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디자인 패턴을 적용한 닷넷 리모팅 공통 프레임워크 설계 및 구현
강윤성(Yun-Sung Kang),이준환(Jun-Hwan Lee),조한진(Han-Jin Cho) 한국콘텐츠학회 2011 한국콘텐츠학회논문지 Vol.11 No.3
현재의 소프트웨어 개발의 주요 쟁점은 재사용 가능한 유연한 소프트웨어의 개발이다. 이미 많은 소프트웨어의 성공적인 개발 경험은 소프트웨어의 환경에 따라 또는 구현하려는 모듈의 성격에 따라 공동된 모습을 패턴으로 추출하여 제시되고 있다. 경험된 패턴을 개발하고자 하는 목적에 맞게 선택하여 이를 재사용하면 빠르고 정확하게 소프트웨어를 개발할 수 있다. 이러한 개발은 성공과 실패에 따라 다른 새로운 경험이 되고 다시 재사용 된다. 소프트웨어 개발에 있어서 디자인 패턴의 적용은 선택이 아닌 필수 사항이 되었다. 본 논문에서는 재사용 가능한 소프트웨어 개발을 위해 분산통신 서비스 기술 중 하나인 닷넷 리모팅 기술을 사용하여 디자인 패턴을 적용한 공통 프레임워크를 설계하고 구현한다. The main issue in the current software development is the development of a reusable and flexible software. Already many successful software development experiences have been proposed to extract patterns of common look, depending on the software environment or depending on the nature of the module you want to implement. Can develop the software quickly and accurately to select fit for the purpose of developing and reuse using experienced patterns. These developments are depending on the success and failure become a new experience and reuse again. Apply design pattern in software development is required, was not an option. In this paper, design and implement to a common framework applied design patterns for the development of reusable software using .NET Remoting in one of the technologies of distributed communication services
Tunnel Oxide Uniformity 개선을 통한 신뢰성향상에 대한 연구
강윤성(Yun Seong - Kang),박현호(Hyun-Ho Park),김종환(Jong-Hwan Kim),신상봉(Sang-Bong Shin) 대한기계학회 2011 대한기계학회 춘추학술대회 Vol.2011 No.10
The semiconductor industry, such as significant CPU SYSTEM LSI (Large Scale Integrated circuit) and Memory can be divided into areas. Especially in recent memory, part of Dynamic Random Access Memory (DRAM) and Flash memory technologies with the (technology) has shown a marked development. For example, its fragmentary 2001 ITRS (Internal Technology Roadmap for Semiconductor) in the nonvolatile (Non-Volatile Memory, NVM) technology requirement roadmap has been added. With this trend, many memory manufacturers to present the development and mass production of NVM devices has progressed. Of particular interest in the NVM products Micro Processor Unit (MPU) or different perspective and scaling in DRAM products for NVM technology node (technology node) of the tunnel insulating film thickness (tunnel oxide thickness), write / erase voltages (program / erase voltage), data maintenance (data retention) SYSTEM LSI products with characteristics different from reduced (scaling) is progressing slowly, since the generation of 65nm design rule also in the reduction (scaling) is not a constant, and is characterized by: These flash memory devices require the unique characteristics of the end (intrinsic quality) is required to improve. In this study, the most important factor in NVM devices (critical factor) NAND flash tunnel oxide is improved through the Thickness variation was studied for ways to improve reliability.
Ag 코팅한 W-Ag 전기접점/Cu 모재간의 브레이징 접합 특성
강현구,강윤성,이재성,Kang Hyun-Goo,Kang Yun-Sung,Lee Jai-Sung 한국분말야금학회 2006 한국분말재료학회지 (KPMI) Vol.13 No.1
The brazing adhesion properties of Ag coated W-Ag electric contact on the Cu substrate have been investigated in therms of microstructure, phase equilibrium and adhesion strength. Precoating of Ag layer ($3{\mu}m$ in thickness) on the $W-40\%Ag$ contact material was done by electro-plating method. Subsequently the brazing treatment was conducted by inserting BCuP-5 filler metal (Ag-Cu-P alloy) layer between Ag coated W-Ag and Cu substrate and annealing at $710^{\circ}C$ in $H_2$ atmosphere. The optimum brazing temperature of $710^{\circ}C$ was semi-empirically calculated on the basis of the Cu atomic diffusion profile in Ag layer of commercial electric contact produced by the same brazing process. As a mechanical test of the electric contact after brazing treatment the adhesion strength between the electric contact and Cu substrate was measured using Instron. The microstructure and phase equilibrium study revealed that the sound interlayer structure was formed by relatively low brazing treatment at $710^{\circ}C$. Thin Ag electro-plated layer precoated on the electric contact ($3{\mu}m$ in thickness) is thought to be enough for high adhesion strength arid sound microstructure in interface layer.
볼밀링한 WO<sub>3</sub>-CuO 나노복합분말의 조성에 따른 수소환원 거동
정성수,강윤성,이재성,Jung Sung-Soo,Kang Yun-Sung,Lee Jai-Sung 한국분말야금학회 2006 한국분말재료학회지 (KPMI) Vol.13 No.3
The effect of Cu content on hydrogen reduction behavior of ball-milled $WO_3$-CuO nanocomposite powders was investigated. Hydrogen reduction behavior and reduction percent(${\alpha}$) of nanopowders were characterized by thermogravimetry (TG) and hygrometry measurements. Activation energy for hydrogen reduction of $WO_3$ nanopowders with different Cu content was calculated at each heating rate and reduction percent(${\alpha}$). The activation energy for reduction of $WO_3$ obtained in this study existed in the ranging from 129 to 139 kJ/mol, which was in accordance with the activation energy for $WO_3$ powder reduction of conventional micron-sized.
인체 노로바이러스의 한국분리주 Hu/NLV/Gunpo/2006/KO의 분자생물학적 특성
정아용,윤상임,지영미,강윤성,이영민,Jeong, Ah-Yong,Yun, Sang-Im,Jee, Young-Mee,Kang, Yoon-Sung,Lee, Young-Min 한국미생물학회 2009 미생물학회지 Vol.45 No.2
노로바이러스는 급성 위장염을 일으키는 Caliciviridae 과(family)에 속하는 바이러스로 유전자형이 매우 다양하다. 본 연구에서는 노로바이러스 국내분리주의 게놈 RNA로부터 3개의 open reading frame (ORF) 모두의 염기서열을 분석하고, 유전학적 계통분석을 통하여 분자생물학적 특성을 분석하였다. 본 연구에 사용된 노로바이러스(Hu/NLV/Gunpo/2006/KO)는 바이러스성 식중독, 장염 증세를 보이는 2세 여아 가검물로부터 분리되었다. 역전사반응과 PCR 증폭을 통해서 바이러스의 게놈 RNA를 3개의 중첩되는 cDNA 단편으로 합성하였으며, 합성된 cDNA를 염기서열 분석에 직접 사용하였다. 시퀀싱 결과 Hu/NLV/Gunpo/2006/KO는 3개의 ORF (ORF1, 5,100 bp; ORF2, 1,647 bp; ORF3, 765 bp)로 구성되어 있음을 알 수 있었다. 35개의 노로바이러스 국외 분리주와 비교한 결과, ORF1은 ORF2 또는 ORF3에 비해서 상대적으로 염기의 변이율이 낮았으며, 특히 ORF2와 ORF3의 C-말단 부위에서 높은 변이율을 관찰하였다. 유전학적 계통도를 분석한 결과, Hu/NLV/Gunpo/2006/KO는 genogroup II 에 속하며, Saitama U1, Gifu'96, Mc37, Vietnam 026과 같은 클러스터를 형성하는 것을 알 수 있었다. 본 연구를 통하여 노로바이러스 Hu/NLV/Gunpo/2006/KO의 3개의 ORF 염기서열을 모두 밝힘으로써, 앞으로 노로바이러스의 검출법 개발과 유전학적 상관관계뿐 아니라, 유전자의 기능 분석과 관련된 기초연구에 중요한 기초자료를 제공할 수 있을 것으로 기대한다. Norovirus (NV) with a variety of genotypes, a member of the family Caliciviridae, causes acute nonbacterial gastroenteritis in humans. We determined the nucleotide sequence of three open reading frames (ORFs) of a NV Korean strain and characterized the genetic relationship with others. The Korean strain designated Hu/NLV/Gunpo/2006/KO was isolated from the stool specimen of a 2-year-old female suffering from gastroenteritis. By performing reverse transcription and PCR amplification, three overlapping cDNAs were synthesized and used for direct sequencing. We found that like other NVs, this strain contains three ORFs: ORF1, 5,100 bp; ORF2, 1,647 bp; ORF3, 765 bp. Of 35 NVs, ORF1 had a level of genetic diversity lower than ORF2 and ORF3, of which the C-termini of the ORF2 and ORF3 showed a relatively high degree of genetic diversity. Phylogenetic analyses indicated that the Korean strain belonged to genogroup II, with Saitama U1, Gifu'96, Mc37, and Vietnam 026 being formed a single genetic cluster. The nucleotide sequence information of three ORFs of a NV Korean isolate will be useful not only for the development of a diagnostic tool and understanding of genetic relationship, but also provide important basic information for the functional analysis of their gene products.
만성 자발성 두드러기 환자에서 자가혈청 피부반응검사에 따른 검사실 소견과 증상 조절을 위한 약제의 비교
이수경 ( Su Kyoung Lee ),조민호 ( Min Ho Cho ),김병연 ( Byeong Yeon Kim ),강윤성 ( Yun Sung Kang ),최승헌 ( Seung Heon Choi ),손성욱 ( Seong Wook Sohn ) 대한천식알레르기학회 2012 천식 및 알레르기 Vol.32 No.4
Background: The autologous serum skin test is reported to be positive in up to 60% of patients with chronic spontaneous urticaria. However, the clinical role of autologous serum skin test is still poorly understood. Methods: We reviewed the medical records of 166 chronic spontaneous urticaria patients whose symptoms lasted for more than 6 weeks and compared their laboratory findings and medication levels according to autologous serum skin test reactivity. Results: Autologous serum skin test was positive in 69 (41.6%) chronic spontaneous urticaria patients. There were no significant differences between autologous serum skin test-positive and autologous serum skin test-negative groups in laboratory findings, such as anti-microsome antibody, anti- thyroglobulin antibody, anti-nuclear antibody, total immunoglobulin E, complement 4 level levels, rheumatoid factor, erythrocyte sedimentation rate and D-dimer. Autologous serum skin test were not related to medication levels. Eight patients (11.6%) of autologous serum skin test-positive groups and 6 patients (6.2%) of autologous serum skin test-negative groups need level 4 medication (usage of cyclosporine, dapsone or anti-immunoglobulin E monoclonal antibody) to control urticaria without statistical significance. Conclusion: Autologous serum skin test was positive in more than 40% of chronic spontaneous urticaria patients. However, laboratory findings and medication levels were not affected by autologous serum skin test reactivity.