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Titanium Aluminium Nitride 후막의 전자-빔 조사 효과
최수현(Su-Hyeon Choe),허성보(Sung-Bo Heo),공영민(Young-Min Kong),김대일(Daeil Kim) 한국표면공학회 2020 한국표면공학회지 Vol.53 No.6
Electron beam irradiation is widely used as a type of surface modification technology to advance surface properties. In this study, the effect of electron beam irradiation on properties, such as surface hardness, wear resistance, roughness, and critical load of Titanium Aluminium nitride (TiAlN) films was investigated. TiAlN films were deposited on the SKD-61 substrate by using cathode arc ion plating. After deposition, the films were bombarded with intense electron beam for 10 minutes. The surface hardness was increased up to 4520 HV at electron irradiation energy of 1500 eV. In addition, surface root mean square (RMS) roughness of the films irradiated at 1500 eV shows the lowest roughness of 484 nm in this study.
Au 층간박막 두께에 따른 ZnO 박막의 전기광학적 특성 변화
박윤제(Yun-Je Park),최수현(Su-Hyeon Choe),김유성(Yu-Sung Kim),차병철(Byung-Chul Cha),공영민(Young-Min Gong),김대일(Daeil Kim) 한국표면공학회 2020 한국표면공학회지 Vol.53 No.3
ZnO single layer films (100 nm thick) and Au intermediated ZnO films (ZnO/Au/ZnO; ZAZ) were deposited on the glass substrate by RF and DC magnetron sputtering at room temperature and then the influence of the Au interlayer on the electrical and optical properties of the films were investigated. ZnO thin films show the visible transmittance of 90.3 % and sheet resistance of 63.2⨉10<SUP>8</SUP> Ω/□. In ZAZ films, as Au interlayer thickness increased from 6 to 10 nm, the sheet resistance decreased from 58.3⨉10<SUP>8</SUP> to 48.6 Ω/□, and the visible transmittance decreased from 84.2 to 73.9 %. From the observed results, it can be concluded that the intermediate Au thin film enhances the opto-electrical performance of ZnO films without intentional substrate heating.