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남경탁,황성원,신귀수 한국산업안전학회 2002 한국안전학회지 Vol.17 No.3
A dynamic characteristics of shock absorber in the various excitation is investigated experimentally. Work diagrams and characteristic curves are used as a experimental standard. The various excitation conditions, temperature and noise are very important factors in associated with the reduction of damping force. It is found that the heat occurrence from shock absorber, the gas shock absorber is much than oil shock absorber and increased in high speed. As to the variation of damping force, there are no change when the speed is low, but we fixed amount of variation by increasing speed and change of new and old decrease. The sound pressure of the swash noise from cycle of shock absorber, we compared with theory sound pressure by experiment.
반도체 세정 공정 평가를 위한 나노입자 안착 시스템 개발
남경탁,김영길,김호중,김태성,Nam, Kyung-Tag,Kim, Young-Gil,Kim, Ho-Joong,Kim, Tae-Sung 한국반도체디스플레이기술학회 2007 반도체디스플레이기술학회지 Vol.6 No.4
As the minimum feature size decrease, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT. Charged monodisperse particles are generated using SMPS (Scanning Mobility Particle Sizer) and deposited on the wafer by electrostatic force. The Experimental results agreed with the simulation results well. We calculate the particles loss in pipe flow theoretically and compare with the experimental results.
반도체 세정 공정 평가를 위한 나노입자 안착 시스템 개발
남경탁(Kyungtag Nam),김호중(Hojoong Kim),김태성(Taesung Kim) 대한기계학회 2007 대한기계학회 춘추학술대회 Vol.2007 No.5
As the minimum feature size decreases, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT and designed a particle deposition system which consists of scanning mobility particle sizer (SMPS) and deposition chamber. Charged monodisperse particles are generated using SMPS and deposited on the wafer by electrostatic force. The experimental results agreed with the simulation results well in terms of particle number and deposition area according to particle size, flow rate and deposition voltage.
[진동·소음부문] 가진 조건에 따른 자동차 쇽 업소버의 감쇠력 특성에 관한 연구
남경탁(Kyungtak Nam),김영권(Youngkweon Kim),황성원(Sungwon Hwang),박태원(Taewon Park),정인성(Insung Jung) 한국자동차공학회 2000 한국자동차공학회 춘 추계 학술대회 논문집 Vol.- No.-
In many papers, when characteristics of shock absorber are studied, work diagrams or characteristics curves are used as a experimental standard. From these researches, Modeling methods of shock absorber were studied. But, in cases of gas and oil shock absorbers which are installed in a compact car or leasure car, various excitation conditions and temperature are 110t considered. However, these terms are very important factors which damping force is reduced. So that, newly studies are needed about that. This paper studies up on a damping force characteristics of shock absorber in a different excitation and we know that a damping force of gas and oil shock absorber is affected by these conditions.
우대광(Daekwang Woo),남경탁(Kyungtag Nam),김영길(Younggil Kim),김광수(Kwangsu Kim),강윤호(Yunho Kang),김태성(Taesung Kim) 대한기계학회 2007 대한기계학회 춘추학술대회 Vol.2007 No.5
The particle formation using pyrolysis has many advantages over other particle manufacturing techniques. The particles by pyrolysis have relatively uniform size and chemical composition. Also, we can easily produce high purity particles. Thus, we studied the formation of silicon particles by pyrolysis of 50% SiH₄ gas diluted in Ar gas. A pyrolysis furnace was used for the thermal decomposition of SiH4 gas at 800℃ and atmospheric pressure. The aerosol flow from furnace is separated into two ways. The one is to the Scanning Mobility Particle Sizer (SMPS) for particle size distribution measurement and the other is to the particle deposition system. The produced silicon particles are deposited on the wafer in the deposition chamber. SEM measurement was used to compare the particle size distribution results from the SMPS. Depending on the experimental conditions, particles of high concentration in the 30~80 ㎚ size range were generated.