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RISS 인기검색어
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- 저자 : 나현석(Hyunseok Na) (검색결과 6 건)
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RHEED에 의한 GaN, InN 핵생성층의 열처리 효과 분석
나현석 ( Hyunseok Na ) 한국열처리공학회 2016 熱處理工學會誌 Vol.29 No.3
GaN and InN epilayers with nucleation layer (LT-buffer) were grown on (0001) sapphire substrates by radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE). As-grown and annealed GaN and InN nucleation layers grown at various growth condition were observed by reflection high-energy electron diffraction (RHEED). When temperature of effusion cell for III source was very low, diffraction pattern with cubic symmetry was observed and zincblende nucleation layer was flattened easily by annealing. As cell temperature increased, LT-GaN and LT-InN showed typical diffraction pattern from wurtzite structure, and FWHM of (10-12) plane decreased remarkably which means much improved crystalline quality. Diffraction pattern was changed to be from streaky to spotty when plasma power was raised from 160 to 220 W because higher plasma power makes more nitrogen adatoms on the surface and suppressed surface mobility of III species. Therefore, though wurtzite nucleation layer was a little hard to be flattened compared to zincblende, higher cell temperature led to easier movement of III surface adatoms and resulted in better crystalline quality of GaN and InN epilayers.
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Growth of AlN Thin Film on Sapphire Substrates and ZnO Templates by RF-magnetron Sputtering
Hyunseok Na(나현석) 한국진공학회(ASCT) 2010 Applied Science and Convergence Technology Vol.19 No.1
먼저 RF 마그네트론 스퍼터링법을 이용하여 사파이어 기판 위에 AlN 박막을 증착하였다. AlN 공급원으로는 분말소결된 AlN 타겟을 적용하였다. 플라즈마 파워를 50에서 110 W로 증가시켰을 때 AlN 층의 두께는 선형적으로 증가하였다. 그러나 동작압력을 3에서 10 mTorr로 증가시켰을 때는 동작기체인 아르곤 양이 증가함에 따라 AlN 타겟으로부터 스퍼터링되어 나온 AlN 입자들의 평균자유행정의 거리가 감소하기 때문에 AlN 층의 두께는 약간 감소하였다. 질소 기체를 아르곤과 섞어주었을 때는 질소의 낮은 스퍼터링 효율에 의해서 AlN의 두께는 크게 감소하였다. 다음으로는 ZnO 형판 위에 AlN를 증착하였다. 그러나 700도 이상의 열처리에 의해서 AlN와 ZnO의 계면이 약간 분리되어 계면의 열적 안정성이 낮다는 결과를 얻었다. 게다가 스퍼터링으로 증착한 AlN 박막의 나쁜 결정성으로 인하여 700도에서 MOCVD의 반응기기체인 수소와 암모니아에 의해서 AlN 밑의 ZnO 층이 분해되는 현상도 관찰하였다. 그리고 900도 이상에서는 ZnO가 완전히 분해되어 AlN 박막이 완전히 분리되었다. AlN thin films were deposited on sapphire substrates and ZnO templates by rf-magnetron sputtering. Powder-sintered AlN target was adopted for source material. Thickness of AlN layer was linearly dependent on plasma power from 50 to 110 W, and it decreased slightly when working pressure increased from 3 to 10 mTorr due to short mean free path of source material sputtered from AlN target by Ar working gas. When N₂ gas was mixed with Ar, the thickness of AlN layer decreased significantly because of low sputter yield of nitrogen. AlN layer was also deposited on ZnO template. However, it showed weak thermal stability that the interface between AlN and ZnO was deteriorated by rapid thermal annealing treatment above 700℃. In addition, ZnO layer was largely attacked by MOCVD ambient gas of hydrogen and ammonia around 700℃ through inferior AlN layer deposited by sputtering. And AlN layers were fully peeled off above 900℃.
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천현동,나현석,주성후,Chun, Hyun-Dong,Na, Hyunseok,Ju, Sung-Hoo 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.6
To study emission properties of white phosphorescent organic light emitting devices (PHOLEDs), we fabricated white PHOLEDs of ITO(150 nm) / NPB(30 nm) / TcTa(10 nm) / mCP(7.5 nm) / light-emitting layer(25 nm) / UGH3(5 nm) / Bphen(50 nm) / LiF(0.5 nm) / Al(200 nm) structure. The total thickness of light-emitting layer with co-doping and blue-doping/co-doping using a host-dopant system was 25 nm and the dopant of blue and red was FIrpic and $Bt_2Ir$(acac) in UGH3 as host, respectively. The OLED characteristics were changed with position and thickness of blue doping layer and co-doping layer as light-emitting layer and the best performance seemed in structure of blue-doping(5 nm)/co-doping(20 nm) layer. The white PHOLEDs showed the maximum current density of $34.5mA/cm^2$, maximum brightness of $5,731cd/m^2$, maximum current efficiency of 34.8 cd/A, maximum power efficiency of 21.6 lm/W, maximum quantum efficiency of 15.6%, and a Commission International de L'Eclairage (CIE) coordinate of (0.367, 0.436) at $1,000cd/m^2$.
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Ultra Wide Band-gap 인광체를 이용한 백색 OLED의 발광 특성
천현동,나현석,추동철,강유석,양재웅,주성후,Chun, Hyun-Dong,Na, Hyunseok,Choo, Dong Chul,Kang, Eu-Seok,Yang, Jae-Woong,Ju, Sung-Hoo 한국전기전자재료학회 2012 전기전자재료학회논문지 Vol.25 No.11
We studied the emission characteristics of white phosphorescent organic light-emitting diodes (PHOLEDs), which were fabricated using a two-wavelength method. The best blue emitting OLED and red emitting OLED characteristics were obtained at a concentration of 12 vol.% FIrpic and 1 vol.% $Bt_2Ir$(acac) in UGH3, respectively. And the optimum thickness of the total emitting layer was 25 nm. To optimize emission characteristics of white PHOLEDs, white PHOLEDs with red/blue/red, blue/red, red/blue and co-doping emitting layer structures were fabricated using a host-dopant system. In case of white PHOLEDs with co-doping structure, the best efficiency was obtained at a structure UGH3: 12 vol. % FIrpic: 1 vol.% $Bt_2Ir$(acac) (25 nm). The maximum brightness, current efficiency, power efficiency, external quantum efficiency, and CIE (x, y) coordinate were 13,430 $cd/m^2$, 40.5 cd/A, 25.3 lm/W, 17 % and (0.49, 0.47) at 1,000 $cd/m^2$, respectively.
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Micro Lens Array Film을 이용한 백색 OLED의 발광 특성
천현동(Hyun-Dong Chun),나현석(Hyunseok Na),양재웅(Jae-Woong Yang),주성후(Sung-Hoo Ju) 한국표면공학회 2013 한국표면공학회지 Vol.46 No.2
We studied the emission characteristics of white phosphorescent organic light-emitting diodes (PHOLEDs), which were fabricated using a two-wavelength method. To optimize emission characteristics of white PHOLEDs, white PHOLEDs with co-doping and blue/co-doping emitting layer (EML) structures were fabricated using a host-dopant system. The total thickness of light-emitting layer was 25 nm and the dopant of blue and red was FIrpic and Bt2Ir(acac) in UGH3, respectively. In case of co-doping structure, applying micro lens array film showed efficiency improvement from the current efficiency 78.5 cd/A and power efficiency 40.4 lm/W to the current efficiency 131.1 cd/A and power efficiency 65 lm/W and blue / co-doping structure showed efficiency improvement from the current efficiency 43.8 cd/A and power efficiency 22 lm/ W to the current efficiency 69 cd/A and power efficiency 32 lm/W.
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