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고분자량 Polymethylsilane 의 합성 및 촉매 가교 반응에 관한 연구
김동표,문교태,민동수 한국공업화학회 1997 응용화학 Vol.1 No.2
the use of polymethylsilane(PMS) as a ceramic precursor had a disadvantage of the lower pyrolytic yield, when the PMS transfer to SIC ceramics. The reason is the higher volatilization of PMS during the pyrolysis due to the lower molecular weight of that prepared by using the general methods. In this study, therefore, we tried to prepare the relatively higher molecular weight PMS by the variation of the mixing ratio of THF and n-hexane as a solvent and by using of the various catalysts in dehydrocoupling reaction of PMS. As the result, the higher molecular weight of PMS was obtained with the increase of the mixing ratio of THF. The use of catalysts in dehydrocoupling reaction of PMS was also increased the molecular weight of PMS. The most effective catalyst was a TiCP₂Cl₂/Red-Al, and the use of the catalyst was increased about the three times in molecular weight and the twice in pyrolytic yield of PMS.
김동표,고중곤,정애영,문용택 한국공업화학회 1998 응용화학 Vol.2 No.1
We were chosen Seongnam sludge with the highest ratio of Al₂O₃/SiO(0.912) and Sukseong sludge with the lowest ratio of Al₂O₃/SiO₂(0.345) out of various sludges. It has been investigated the relationship between Al₂O₃/SiO₂ and its adsorption capability, then make criteria to choose the optimum sludge for final applications. The adsorption properties of heat-treated sludges were determined with the following parameters; three types of heavy metal ions(Cd^(+3), Cr^(+6), Pb^(+3)), the concentration, adsorption period and pH of the solutions.
김동표,김경태,김창일 한국전기전자재료학회 2003 전기전자재료학회논문지 Vol.16 No.5
Etching species in CF$_4$/Ar plasma and the behavior of etching rate of Bi$_4$-$_{x}$L$_{x}$rTi$_3$O$_2$ (BLT) films were investigated in inductively coupled plasma (ICP) reactor in terms of etch parameters. The etching rate as functions of CF$_4$ contents showed the maximum 803 $\AA$/min at 20% CF$_4$ addition in CF$_4$/Ar plasma. The increase of RF power and DC bias voltage caused to an increase of etch rate. The variation of relative volume densities for F and he atoms were measured with the optical emission spectroscopy (OES). The chemical states of BLT were investigated with using X-ray photoelectron spectroscopy (XPS). XPS narrow scan analysis shows that La-fluorides remained on the etched surface. The presence of maximum etch rate at CF$_4$(20%)/Ar(80%) may be explained by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction. The roles of he ion bombardment include destruction of metal (Bi, La, Ti)-O bonds as well as assistant for chemical reaction of metals with fluorine atoms.oms.
김동표 한국유변학회 1991 Korea-Australia rheology journal Vol.3 No.2
현탁액에 대한 기본적인 유변학적 특성을 조사하기 위해 입자의 부피분율에 따른 점도의 변화를 측정하였고 현탁액의 Die Swell 현상에 대해 실험적으로 규명하였다. 뉴톤성 특성을 조사하기 위해 입자의 부피 분율에 따른 점도의 변화를 측정하였고 현탁액의 Die Swell 현상에 대해 실험적으로 규명하였다. 뉴톤성 특성을 갖는 Silicone 오일을 현탁 매질 로 사용하였고 미세한 유리 구슬이 filler로써 사용되었다. 현탁액의 점도는 Couette 점도계 와 모세관 점도계를 사용하였다. 관의 입구와 출구에 대한 보정을 위해서 Bagley의 방법을 이용하였으며 중력으로 인한 Swell의 감소효과를 제거하기 위해서 분사 유체와 유사한 밀 도를 지니며 분사 유체와 섞이지 않는 유체를 담은 부력용기가 사용되었다. Die Swell 현상 은 사진을 찍고 이를 정밀한 확대경을 통해 관찰함으로써 수치적으로 값을 얻었다.