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Ilsun Pang,Sungsoo Kim,Jaegab Lee 한국물리학회 2007 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.51 No.3
The quality of the alkylsilane monolayer prepared in a wet condition is not satisfactory enough to use it as a reliable mask for metal organic chemical vapor deposition (MOCVD). This is mainly due to the rapid nucleation and growth of the metals on the hydrophilic sites of a disorderly-assembled alkylsilane Self-assembled Monolayers (SAM). To circumvent this problem, a nearly perfectlyordered and fully covered alkylsilane SAM on a substrate surface is desirable. In this study, perfluoroalkyltrichlorosilane molecules (FAS) were self-assembled on a SiO2 surface under a highly dry condition to obtain a high-quality monolayer. To evaluate the compactness, the smoothness and the surface coverage of the monolayer, we carried out contact angle, in-situ reflectance, and optical and atomic force microscopic measurements. These measurements revealed that the FAS SAM prepared in a dry condition was far more resistant to cobalt than the monolayer prepared in a wet condition. In addition, MOCVDs on UV-patterned FAS SAMs showed that the dry process significantly improved the selectivity of cobalt for the hydrophilic areas over the wet process.
Pang, Ilsun,Boo, Jin-Hyo,Sohn, Honglae,Kim, Sung-Soo,Lee, Jae-Gab Korean Chemical Society 2008 Bulletin of the Korean Chemical Society Vol.29 No.7
We report a novel patterning method for a homo-polymeric poly(3-hexylthiophene) (P3HT) nanofilm particularly capable of strong adhesion to a $SiO_2$ surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was selfassembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N- (2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETAS). Then, P3HT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion, patterning, and the film itself, the PEDOT nanofilms and SAMs were investigated with a $Scotch^{(R)}$ tape test, contact angle analyzer, ATR-FT-IR, and optical and atomic force microscopes. The evaluation showed that the newly developed all bottom-up process can offer a simple and inexpensive patterning method for P3HT nanofilms robustly adhered to an oxidized Si wafer surface by the mediation of $FeCl_3$ and amino-functionalized alkylsilane SAMs.
Improvement of Minority Carrier Life Time in N-type Monocrystalline Si by the Czochralski Method
백성선,Ilsun Pang,김재민,김광훈 대한금속·재료학회 2016 ELECTRONIC MATERIALS LETTERS Vol.12 No.4
The installation amount of solar power plants increases every year. Multi-crystalline Si solar cells comprise a large share of the marketof solar power plants. Multi-crystalline and single-crystalline Sisolar cells are competing against one another in the market. Manysingle-crystalline companies are trying to develop and produce ntypesolar cells with higher cell efficiency than that of p-type. In ntypewafers with high cell efficiency, wafer quality has becomeincreasingly important. In order to make ingots with higher MCLT,the effects of both poly types related to metal impurities and pullspeeds related to vacancy concentration on minority carrier life timewere studied. In the final part of ingots, poly types related to themetal impurities are a dominant factor on MCLT. In the initial partof ingots, pull speeds related to vacancy concentration are adominant factor on MCLT.
Sungsoo Kim,Jaegab Lee,Ilsun Pang,부진효,Honglae Sohn 대한화학회 2008 Bulletin of the Korean Chemical Society Vol.29 No.7
We report a novel patterning method for a homo-polymeric poly(3-hexylthiophene) (P3HT) nanofilm particularly capable of strong adhesion to a SiO2 surface. An oxidized silicon wafer substrate was micro-contact printed with n-octadecyltrichlorosilane (OTS) monolayer, and subsequently its negative pattern was selfassembled with three different amino-functionalized alkylsilanes, (3-aminopropyl)trimethoxysilane (APS), N- (2-aminoethyl)-3-aminopropyltrimethoxy silane (EDAS), and (3-trimethoxysilylpropyl) diethylenetriamine (DETAS). Then, P3HT nanofilms were selectively grown on the aminosilane pre-patterned areas via the vapor phase polymerization method. To evaluate the adhesion, patterning, and the film itself, the PEDOT nanofilms and SAMs were investigated with a Scotch® tape test, contact angle analyzer, ATR-FT-IR, and optical and atomic force microscopes. The evaluation showed that the newly developed all bottom-up process can offer a simple and inexpensive patterning method for P3HT nanofilms robustly adhered to an oxidized Si wafer surface by the mediation of FeCl3 and amino-functionalized alkylsilane SAMs.