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윤재홍,김현수,삼본극구 (杉本克久) 대한금속재료학회(대한금속학회) 1999 대한금속·재료학회지 Vol.37 No.7
The corrosion resistances of the Fe-Ti alloys fabricated by an ion-beam sputter and an arc-melting process were examined in acid solutions. XPS analysis has been used to compare the passive films formed on the alloys. The sputtered Fe-Ti alloys have an amorphous structure while the arc-melted Fe-Ti alloys have a crystalline with a dendritic structure. The corrosion rate of the sputtered Fe-Ti alloys in 3 M HCl decreased with increasing the titanium fraction in the alloys. For the arc-melted Fe-Ti alloys which contain more than 57 at% Ti, the corrosion rate decreases with increasing the titanium fraction in the alloys. However, the corrosion rate of the sputtered Fe-Ti alloys is about ten times lower than that of the arc-melted alloys. The sputtered Fe-Ti alloys passivate anodically in 1 M H₂SO₄, and HCl, and exhibit higher corrosion resistance since the passive films formed on the alloys contain high chemical resistant oxides.
MOCVD법에 의해 제조된 Fe₂O₃-TiO₂계 산화물 박막의 내식특성에 관한 연구
李在鉉,杉本克久,許聖康,尹在弘,金顯洙,邊應善 國立 昌原大學校 産業技術硏究所 1998 産技硏論文集 Vol.12 No.-
Fe₂O₃-TiO₂artificial passive films were formed at the temperatures of 200-350℃ by low pressure MOCVD technique. The relationship between the formation temperature and corrosion resistance of the Fe₂O₃-TiO₂films was examined in acid solutions. Fe₂O₃-TiO₂films deposited above 300℃ were crystalline and the films deposited below 250℃ were amorphous. The dissolution rate of the Fe₂O₃-TiO₂films deposited at 200 and 250℃ decreased with increasing the formation temperature in 5 M HCl, but the films deposited at 300 and 350℃ hardly dissolved in the solution. The films deposited at 200 and 350℃ easily dissolved at cathodic potentials in 1 M H₂SO₄and HCl owing to te selective reduction of iron oxide components in the films. But, the selective reduction in the films deposited at 300 and 350℃ was suppressed. The Fe₂O₃-TiO₂films deposited above 300℃ have higher corrosion resistance than that of the films deposited below 250℃, because the former have high crystallinity and cotain high chemical resistant oxides.
Fe2O3-TiO2 계 박막의 내식성과 광전류 응답 특성
윤재홍,김현수,삼본극구 대한금속재료학회(대한금속학회) 1998 대한금속·재료학회지 Vol.36 No.9
Fe₂O₃-TiO₂ films were formed by MOCVD technique, and their corrosion resistance and photoelectrochemical property were examined in acidic, neutral and alkaline solutions. The corrosion resistance was examined by an anodic polarization test, and the photocurrent response by a photoelectrochemical polarization test. The photocurrent and quantum yield maximum of the films depended on the titanium cationic fraction(X_η) in the films. They decreased in the range of X_η=0.0-0.70, then increased in the range of X_(Ti)=0.70-0.95, and finally decreased in the range of X_(Ti)=0.95-1.0 with increasing X_η value. The increase in the photocurrent and quantum yield maximum in the range of X_η=0.70-0.95 was attributed to the amorphous structure. Such a change in the photocurrent and quantum yield maximum was independent to the solution pH. The corrosion resistance of the films increased with increasing X_η value of the film in acidic, neutral and alkaline solutions. Therefore, the films with X_η=0.70-0.95 can be concluded to have high photocurrent response and high corrosion resistance.
MOCVD법에 의해 제조된 Fe₂O₃-TiO₂계 박막의 내식성과 광전류 응답 특성에 관한 연구
金顯洙,尹在弘,金明鎬,杉本克久,邊鷹善 國立 昌原大學校 産業技術硏究所 1998 産技硏論文集 Vol.12 No.-
Fe₂O₃-TiO₂ films were formed by MOCVD technique, and their corrosion resistance and photoelectrochemical property were examined in acidic, neutral and alkaline solutions. The corrosion resistance was examined by an anodic polarization test, and the photocurrent response by a photoelectrochemical polarization test. The photocurrent and quantum yield maximum of the films depend on the titanium cationic fraction(Xη) in the films. They decreased in the range of Xη=0.0-0.70, then increased in the range of Xη=0.70-0.95, and finally decreased in the range of Xη=0.91-1.0 with increasing Xηvalue. The increase in the photocurrent and quuantum yield maximum in the range of Xη=0.70-0.95 was attributed to the amorphous structure. Such a change in the photocurrent and quantum yield maximum was independent to the solution pH. The corrosion resistance of the films increased with increasing Xηvalue of the film in acidic, neutral and alkaline solutions. Therefore, the films with Xη=0370-0.95 can be concluded to have high photocurrent response and high corrosion resistance.
타원편광해석법에 의한 MOCVD-Nb₂O5 박막의 성장과정과 내식특성에 관한 연구
이찬규,윤재홍,김명호,박태곤,杉本克久,이성훈 國立 昌原大學校 産業技術硏究所 1994 産技硏論文集 Vol.8 No.-
Nb(OC₂H?)?를 원료로 하여 AP-MOCVD에 의한 N₂O?박막의 성장과정을 기판온도, carrier gas유량, 원료온도, 반응 O₂gas의 함수로 in-situ Ellipsometry에 의해서 조사하였다. 실험결과 얻어진 Δ-Ψ곡선은 투명균질막의 이론적 Δ-Ψ곡선에 잘 일치하였으며 성장과정은 473∼673K의 저온영역에서는 1단계적 직선 성장거동을 나타내었고 673∼753K의 고온영역에서는 2단계의 직선적 성장거동을 나타내었다. 석출된 박막의 밀도를 의미하는 굴절율은 기판온도 673K까지는 증가하나 그 이상의 온도에서는 감소하기 시작했다. 그리고 산소를 첨가하지 않았을 경우는 723K에서 석출된 박막이 가장 뛰어난 내식성을 나타내었는데 이것은 이 온도에서부터 석출박막이 δ-Nb₂O?로 결정화하기 때문이라 사려된다. By the Nb(OC₂H?)? source, Growth process of Nb₂O? films formed by AP-MOCVD has been examined by in-situ Ellipsometry as a function of the substrate temperature, carrier gas flow rate, source temperature and reactant O₂gas flow rate, Δ-Ψcurve obtained in experimental results corresponded to the theorical Δ-Ψcurve of transparant homogenious film, and showed a rectilineal growth behaviour of the one stage at a low temperature range of 473∼673K and indicated a rectilineal growth behaviour of the two stage at the high temperature of 673∼753K. A refractive index meaning density of the deposited film increased until 673K of the substrate temperature but decreased above 673K. In the absence of oxygen, The thin film deposited at 723K showed the most excellent corrosion resistance, because the deposited film was crystallized into the δ-Nb₂O? above 723K.
Kim, Hyun-soo,Lee, Chan-gyu,Yoon, Jae-hong,Sugimoto, Katsuhisa 國立 昌原大學校 産業技術硏究所 1998 産技硏論文集 Vol.12 No.-
The corrosion resistances of Fe₂O₃-TiO₂artificial passive film and real passive film on the sputter-deposited Fe-Ti alloy films were examined in acid solutions. The Fe₂O₃-TiO₂films containing less than X(Ti)=0.70 have the spinel structure, the films containing more than X(Ti)=0.70 have the amorphous structure. The dissolution rate of the Fe₂O₃-TiO₂-TiO₂films in 5M HCl decreased with increasing the titanium cationic fraction in the films. The Fe₂O₃-TiO₂-TiO₂films dissolved at cathodic potentials in 1M H₂SO₄and 1M HCl owing to the selective reduction of Fe₂O₃ components in the films. Sputter-deposited Fe-Ti alloy films containing more than 39at% Ti passivated anodically in 1M H₂SO₄and 1M HCl, and showed high corrosion resistance. The Fe₂O₃-TiO₂artificial passive films have higher corrosion resistance than the real passive films on the sputter-deposited Fe-Ti alloy films in 5M HCl.