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( N. Menaria ),( R. K. Parmar ),( S. D. Purohit ),( K. S. Nisar ) 호남수학회 2017 호남수학학술지 Vol.39 No.3
By means of the Oberhettinger integral, certain generalized integral formulae involving product of generalized k-Bessel function w (z) and general class of polynomials S [x] are derived, the results of which are expressed in terms of the generalized Wright hypergeometric functions. Several new results are also obtained from the integrals presented in this paper.
Menaria, N.,Parmar, R.K.,Purohit, S.D.,Nisar, K.S. The Honam Mathematical Society 2017 호남수학학술지 Vol.39 No.3
By means of the Oberhettinger integral, certain generalized integral formulae involving product of generalized k-Bessel function $w^{{\gamma},{\alpha}}_{k,v,b,c}(z)$ and general class of polynomials $S^m_n[x]$ are derived, the results of which are expressed in terms of the generalized Wright hypergeometric functions. Several new results are also obtained from the integrals presented in this paper.
Photocatalytic properties of Mn-doped NiO spherical nanoparticles synthesized from sol-gel method
Sankar, S.,Sharma, Sanjeev K.,An, Namhyun,Lee, Hwauk,Kim, Deuk Young,Im, Young Bin,Cho, Yung Duk,Ganesh, R. Sankar,Ponnusamy, S.,Raji, P.,Purohit, L.P. Elsevier 2016 OPTIK -STUTTGART- Vol.127 No.22
<P><B>Abstract</B></P> <P>Mn-doped NiO (NiO:Mn) nanopowders were synthesized from an inexpensive sol-gel method. The XRD peak profile analysis of NiO:Mn nanopowders confirmed the cubic structure. The spherical nanoparticles of NiO:Mn were evaluated from the SEM and TEM analysis and the grain size decreased as the Mn concentration increased. The average crystallite size decreased from 35.44nm to 30.5nm and the bandgap increased from 3.79eV to 3.95eV as the Mn concentration increased from 0wt.% to 4wt.%. The photocatalytic properties of NiO:Mn nanopowders were measured for the lowest and highest Mn dopant concentrations (Mn: 0 & 4wt.%) by using the methylene blue dye under UV illumination. The NiO:Mn (Mn: 4wt.%) nanoparticles showed the highest photocatalytic activity due to the highest activation sites. Therefore, it is revealed that the Mn: 4wt.% nanoparticles are observed to be more suitable for the photocatalytic activity of methylene blue dye degradation.</P>
ECR plasma etching of GaAs in CCl2F2/Ar/O2 discharge and IR studies of the etched surface
L. S. S. Singh,K. P. Tiwary,R. K. Purohit,Z. H. Zaidi,M. Husain 한국물리학회 2005 Current Applied Physics Vol.5 No.4
The etching of GaAs materials under electron cyclotron resonance conditions has been performed in an ECR etching system withrf biasing using the CCl2F2/Ar/O2 plasma chemistry. Etching experiments were carried out at a pressure between 0.015 and 0.020mbar, rf power 0.39 W/cm2, and dc bias voltage 200 V. The surface morphology and etch depth were taken by scanning electronmicroscopy and Dektek Prolometry respectively. The use of ECR conditions with additional rf biasing provides the good etchingof the surface and fast etch rates. Moreover, the surface of the GaAs material display smooth and stoichiometric surfaces at higherECR powers. The surface damages on the GaAs samples after the plasma exposure have been studied using IR spectroscopy..