http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
직류 마그네트론 스퍼터법에 의한 AlNO 복층박막의 제조와 특성
김현후,오동현,백찬수,장건익,최동호,Kim, Hyun-Hoo,Oh, Dong-Hyun,Baek, Chan-Soo,Jang, Gun-Eik,Choi, Dong-Ho 한국전기전자재료학회 2014 전기전자재료학회논문지 Vol.27 No.9
AlNO multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. $Al_2O_3$/AlNO(LMVF)/AlNO(HMVF)/Al/substrate of 4 multi-layer has been prepared in an Ar and ($N_2+O_2$) gas mixture, and $Al_2O_3$ of top layer is anti-reflection layer on double AlNO(LMVF)/AlNO(HMVF) layers and Al metal of infrared reflection layer. In this study, the roughness and surface properties of AlNO thin films were estimated by field emission scanning electron microscopy(FE-SEM). The grain size of AlNO thin films increased with increasing sputtering power. The composition of thin films has been systematically investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 200~1,500 nm. The absorptance of AlNO films shows the increasing trend with swelling ($N_2+O_2$) gas mixture in HMVF and LMVF deposition. The excellent optical performance showed above 98% of absorptance in visible wavelength region.
Simulation and Characteristic Measurement with Sputtering Conditions of Triode Magnetron Sputter
김현후,임기조 한국전기전자재료학회 2004 Transactions on Electrical and Electronic Material Vol.5 No.1
An rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of E×B field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.
RF Bias Effect of ITO Thin Films Reactively Sputtered on PET Substrates at Room Temperature
김현후,Sung Ho Shin 한국전기전자재료학회 2004 Transactions on Electrical and Electronic Material Vol.5 No.3
ITO films were deposited on polyethylene terephthalate substrate by a dc reactive magnetron sputtering using rf bias without substrate heater and post-deposition thermal treatment. The dependency of rf substrate bias on plasma sputter processing was investigated to control energetic particles and improve ITO film properties. The substrate was applied negative rf bias voltage from 0 to -80 V. The composition of indium, tin, and oxygen atoms is strongly depended on the rf substrate bias. Oxygen deficiency is the highest at rf bias of -20 V. The electrical and optical properties of ITO films also are dominated obviously by negative rf bias.
Design of a Valveless Type Piezoelectric Pump for Micro-Fluid Devices
김현후,오진헌,윤재훈,정의환,임기조 한국전기전자재료학회 2010 Transactions on Electrical and Electronic Material Vol.11 No.2
The operation principle of a traveling wave rotary type ultrasonic motor can be successfully applied to the fluidic transfer mechanism of the micro-pump. This paper proposes an innovative valveless micro-pump type that uses an extensional vibration mode of a traveling wave as a volume transportation means. The proposed pump consists of coaxial cylindrical shells that join the piezoelectric ceramic ring and metal body, respectively. In order to confirm the actuation mechanism of the proposed pump model, a numerical simulation analysis was implemented. In accordance with the variations in the exciting wave mode and pump body dimension, we analyzed the vibration displacement characteristics of the proposed model, determined the optimal design condition, fabricated the prototype pump from the analysis results and evaluated its performance. The maximum flow rate was approximately 595 μL/min and the highest back pressure was 0.88 kPa at an input voltage of 130 Vrms. We confirmed that the peristaltic motion of the piezoelectric actuator was effectively applied to the fluid transfer mechanism of the valveless type micro pump throughout this research.