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Characteristics of a Ferromagnetic-Enhanced Inductively-Coupled Plasma by an Internal Linear Antenna
Jong Hyeuk Lim,염근영,Jung Kyun Park,김경남 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.2
The electrical and the plasma properties of an internal linear inductively coupled plasma (ICP) source with/without a C-shaped Ni-Zn ferromagnetic module installed near the inductive antenna were investigated. The installation of the ferromagnetic module decreased the voltage and the current of the antenna at a given power while the phase angle between the voltage and the current was decreased. Therefore, the load resistance and the power transfer efficiency were increased at the same rf power for the ICP source with the ferromagnetic module. At a rf power of 800 W and 5 mTorr, the installation of the ferromagnetic material increased the plasma density from 2.9 × 10 11/㎤ to 3.5 × 10 11/㎤ while decreasing the plasma potential and the electron temperature slightly.
선형 유도결합 플라즈마 시스템에서 자장에 의한 플라즈마의 Confinement 효과에 관한 연구
임종혁(Jong Hyeuk Lim),김경남(Kyong Nam Kim),염근영(Geun Young Yeom) 한국표면공학회 2006 한국표면공학회지 Vol.39 No.3
A novel internal-type linear inductive antenna, which we refer to as a double comb-type antenna, was developed for a large-area plasma source with substrate size of 880 ㎜ × 660 ㎜ (4<SUP>th</SUP> generation glass size). In this study, effect of plasma confinement by applying multi-polar magnetic field was investigated. High density plasmas of the order of 3.18 × 10<SUP>11</SUP> ㎝<SUP>?3</SUP> could be obtained with a pressure of 15 mTorr Ar at an inductive power of 5000 W with good plasma stability. This plasma density is higher than that obtained for the conventional double comb-type antenna, possibly due to the plasma confinement, low rf voltage, resulting in high power transfer efficiency. Also, due to the remarkable reduction in the antenna rf voltage and length, a plasma uniformity of less than 3% could be obtained within a substrate area of 880 ㎜ × 660 ㎜ as rf power increased.
Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System
Kyong Nam Kim,Jong Hyeuk Lim,Woong Sun Lim,Geun Young Yeom IEEE 2010 IEEE transactions on plasma science Vol.38 No.2
<P>A Ni-Zn ferrite-enhanced U-shaped internal inductive antenna (240 mm × 2300 mm) operated at 2 MHz was used as a linear plasma source for an ultralarge-area plasma, and its plasma and electrical characteristics were investigated and compared with those of the antenna operated at 13.56 MHz without the ferrite. By the magnetic field enhancement, the operation of the source showed higher power transfer efficiency, lower antenna impedance, and lower RF rms voltage compared to that operated at 13.56 MHz without the ferrite. When photoresist etch uniformity was measured by etching the photoresist using a 40-mtorr Ar/O<SUB>2</SUB> (7:3) mixture at 2 MHz by locating three U-shaped antennas in parallel, the etch uniformity less than 11% could be obtained on the substrate size of 2300 mm × 2000 mm.</P>