The comparison of the present numerical results with the available experimental data showed relatively good agreement between them.
반도체 클린룸용 배기 열회수식 외기공조시스템의 에너지소비 수치해석
송근수(Gen-Soo Song),유경훈(Kyung-Hoon Yoo),김형태(Hyoung-Tae Kim) 대한설비공학회 2009 대한설비공학회 학술발표대회논문집 Vol.2009 No.-
In recent semiconductor manufacturing clean rooms, in order to improve clean room air quality, air washers are used to remove airborne gaseous contaminants such as NH₃, SOx and organic gases from the outdoor air introduced into clean room. Meanwhile, there is a large amount of exhaust air from a clean room. From an energy conservation point of view, heat recovery is therefore useful for reducing the outdoor air conditioning load for a clean room. Therefore it is desirable to recover heat from the exhaust air and use it to reheat the outdoor air. In the present study, numerical analysis and experiment was conducted to simulate the amount of energy reduction of exhaust air heat recovery type air washer system. The present numerical results showed good agreement with the results of the experimental data.