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Poly(3-methylthiophene)-Based Urea Sensors with Planar Pt Electrodes on Silicon Substrates
Sung-HoPark,홍석인,Joon-HyungJin,Nam-KiMin 한국물리학회 2002 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.40 No.1
Many research groups have applied enzymatically modied ammonium ion-selective electrodes to determine the urea concentration. Urea is an important diagnostic agent for monitoring malfunction of the kidney. The aim of this work is to design a new kind of linear sweep voltammetric biosensor based on poly(3-methylthiophene)-coated planar Pt electrodes. While existing potentiometric methods are only applied to the reversible electrode reaction, the linear sweep voltammetric method is independent of the reversibility of an electrode reaction. As a substrate material, a p-type silicon wafer is employed. RF sputtering forms a platinum thin lm electrode on the silicon wafer, and a titanium underlayer is embedded between them to improve the adhesive strength between the platinum thin lm and the silicon substrate. poly(3-methylthiophene) (P3MT) lm is anodically electropolymerized on the Pt/Ti layers. Then, the urease immobilization is accomplished by chronoamperometry. Linear sweep voltammetry (LSV) was used to obtain a characteristic curve for a P3MT-based urea sensor, and the measured sensitivity was about 82 A/decade. In addition, the electrode surface was analyzed using energy dispersive X-ray spectroscopy (EDX) and auger electron spectroscopy (AES).
A Rigorous 2D Approximation Technique for 3D Waveguide Structures for BPM Calculations
한영탁,신장욱,김덕준,성희경,Sang-HoPark,Yoon-JungPark 한국전자통신연구원 2003 ETRI Journal Vol.25 No.6
We propose a rigorous 2D approximation technique for the 3D waveguide structures; it can minimize the well-known approximation errors of the commonly used effective index method. The main concept of the proposed technique is to compensate for the effective cladding index in the equivalent slab model of the original channel waveguide from the modal effective index calculated by the nonuniform 2D finite difference method. With simulations, we used the proposed technique to calculate the coupling characteristics of a directional coupler by the 2D beam propagation method, and the results were almost exactly the same as the results calculated by the 3D beam propagation method.
An Etch-Stop Technique Using Cr2O3 Thin Film and Its Application to Silica PLC Platform Fabrication
신장욱,한영탁,성희경,김제하,Dong-JungKim,Sang-HoPark,Soo-JinPark 한국전자통신연구원 2002 ETRI Journal Vol.24 No.5
Using Cr2O3 thin film, we developed a novel etch-stop technique for the protection of silicon su rface morphology during deep ion coupled plasma etching of silica layers. With this technique we were able to etch a silica trench with a depth of over 20 μm without any damage to the exposed silicon terrace surface. This technique should be well applicable to fabricating silica planar lighwave circuit platforms for opto-electronic hybrid integration.