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ε - Fructoselysine 이 백서 소장내 Disaccharidase 의 활성에 미치는 영향
양창일 ( Chang Il Yang ) 생화학분자생물학회 1979 BMB Reports Vol.12 No.1
Effect of ε-fructoselysine on the activity of disaccharidase in the small intestine of male albino rats in vivo and in vitro systems was investigated. ε-Fructoselysine (Amadori compound, 1-deoxy-l-(-N-L-lysino)-D-fructose) was prepared from. browned casein which was formed 10g of milk casein and 1.6g of glucose under relatively mild conditions (37℃±0.5, R.H. 70±3%), and its purity was confirmed with the synthetic standard (Rf value, 0.23). Disaccharidase activities in the rats fed 5% ε-fructoselysine diet were proved to be significantly reduced. Using a model system (ε-iructoselysine), the in vitro study on the mode of inhibitory effect on maltase activity revealed that the comopund showed a competitive inhibitory effect (Ki=3.6mo1). When browned casein (condition mentioned above) was ingested by growing rats, ε-fructo selysine which was found after 3 hr, was remained from the intestinal TCA-soluble fraction, but L-lysine disappeared after 7hr from this result, ε-fructoselysine which remained as an absorption-delayed material in the small intestinal lumen is responsible for its inhibitory effect.
기판 온도에 따른 Cl₂/BCl₃/Ar 플라즈마에서 ZrO₂ 박막의 건식 식각
양설(Xue Yang),하태경(Tae-Kyung Ha),위재형(Jae-Hyung Wi),엄두승(Doo-Seung Um),김창일(Chang-Il Kim) 한국표면공학회 2009 한국표면공학회지 Vol.42 No.6
The wafer surface temperature is an important parameter in the etching process which influences the reaction probabilities of incident species, the vapor pressure of etch products, and the re-deposition of reaction products on feature surfaces. In this study, we investigated all of the effects of substrate temperature on the etch rate of ZrO₂ thin film and selectivity of ZrO₂ thin film over SiO₂ thin film in inductively coupled plasma as functions of Cl₂ addition in BCl₃/Ar plasma, RF power and dc-bias voltage based on the substrate temperature in range of 10℃ to 80℃. The elements on the surface were analyzed by x-ray photoelectron spectroscopy (XPS).
비선형 변환제어에 의한 3자유도 수직 다관절 로봇의 제어
양창일,백윤수,Yang, Chang-Il,Baek, Yun-Su 대한기계학회 1997 大韓機械學會論文集A Vol.21 No.11
Mathematical models of industrial robots or manipulators are highly nonlinear equations with nonlinear coupling between the variables of motion. As the working speed has been fast, the effects of nonlinear terms have become serious. So the control algorithm based on approximately linearized equation looses the efficiency. In order to design the control law for the nonlinear models, Hunt-Su's nonlinear transformation method and Marino's feedback equivalence condition are used with linear quadratic regulator(LQR) theory in this study. Nonlinear terms of the system are eliminated and coupled terms are decoupled by this feedback law. This method is applied to a 3-D.O.F. vertical articulated manipulator by both experiments and simulations and compared with PID control which is widely used in the industry.
Cl<sub>2</sub>/Ar 플라즈마를 이용한 Al<sub>2</sub>O<sub>3</sub> 박막의 식각
양설,엄두승,김관하,송상헌,김창일,Yang, Xue,Um, Doo-Seung,Kim, Gwan-Ha,Song, Sang-Hun,Kim, Chang-Il 한국전기전자재료학회 2009 전기전자재료학회논문지 Vol.22 No.12
In this study, adaptively coupled plasma (ACP) source was used for dry etching of $Al_2O_3$ thin film. During the etching process, the wafer surface temperature is an important parameter to influent the etching characteristics. Therefore, the experiments were carried out in ACP to measuring the etch rate, the selectivities of $Al_2O_3$ thin film to mask materials and the etch profile as functions of $Cl_2$/Ar gas ratio and substrate temperature. The highest etch rate of $Al_2O_3$ was 65.4 nm/min at 75% of $Cl_2/(Cl_2+Ar)$ gas mixing ratio. The etched profile was characterized using field effect scanning electron microscopy (FE-SEM). The chemical states of $Al_2O_3$ thin film surfaces were investigated with x-ray photoelectron spectroscopy (XPS).
일반적 3R 링크를 갖는 6각 보행로봇 다리의 보행체적에 대한 해석
한규범,양창일,백윤수,Han, Gyu-Beom,Yang, Chang-Il,Baek, Yun-Su 대한기계학회 1996 大韓機械學會論文集A Vol.20 No.7
In order to move the body of a walking robot translationally, and step over the obstacles, the walking robot must have at least 3 degrees of freedom for each leg. Therefore each leg of the general walking robots can be composed of 3-link system with 3 revolute joints. In this paper, the colsed form of inverse kinimatic solutions is shown for this general 3R linkage. Moreover, in order to have efficient walking volume in rough terrain, the workspace of each log is obtained considering the twist angles and the offsets in D-H parameters. When we design a walking robot, the information of the walking volume is needed for planning desired trajectories of the feet effectively. Appropriate knowledge of the walking volume can also be used to maximize linear or angular velocity of minimize power of stress. However, since it is impossible to obrain the information of walking volume in 3-D space directly from the kinematic equations, the walking volume can be searched through the edge detection algorithm using the triangle tracer with closed from inverse kinematic solutions. In this study, we present the closed form inverse kinematic solutions for 3R linkage model, and the walking volume of 6 legged walking robot which is modeled after the darking bettle, Eleodes obscura sulcipennis, through the method of edge detection for an arbitrary 2 dimensional shape using triangle tracer.
전자석의 자기력 제어를 이용한 구형 3 자유도 액추에이터의 설계 및 제어
백윤수,양창일,박준혁,Baek, Yun-Su,Yang, Chang-Il,Park, Jun-Hyeok 대한기계학회 2001 大韓機械學會論文集A Vol.25 No.9
In this paper, 3 D.O.F. actuator, which has three degrees of freedom in one joint, is proposed. The proposed 3 D.O.F. spherical actuator is composed of the rotor and atator. The upper plate of the stator supports the rotor and five electromagnets are located at the base of the stator. The rotor has two permanent magnets, and each rotational axis of the rotor gimbal system is supported by the bearing. To find out the governing equations for the torque generation, Coulombs law and Lorentz force with respect to magnetism is applied. As the experimental results, if the distance between electromagnet and permanent maget is far enough, the force between these magnets can be expressed from current of coils and z-axial distance. For the purpose of control 3 D.O.F. actuator, PID control law is applied. The experimental results are presented to show the validity of the proposed 3 D.O.F. actuator.
BCl<sub>3</sub>/Ar 유도결합 플라즈마 안에 CH<sub>4</sub> 가스 첨가에 따른 건식 식각된 TaN 박막 표면의 연구
우종창,최창억,양우석,주영희,강필승,전윤수,김창일,Woo, Jong-Chang,Choi, Chang-Auck,Yang, Woo-Seok,Joo, Young-Hee,Kang, Pil-Seung,Chun, Yoon-Soo,Kim, Chang-Il 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.5
In this study, the plasma etching of the TaN thin film with $CH_4/BCl_3/Ar$ gas chemistries was investigated. The etch rate of the TaN thin film and the etch selectivity of TaN to $SiO_2$ was studied as a function of the process parameters, including the amount of $CH_4$. X-ray photoelectron spectroscopy (XPS) and Field-emission scanning electron microscopy (FE-SEM) was used to investigate the chemical states of the surface of the TaN thin film.
엄두승(Doo-Seung Um),강찬민(Chan-Min Kang),양설(Xue Yang),김동표(Dong-Pyo Kim),김창일(Chang-Il Kim) 한국표면공학회 2008 한국표면공학회지 Vol.41 No.3
This study described the effects of RF power, DC bias voltage, chamber pressure and gas mixing ratio on the etch rates of TiN thin film and selectivity of TiN thin film to SiO₂ with BCl₃/Ar gas mixture. When the gas mixing ratio was BCl₃(20%)/Ar(80%) with other conditions were fixed, the maximum etch rate of TiN thin film was 170.6 nm/min. When the DC bias voltage increased from ?50 V to ?200 V, the etch rate of TiN thin film increased from 15 ㎚/min to 452 ㎚/min. As the RF power increased and chamber pressure decreased, the etch rate of TiN thin film showed an increasing tendency. When the gas mixing ratio was BCl₃(20%)/Ar(80%) under others conditions were fixed, the intensity of optical emission spectra from radical or ion such as Ar(750.4 ㎚), Cl?(481.9 ㎚) and Cl²?(460.8 nm) was highest. The TiN thin film was effectively removed by the chemically assisted physical etching in BCl₃/Ar ICP plasma.