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국제비교를 통한 우리나라 음악과 교육과정의 특성 분석 - 독일 , 미국 , 영국 , 일본 , 프랑스를 중심으로 -
김원명(Won Myoung Kim),민경찬(Kyung Chan Min),양종모(Jong Mo Yang),이내선(Nae Sun Lee),장기범(Ki Beom Jang),주대창(Dae Chang Ju),최은식(Eun Shik Choi),서인정(In Jung Suh) 민족음악학회 2002 음악과 민족 Vol.24 No.-
The main purpose of this research is to get some implications for improvement of school music curriculum of Korea through the analysis of music curriculum in several developed countries. The researchers surveyed the music curriculum of the 5 developed countries, U.S.A., G.B., Japan, Germany and France, which already finished curriculum revision in recent years. The researchers have agreed upon analysing curriculum of each contry with the following four factors -- 1) outline of school education system, 2) time allotment and operation of music class, 3) frames and basic structure of music education curriculum including mission statements and contents of music education, and 4) draw conclusions based on the analysis. The drawn implications are as follow: First, each countries recognized importance of music education and emphasize music class in school education. Second, there are many different points between the curriculum and operation of music class of USA and Europe. In Europe, students should study music class certainly, but in USA, students can choose music class widely. Third, every countries state very persuasively about necessity and what should be of music education. However korean curriculum statements, in comparison of these countries, are very difficult and vague for teacher and students to understand it. Fourth, each countries aim at learning of musical concepts or musicological understanding instead of learning of musical technique. We now get to some suggestions of this research for korean school music education. First, korean music curriculum should be improved adequately. Second, we raise relative importance of music class in school education. Third, we should differentiate the aims of music education for each stages. Finally, there should be more international comparative researches on music curriculum for improvement of our music education.
엔진 생산라인의 착화 시스템 표준화를 위한 범용 ECU 로직 및 운영 소프트웨어 개발에 관한 연구
황인구(In Goo Hwang),명차리(Cha-Lee Myung),박심수(Simsoo Park),이내현(Nae Hyun Lee),이종수(Jong Soo Lee) 한국자동차공학회 2007 한국자동차공학회 춘 추계 학술대회 논문집 Vol.- No.-
It is needed much time and cost for automotive manufacturer to apply various stages of End of Line (EOL) testing to the development, validation, and assembly of their production power-train. The application of EOL at various stages of the assembly line process ensures that family power-trains are produced to a common set of performance and reliability standards. However, the conventional EOL system has been constructed to cover the specific engines in checking the engine startability and diagnostic trouble code (DTC) using the separate ECU and data acquisition equipment which has no cost effectiveness. Therefore, improvement on the productivity of the EOL with universal ECU and control could confirm the quality of production engine and minimize the facility cost for revising period of production line when the additional power-train production would require in future. The purpose of this paper is mainly focused on the development of the real time monitoring system composed of universal ECU and S/W to enhance the productivity and reduce the investment on the EOL.
티타니움 실리사이드 박막의 열안정성에 미치는 기판 실리콘막의 영향
김영욱,이내인,고종우,김일권,안성태,이종식,송세안,Kim, Yeong-Uk,Lee, Nae-In,Go, Jong-U,Kim, Il-Gwon,An, Seong-Tae,Lee, Jong-Sik,Song, Se-An 한국재료학회 1993 한국재료학회지 Vol.3 No.2
실리콘박막의 상부에 고상반응에 의해 형성된 TiS$i_2$ 박막의 응집 거동에 미치는 기판 실리콘의 영향을 조사했다. 폴리실리콘과 어몰퍼스실리콘을 증착상태 또는 어닐링한 상태엣 TiS$i_2$를 형성시키고 90$0^{\circ}C$열처리에 따른 TiS$i_2$의 면저항값의 변화를 조사하고 XRD, SEM 및 TEM에 의한 실리콘의 조직관찰을 행했다. TiS$i_2$응집은 어몰퍼스실리콘 위의 경우가 더욱 심했다. 폴리실리콘을 어닐링하면 TiS$i_2$의 응집은 억제되며 고온에서 어닐링할수록 그 효과가 현저했다. 이는 폴리실리콘의 입도 변화보다는 증착시 존재하는 결함들이 열처리에 의해 감소된 때문이다. 폴리실리콘의 경우는 어닐링 전후에 상관없이 (110)집합조직인 주상정 조직을 갖고 있다. 어몰퍼스실리콘을 결정화시킨 경우는 (111)집합조직를 갖는 등축정 조직을 나타내었다. 실리콘의 표면에너지가 낮은 (111)면이TiS$i_2$ 막의 하부 폴리실리콘에 많이 존재할수록 응집은 촉진된다. Abstract To investigate the effect of underlying Si on the thermal stability of the TiS$i_2$ film, TiS$i_2$ films obtained by the solid-state reaction of the Ti film on as-deposited or on heat-treated poly-silicon and amorphous-silicon were annealed at 90$0^{\circ}C$ for various times. The poly-Si film was evaluated by XRD, SEM and TEM. The thermal stability of the TiS$i_2$ film was evaluated by measuring the sheet resistance and microstructural evolution during furnace annealing. Agglomeration of the TiSi, film occurred more on amorphous-Si than on poly-Si. The thermal stability of the TiS$i_2$ film was improved by annealing poly-Si. The Si layer crystallized from amorphous-Si has an equiaxed structure with the (111) preferred orientation whereas for as-deposited poly-Si has a columnar structure with the (110) orientation. Better thermal stability of the TiS$i_2$ film can be obtained by the higher surface energy of underlying poly-Si.
TiS$i_2$ 박막의 열안정성에 미치는 막 스트레스의 영향
김영욱,김영욱,고종우,이내인,김일권,박순오,안성태,이문용,이종길,Kim, Yeong-Uk,Kim, Yeong-Uk,Go, Jong-U,Lee, Nae-In,Kim, Il-Gwon,Park, Sun-O,An, Seong-Tae,Lee, Mun-Yong,Lee, Jong-Gil 한국재료학회 1993 한국재료학회지 Vol.3 No.1
단결정 실리콘위에 스퍼터법으로 증착된 티타니움막을 급속가열로에서 고상반응에 의해 형성시킨 면저항 1.2 ohm/sq. 내외의 TiS$i_2$ 박막에 있어서 열안정성을 상부절연막의 유무 및 종류에 따라 조사하였다. 상부절연막은 상압 CVD로 증착한 USG(Undoped Silicate Glass, Si$i_2$) 막과 플라즈마 CVD법으로 증착한 PE-SiN(S$i_3$$N_4$)막을 사용했다. 열안정성 평가는 90$0^{\circ}C$에서 시간을 달리하여 TiS$i_2$막, PE-SiN막, USG막의 스트레스는 각각 1.3${\times}{10^{9}}$, 1.25 ${\times}{10^{10}}$, 2.26 ${\times}{10^{10}}$ dyne/c$m^2$의 인장응력을 나타내었다. 응집현상은 TiS$i_2$의 응집현상은 Nabarro-Herring 마이크로 크리프에 의한 원자의 확산관점에서 검토되었다. Abstract The effect of the film stress on the thermal stability of TiSi, films under the dielectric overcoat was investigated. TiS$i_2$ films with the sheet resistance of 1.2 ohm/sq. were produced by a solid-state reaction between sputtered Ti film and single-crystalline Si in an RTA (rapid thermal anneal) machine. Dielectric overcoats such as the USG (Undoped Silicate Glass, Si$O_2$) film and the PE-SiN(S$i_3$$N_4$) film were deposited by AP-CVD and PE-CVD, respectively, on the TiS$i_2$ film. The thermal stability of the TiSi, film was evaluated by changes in the sheet resistance, film stress and microstructure after furnace anneals at 90$0^{\circ}C$. Agglomeration of the TiSi2 film high temperatures results in the increase of sheet resistance and the decrease of tensile stress of TiSi, film. The stress level of the TiSi" PE-SiN and ~SG films at 90$0^{\circ}C$C was 1.3${\times}{10^{9}}$, 1.25 ${\times}{10^{10}}$, 2.26 ${\times}{10^{10}}$ dyne/c$m^2$ in tensile, respectively. Dielectric films deposited by CVD on TiSi, was effective on preventing agglomeration of TiSi,. The PE-SiN film mproved the thermal stability of TiSi, more effectively than the AP-CVD USG film. It is considered that agglomeration of the TiS$i_2$ film under the stress of dielectric overcoat at high temperature can be caused by a diffusional flow of atom called Nabarro-Herring microcreep.reep.
홍내영(Lae-Young Hong),옥인표(In-Pyo Ohk),서정민(Jeong-Min Seo),이내리(Nae-Ri Lee),류길수(Keel-Soo Rhyu) 한국마린엔지니어링학회 2008 한국마린엔지니어링학회 학술대회 논문집 Vol.2008 No.-
Many people visit Korea Maritime University frequently. Since the visitors do not know well about the exact location or the way of university facilities, they are apt to ask someone to location or search the right directions. Although there is a 2D map of campus in online, it is less practical than 3D. In order to make the visitors use the map effectively, we need to improve the navigation system by using 3D. This system will be benefit to search the exact way for visitors at the campus.
홍내영(Lae-Young Hong),옥인표(In-Pyo Ohk),서정민(Jeong-Min Seo),이내리(Nae-Ri Lee),류길수(Keel-Soo Rhyu) 한국항해항만학회 2008 한국항해항만학회 학술대회논문집 Vol.2008 No.공동학술
Many people visit Korea Maritime University frequently. Since the visitors do not know well about the exact location or the way of university facilities, they are apt to ask someone to location or search the right directions. Although there is a 2D map of campus in online, it is less practical than 3D. In order to make the visitors use the map effectively, we need to improve the navigation system by using 3D. This system will be benefit to search the exact way for visitors at the campus.
김영남(Young-Nam Kim),강성철(Sung-Chul Kang),박진성(Jin-Seong Park),이내인(Nae-In Lee),김일권(Il-Kwon Kim),김영욱(Young-Wug Kim) 한국진공학회(ASCT) 1993 Applied Science and Convergence Technology Vol.2 No.1
산화분위기에서의 Ti/SiO₂ 박막의 산화거동 및 계면반응을 조사했다. SiO₂막위에 100㎚의 티타니움을 스퍼터법으로 형성하여 급속가열로(Rapid Thermal Processor)에서 온도를 달리하여 산화시켰다. 산화거동은 박막의 면저항의 측정, 산화막 두께측정, XPS(X-ray Photoelectron Spectroscopy)에 의한 조성분석으로 평가했다. 산화시 티타니움 면저항은 표면에서 산화로 인해 약 500℃ 이상에서 증가하기 시작해서 800℃에서 포화되었다. 이 때 막두께는 약 700℃ 이상에서 약 2배로 증가한 후 일정한 두께를 나타내었다. 이 결과로부터 산화부산물에 도전성물질이 존재하는 것을 알 수 있었다. TEM과 XPS분석결과 400℃ 이상에서 산화시 Ti 표면에서부터 TiO₂가 형성되고 600℃이상에서는 TiO₂와 SiO₂의 계면에 TiO_x의 형성과 Si의 석출이 확인되었다. 석출되는 Si의 양은 온도에 따라 증가했다. The oxidation behavior of the titanium film and the interface between titanium and underlying SiO₂ were investigated. The titanium film, 100 ㎚ thick, sputtered on the SiO₂ film was oxidized at different temperatures using rapid thermal processor (RTP). The oxidation behavior was evaluated by the contactless resistivity measurement and measuring the thickness of the oxidized film. X-ray photoelectron spectroscopy (XPS) was performed for composition analysis of samples. The sheet resistance of the oxidized Ti film increased with oxidation temperature above 500℃ and saturated at 800℃. The oxidized film thickness also increased with temperature, and become about 2 times of orignal thickness of the Ti film above 700℃. This might indicate that conducting oxide film (TiO_x) was formed during oxidation. According to TEM observation and XPS analysis, the Ti film was oxidized above 400℃ from its surface. When it was oxidized above 600℃, the formation of TiO_x and the precipitation of Si occurred at the interface between TiO₂ and SiO₂. The amount of the precipitated Si increased with temperature.