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NiO 증착시의 Ar 압력 변화에 따른 Ni - Fe / NiO 이층막의 자기적특성과 미세구조에 대한 연구
노재철(J. C. Ro),이두현(D. H. Lee),김용성(Y. S. Kim),서수정(S. J. Suh),박경수(G. S. Park) 한국자기학회 1998 韓國磁氣學會誌 Vol.8 No.6
The exchange anisotropy between NiO antiferromagnetic layer and NiFe ferromagnetic layer has been investigated in NiFe(10 ㎚)/NiO(60 ㎚) formed by magnetron sputtering. The NiO films were sputtered from nickel oxide using R. F. power and NiFe, Ta were deposited using D. C. power under Ar atmosphere. Above all, we studied the exchange anisotropy of Ni-Fe/NiO bilayer, and focused especially on the effect of NiO deposition condition. Our experimental data showed that the dominant factor for determining the exchange anisotropy properties was the Ar pressure during NiO deposition. The better exchange anisotropy properties were found when the NiO film was deposited at low Ar pressure probably due to the flatten interface and the epitaxial tendency of NiO grains and NiFe grains. However, as Ar pressure increased, interfacial diffusion at NiFe/NiO interface and oxygen content of NiO film increased, and consequently reduced the exchange anisotropy. We concluded that the flatten interface and relatively low oxygen content of NiO layer are dominant factors for the enhancement of the exchange anisotropy in NiFe/NiO bilayer.
나노임프린트 패터닝과 자성박막도금을 이용하여 제작한 패턴드미디어용 자기패턴의 자기적 및 결정구조특성에 관한 연구
이병규,이두현,이명복,김해성,조은형,손진승,이창형,정근희,서수정,Lee, B.K.,Lee, D.H.,Lee, M.B.,Kim, H.S.,Cho, E.H.,Sohn, J.S.,Lee, C.H.,Jeong, G.H.,Suh, S.J. 한국자기학회 2008 韓國磁氣學會誌 Vol.18 No.2
Magnetic and crystallographic properties of patterned media fabricated by nanoimprint lithography and Co-Pt electroplating were studied. Thin films of Ru(20 nm)/Ta(5 nm)/$SiO_2$(100 nm) were deposited on Si(100) wafer and then 25 nm hole pattern was fabricated by nanoimprint lithography on substrate. The electroplated Co-Pt nano-dots have the diameter of 35 nm and the height of 27 nm. Magnetic dot patterns of Co-Pt alloy were created using electroplated Co-Pt alloy and then their properties were measured by MFM, SQUID, SEM, TEM and AFM. We observed single domain with perendicular anisotropy for each dot and achieved optimum coercivity of 2900 Oe. These results mean that patterned media fabricated by nanoimprint lithography and electroplating have good properties in view of extending superparamagnetic limit while satisfying the writability requirements with the present write heads. 50 nm pitch의 magnetic dot pattern을 갖는 hard disk drive용 patterned media를 nanoimprint lithography(NIL) patterning과 electroplating 공정을 이용하여 제작하고 자기 및 결정구조 특성을 관찰하였다. Patterned media는 Si(100) wafer 위에 Ru(20nm)/Ta(5 nm)/$SiO_2$(100 nm)를 순차적으로 증착한 후 nanoimprint lithography를 이용하여 25 nm half pitch의 hole pattern을 형성하고 그 후 패터닝된 기판을 plasma ashing 공정을 이용하여 기판의 Ru층을 노출시킨뒤 electroplating을 이용하여 Co-Pt 합금막을 증착하여 제작하였다. Magnetic force microscopy(MFM) 분석을 이용하여 제작된 각각의 magnetic dot pattern이 single domain 특성과 수직자기이방성을 가지고 있음을 확인하였고, superconducting quantum interference device(SQUID) 분석을 통하여 2900 Oe이상의 높은 수직방향 보자력을 확인하였다.
Mn - Ir - Pt 새로운 반강자성체를 사용한 스핀밸브 거대자기저항에 관한 연구
윤성용(S. Y. Yoon),김장현(J. H. Kim),전동민(D. M. Jeon),김윤식(Y. S. Kim),이두현(D. H. Lee),서수정(S. J. Suh) 한국자기학회 2001 韓國磁氣學會誌 Vol.11 No.4
The Mn_(80)Ir_(18.1)Pt_(1.9) exchange bias layers (EBLs), which have a small amounts of Pt, exhibit a high value of Hex. The Si/NiFe/Mn_(80)Ir_(18.1)Pt_(1.9) EBL shows the largest H(ex) of 187 Oe, which is equivalent to a exchange energy (Jex) of 0.146 erg/㎠. NiFe/Mn_(80)Ir_(18.1)Pt_(1.9) EBLs are estimated to have blocking temperature of about 250℃, which is higher than those of Mn-Ir EBLs and Mn-Ir-Pt EBLs with higher Pt contents. This result implies that a little addition of Pt element promotes thermal stability in the Mn-Ir-Pt EBLs. The chemical stability of Mn-Ir-Pt EBLs was characterized by potentiodynamic test, which was performed in 0.001 M NaCl solution. The current density of Mn-Ir-Pt films was gradually reduced with increasing Pt content. The present results indicate that the Mn-Ir-Pt with a small amount of Pt is suitable for an anti ferromagnetic material for a reliable spin valve giant magnetoresistance device.