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임승택 동국대학교 불교대학 1998 東國思想 Vol.29 No.-
In Buddhist scriptures, the concept of a ̄ka ̄ra has a various meanings and terminological applications. Many Buddhist and non-Buddhist schools in Indian philosophy disagreed with each other on the interpretation of this term. I would like to briefly classify a ̄ka ̄ra's meanings into three types in accordance with different points of view. This may exhibit the concept of a ̄ka ̄ra more clearly and concretely. These three types of a ̄ka ̄ra which I classified are 'a ̄ka ̄ra as the shape of things in the outside world', 'a ̄ka ̄ra as the image of objects which brings about recognition', and 'a ̄ka ̄ra as the mode of activity of consciousness'. 'Aa ̄ka ̄ra as the shape of things' means the usual figure of things which exists in the outside world. 'A ̄ka ̄ra as the image of objects' means the impress of things appearing in the sphere of consciousness. This terminological example of a ̄ka ̄ra is generally connected with theories of epistemology. Lastly, 'a ̄ka ̄ra as the mode of activity of consciousness' means the function of distinction of consciousness, which comprehends objects distinguished in the mind. In this case, the terminology of a ̄ka ̄ra is related to the theory of the Vijn~a ̄navadin in Buddhist schools. From the standpoint of the Sa ̄ka ̄ravijn~a ̄navadin, a ̄ka ̄ra is just an image which excludes estimation and this view depends on the theory that the image of objects is intuited in the sphere of consciousness. But the Nira ̄ka ̄ravijn~a ̄ka ̄navadin maintain that a ̄ka ̄ra is the movement of consciousness and the by-product of ideas. Therefore I conclude that the Sa ̄ka ̄ravijn~a ̄navadin accept the meaning of a ̄ka ̄ra as a material which brings about recognition, and the Nira ̄ka ̄ravijna ̄navadin understand the terminology of a ̄ka ̄ra as the mode of activity of consciousness. In this treatise I assert that the concept of a ̄ka ̄ra adopted in both Vijn~anavadin is different. So their difference of opinion arises from the interpretation of a ̄ka ̄ra, not from existence or nonexistence of a ̄ka ̄ra. As a result, these two schools are not directly antagonistic to each other. Hence there is a possibility of compromise. However, I think that the process of historical development of the Sa ̄ka ̄ravijn~anavadin and the Nira ̄ka ̄ravijn~a ̄navadin has not yet been investigated sufficiently on the basis of literature. But this study will still be of value in understanding the theory of the Sa ̄ka ̄ravijn~a ̄navadin and the Nira ̄ka ̄ravijn~a ̄navadin in general.
대입 원서접수 시간 구간별 합격률 및 등록률 차이 분석 연구
임진택 ( Lim Jin-teak ),이승아 ( Lee Seung-a ),김은혜 ( Kim Eun-hye ),임선영 ( Lim Sun-young ) 경희대학교 입학전형연구센터 2019 입학전형연구 Vol.8 No.-
대학 입시 지원 과정은 ‘눈치작전의 대명사’처럼 여겨져 왔다. 지원자의 전공 적성에 따른 소신지원보다는 원서접수에서 경쟁률이 낮은 학과에 지원해 합격하겠다는 전략으로 인해, 원서접수 마지막 날 최종 경쟁률을 공개한 이후 지원자가 대거 몰리는 현상이 나타나고 있다. 이런 경향은 지원학과의 적성과 소질을 강조하는 수시모집의 확대로 인해 기존 점수 위주로 선발하는 정시모집과는 다른 양상을 보이고 있다. 이에 본 연구는 대학 입학전형 원서접수 단계에서 전형유형별 원서접수 시간 구간별로 지원율, 합격률, 등록률이 어떻게 다른지를 실증적으로 고찰하는데 목적이 있다. 연구 결과는 대입전형계획 수립, 대학별 고사 조 편성 및 고사장 배치 등 기준으로 활용할 수 있고, 대입정보 데이터 관리는 대학기관연구(IR)의 중요한 한 분야로 자리잡을 수 있을 것이다. 이를 위해 K대학의 2018학년도 신입학 모집에 지원한 93,031명 전체 지원자를 대상으로 빈도분석, 교차분석을 실시하였다. 분석 결과 첫째, 지원율은 수시 전형에서 원서접수 둘째 날, 정시전형에서 원서접수 마지막날 경쟁률 미공개 구간에서 가장 높게 나타났다. 둘째, 지원자 대비 합격률은 수시전형에서는 원서접수 시간이 빠를수록 높은 것으로 나타났고, 정시모집에서는 첫째 날과 마지막날 경쟁률 미 공개 구간보다 둘째 날, 셋째 날, 마지막 날 경쟁률 공개 구간에서 높은 것으로 나타났다. 셋째, 합격자 대비 등록률은 수시와 정시 모집 모두에서 통계적으로 유의미한 차이가 없는 것으로 나타났다. The processes of submitting university application have been regarded as ‘wait-and-see’ strategy. The purpose of this research is to empirically study the differences in application rate, acceptance rate and admission rate according to the application time based on university admission types during the procedures of submitting university application and to suggest standards for establishing plans per different admission types, organizing groups for admission exam and arranging exam locations. For the study, Frequency analysis and Chi-squared test were conducted on all 93,031 students who have applied to K University for 2018. The analysis results showed that in the case of application rate, the second day of application for non-scheduled admission and the last day of application for regular admission showed the highest rate when competition rate was undisclosed. Acceptance rate per applicants for non-scheduled admission was higher when application time was earlier while acceptance rate for regular admission was higher on the second, third and last day when competition rate was disclosed than on the first and last day when competition rate was undisclosed. Admission rate compared to acceptance rate showed statistically no significant differences in both the regular and non-scheduled admissions. Implications of this study would be used for establishing plans per different admission types or operating admission exam per university and controlling the data related to university admission would be critical area of the institutional research.
Lim, Hyung-Teak,Kim, Yong-Kweon,Lee, Seung-Ki The Korean Institute of Electrical Engineers 1997 Journal of Electrical Engineering and Information Vol.2 No.5
In this paper, the optimum condition of (110) Si etching with the potassium hydroxide(KOH) etchant is presented. Although several researches on (110) Si anisotropic etching have been studied, there has been lack of effects of mask quality and etching conditions on the selectivity and the roughness o the etched surface. Three kinds of masks (film, emulsion and E-beam mask) were used in order to verify the effect of etching properties. Anisotropic bulk etching depends on the crystalline orientation and the concentration and temperature of the etchant. In order to investigate the effect of etching conditions on selectivity and the roughness of the etched surface, the concentration of the etchant was varied from 35 to 45 per cent in weight with increments by 5 per cent and the temperature was changed from 70 to 90$^{\circ}C$ with increments by 10$^{\circ}C$. The combination of the temperature of 70$^{\circ}C$ and the concentration of 40wt.% was found to be the optimum etching condition for high selectivity. Etched surfaces show minimum surfaces show minimum surface roughness at a temperature of 80$^{\circ}C$ and a concentation of 40wt.%. Comb structures with various comb widths were fabricated and the lengths of the combs wree measured with several etching time durations. A micro comb structure 525$\mu\textrm{m}$ high was fabricated for MEMS application.